2 Experimental results and discussion
2.1 Epitaxial layer thickness and uniformity
Epitaxial layer thickness, doping concentration and uniformity are one of the core indicators for judging the...
Wafer epitaxial growth is achieved through the metal organic chemical vapor deposition (MOCVD) technology, in which ultra-pure gases are injected into the reactor and finely metered, so that they c...
Pierburg has been developing vacuum pumps for brake boosters for decades. With the current EVP40 model, the supplier is offering an electric option that operates on-demand and sets high standards i...
Non-uniformity of ion bombardment
Dry etching is usually a process that combines physical and chemical effects, in which ion bombardment is an important physical etching method. During the etchin...
SiC has the characteristics of large bandgap, high thermal conductivity, high critical breakdown field strength, and high electron saturation drift rate. It can meet the application requirements un...
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