Chemical vapor deposition (CVD) is the most widely used technology in the semiconductor industry for depositing a variety of materials, including a wide range of insulating materials, most metal ma...
Early wet etching promoted the development of cleaning or ashing processes. Today, dry etching using plasma has become the mainstream etching process. Plasma consists of electrons, cations and radi...
Tantalum carbide coating is a commonly used surface treatment technology that can significantly improve the corrosion resistance of materials. Tantalum carbide coating can be attached to the surfac...
Wafer epitaxial growth is achieved through the metal organic chemical vapor deposition (MOCVD) technology, in which ultra-pure gases are injected into the reactor and finely metered, so that they c...
Silicon carbide (SiC) is a highly durable material known for its superior hardness, high thermal conductivity, and resistance to chemical corrosion. Among the various methods to apply SiC onto sur...
Carbon-carbon composites are a type of carbon fiber composites, with carbon fiber as the reinforcement material and deposited carbon as the matrix material. The matrix of C/C composites is carbon. ...