Chemical vapor deposition (CVD) refers to the process of depositing a solid film on the surface of a silicon wafer through a chemical reaction of a gas mixture. According to the different reaction ...
1. Third-generation semiconductors
The first-generation semiconductor technology was developed based on semiconductor materials such as Si and Ge. It is the material basis for the development of ...
Reaction-sintered silicon carbide is a new type of high-tech ceramics, which has high strength, high hardness, good wear resistance and corrosion resistance, and is widely used in metallurgy, petro...
The global Silicon Carbide Coating Market Research Report 2020-2026 is a valuable source of insightful data for business strategists. It provides the industry overview with growth analysis and hist...
The “Graphite Electrode Market” research report added by LLC is a thorough analysis of the latest trends in the business. The report also distributes valuable statistics on market size,...
First, the principle of mixing
By stirring the blades and the revolving frame to rotate each other, the mechanical suspension is generated and maintained, and the mass transfer between the liquid a...