1. Main processes of plasma enhanced chemical vapor deposition
Plasma enhanced chemical vapor deposition (PECVD) is a new technology for the growth of thin films by chemical reaction of gase...
Chemical vapor deposition (CVD) refers to the process of depositing a solid film on the surface of a silicon wafer through a chemical reaction of a gas mixture. According to the different reaction ...
Since its invention in the 1960s, the carbon-carbon C/C composites have received great attention from the military, aerospace, and nuclear energy industries. In the early stage, the manufacturing p...
chemical vapor deposition ( CVD ) is a procedure that involve lodge a solid movie on a silicon wafer’s surface through a chemical chemical reaction of a gas mixture. This procedure can be div...
Nikola, a U.S. global zero-emission transportation, energy and infrastructure provider, has entered into a definitive agreement through the HYLA brand and Voltera, a leading global infrastructure p...
The State Council Information Office held a press conference at 2 pm on September 20, 2019 (Friday). The Minister of Industry and Information Technology, Miao Wei, introduced the development of the...