When silicon carbide crystal grows, the “environment” of the growth interface between the axial center of the crystal and the edge is different, so that the crystal stress on the edge i...
Tantalum carbide coated products are a commonly used high-temperature material, characterized by high temperature resistance, corrosion resistance, wear resistance, etc. Therefore, they are widely ...
After the ceramic substrate is sintered and formed, its surface needs to be metallized, and then the surface pattern is made through image transfer to achieve the electrical connection performance ...
Chemical vapor deposition (CVD) is the most widely used technology in the semiconductor industry for depositing a variety of materials, including a wide range of insulating materials, most metal ma...
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Physical and chemical activation method
Physical and chemical activation method refers t...
Modern C, N, B and other non-oxide high-tech refractory raw materials, atmospheric pressure sintered silicon carbide is extensive, economic, can be said to be emery or refractory sand. Pure silicon...