I-Metal-organic chemical vapor deposition (MOCVD) yindlela esetyenziswa kakhulu ye-semiconductor epitaxy esetyenziselwa ukufaka iifilimu ezininzi phezu komphezulu wee-semiconductor wafers ukulungiselela izixhobo ze-semiconductor ezikumgangatho ophezulu. Izixhobo ze-MOCVD epitaxial zidlala indima ebalulekileyo kushishino lwe-semiconductor kwaye zisetyenziswa kakhulu kwizixhobo ze-optoelectronic, unxibelelwano lwe-optical, ukuveliswa kwamandla e-photovoltaic kunye ne-semiconductor lasers.
Enye yezona zinto ziphambili ezisetyenziswayo kwi-MOCVD epitaxial components kukulungiselela izixhobo ze-optoelectronic. Ngokubeka iifilimu ezininzi zezinto ezahlukeneyo kwi-semiconductor wafers, izixhobo ezifana ne-optical diodes (LED), i-laser diodes (LD) kunye ne-photodetectors zinokulungiswa. Izixhobo ze-MOCVD epitaxial zinobunye obugqwesileyo bezinto kunye nobuchule bokulawula umgangatho we-interface, obunokwenza ukuguqulwa kwe-photoelectric ngokufanelekileyo, kuphuculwe ukusebenza kakuhle kokukhanya kunye nokuzinza kokusebenza kwesixhobo.
Ukongeza, izinto ze-epitaxial ze-MOCVD zikwasetyenziswa kakhulu kwicandelo lonxibelelwano lwe-optical. Ngokubeka iileya ze-epitaxial zezinto ezahlukeneyo, ii-amplifier ze-optical ze-semiconductor ezikhawulezayo nezisebenzayo kunye nee-optical modulators zinokulungiswa. Ukusetyenziswa kwezinto ze-epitaxial ze-MOCVD kwicandelo lonxibelelwano lwe-optical kunokunceda ukuphucula izinga lokudlulisela kunye nomthamo wonxibelelwano lwe-optical fiber ukuhlangabezana neemfuno ezikhulayo zokudluliselwa kwedatha.
Ukongeza, izinto ze-epitaxial ze-MOCVD zikwasetyenziswa kwicandelo lokuvelisa amandla e-photovoltaic. Ngokubeka iifilimu ezininzi ezinezakhiwo ezithile zebhendi, iiseli zelanga ezisebenzayo zinokulungiswa. Izinto ze-epitaxial ze-MOCVD zinokubonelela ngezilayidi ze-epitaxial ezikumgangatho ophezulu, ezihambelana nelattice ephezulu, ezinceda ukuphucula ukusebenza kakuhle kokuguqulwa kwe-photoelectric kunye nokuzinza kwexesha elide kweeseli zelanga.
Okokugqibela, izinto ze-MOCVD epitaxial nazo zidlala indima ebalulekileyo ekulungiseleleni ii-semiconductor lasers. Ngokulawula ukwakheka kwezinto kunye nobukhulu be-epitaxial layer, ii-semiconductor lasers ezinamaza ahlukeneyo zinokwenziwa. Izinto ze-MOCVD epitaxial zibonelela ngee-epitaxial layers ezikumgangatho ophezulu ukuqinisekisa ukusebenza kakuhle kwe-optical kunye nokulahleka okuphantsi kwangaphakathi.
Ngamafutshane, izinto ze-epitaxial ze-MOCVD zineendlela ezahlukeneyo zokusebenza kwishishini le-semiconductor. Ziyakwazi ukulungiselela iifilimu ezikumgangatho ophezulu ezinee-multilayer ezibonelela ngezixhobo ezibalulekileyo kwizixhobo ze-optoelectronic, unxibelelwano lwe-optical, ukuveliswa kwamandla e-photovoltaic kunye ne-semiconductor lasers. Ngophuhliso oluqhubekayo kunye nokuphuculwa kwetekhnoloji ye-MOCVD, inkqubo yokulungiselela iindawo ze-epitaxial iya kuqhubeka iphuculwa, izisa izinto ezintsha kunye nokuphumelela kwizicelo ze-semiconductor.
Ixesha leposi: Disemba-18-2023