CVD Txheej Txheem rau Kev Ua Haujlwm Semiconductor Siab Tshaj Plaws
Tsim los rau cov chaw tsim khoom semiconductor tseem ceeb, peb cov Chemical Vapor Deposition (CVD) Silicon Carbide (SiC), Tantalum Carbide (TaC), thiab Pyrolytic Carbon (PyC) coatings muab cov tshuaj lom neeg zoo heev, kev ruaj khov thermal heev, thiab kev ntshiab siab heev (< 5 ppm). Tsim los tiv thaiv cov graphite thiab ceramic substrates uas muaj kev ntshiab siab los ntawm cov plasma uas muaj zog, cov pa roj reactive, thiab kev hloov pauv thermal siab, peb cov coatings siab heev txo cov khoom me me thiab ua kom lub neej ntawm cov khoom siv ntev dua.Silicon/SiC Epitaxy, MOCVD, Plasma Etching, thiab Monocrystal Growthcov ntawv thov.
GDMS-tau txheeb xyuas cov khoom tsis muaj hlau tsawg kom tiv thaiv kev ua qias tuaj ntawm wafer hauv cov txheej txheem tseem ceeb.
Cov qauv crystalline ntom ntom tiv thaiv cov halogen plasma (CF₄, NF₃, Cl₂) thiab cov pa roj corrosive.
Kev tswj hwm CTE nruj heev tshem tawm cov kab nrib pleb me me thiab cov txheej txheem delamination nyob rau hauv kev poob siab thermal hnyav.
| Hom txheej | Qhov Zoo Tshaj Plaws ntawm Kev Siv Tshuab | Daim Ntawv Thov Txheej Txheem Tseem Ceeb |
|---|---|---|
| CVD SiC Txheej | Kev ua tau zoo ntawm thermal conductivity, zoo heev plasma erosion tsis kam | Qhuav Etch, Si Epitaxy, MOCVD, Crystal Growth |
| CVD TaC Txheej | Kev tiv taus kub heev (>2000°C), H₂/SiH₄ tiv taus xeb | SiC Epitaxy, Ib Leeg-Crystal SiC PVT Kev Loj Hlob |
| PyC Txheej | Kev sib khi roj hermetic, qhov chaw carbon anisotropic du heev | Kev rwb thaiv tsev thermal, CZ Monocrystalline Silicon |
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