Non-uniformity of ion bombardment
Dry etching is usually a process that combines physical and chemical effects, in which ion bombardment is an important physical etching method. During the etchin...
Shuangyashan, Northeastern China, October 31st (Reporter Li Sizhen) On the morning of October 29th, the city’s graphite industry cadre training class jointly organized by the Municipal Party ...
As a kind of power generation device that converts chemical energy in hydrogen and oxidant into electricity, the gas tightness of fuel cell stack is very important. This is the test of VET for the ...
Las últimas investigaciones sobre el Silicon Carbide Coating Informe de Previsión del Mercado Global 2020–2029 presentan un análisis en profundidad de la Silicon Carbide Coating que investigó situa...
fan out wafer degree packaging ( FOWLP ) in the semiconductor industry is know for being cost-effective, but it is not without its challenge. One of the main issue confront is warp and bit beginni...
Silicon carbide coated graphite disk is to prepare silicon carbide protective layer on the surface of graphite by physical or chemical vapor deposition and spraying. The prepared silicon carbide pr...