1. Third-generation semiconductors
The first-generation semiconductor technology was developed based on semiconductor materials such as Si and Ge. It is the material basis for the development of tr...
Non-uniformity of ion bombardment
Dry etching is usually a process that combines physical and chemical effects, in which ion bombardment is an important physical etching method. During the etchin...
Sichuan Province is vast in area and rich in mineral resources. Among them, the prospecting potential of emerging strategic resources is huge. A few days ago, it was led by Sichuan Natural Resourc...
Photolithography technology mainly focuses on using optical systems to expose circuit patterns on silicon wafers. The accuracy of this process directly affects the performance and yield of integrat...
With the continuous advancement of science and technology, the semiconductor industry has an increasing demand for high-performance, high-efficiency materials. In this field, silicon carbide crysta...
Different from S1C discrete devices which pursue high voltage, high power, high frequency and high temperature characteristics, the research goal of SiC integrated circuit is mainly to obtain high ...