Novissima producta nova, bona lubricitas et resistentia attritionis, Graphite Semiconductor

Descriptio Brevis:

Applicatio: Partes Semiconductorum
Resistentia (μΩ.m): 8-10 Ohmia
Porositas (%): Maximum 12%
Locus Originis: Zhejiang, China
Dimensiones Adaptus
Magnitudo amplificationis: <=325 reticulum
Certificatum: ISO9001:2015
Magnitudo et Forma: Adaptus


Detalia Producti

Etiquettae Productarum

Novissima producta nova, bona lubricitas et resistentia attritionis, Graphite Semiconductor
Applicatio: Partes Semiconductorum
Resistentia (μΩ.m): 8-10 Ohmia
Porositas (%): Maximum 12%
Locus Originis: Zhejiang, China
Dimensiones Adaptus
Magnitudo amplificationis: <=325 reticulum
Certificatum: ISO9001:2015
Magnitudo et Forma: Adaptus

Novissima producta nova, bona lubricitas et resistentia attritionis, Graphite Semiconductor

Novissima producta nova, bona lubricitas et resistentia attritionis, Graphite Semiconductor

Novissima producta nova, bona lubricitas et resistentia attritionis, Graphite Semiconductor

Novissima producta nova, bona lubricitas et resistentia attritionis, Graphite Semiconductor

Novissima producta nova, bona lubricitas et resistentia attritionis, Graphite Semiconductor

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