CVDSekoahelo sa SiCe fetola meedi ya ditshebetso tsa tlhahiso ya di-semiconductor ka lebelo le makatsang. Theknoloji ena e bonahalang e le bonolo ya ho roala e fetohile tharollo ya bohlokwa diphephetsong tse tharo tsa mantlha tsa tshilafatso ya dikarolwana, mafome a mocheso o phahameng le kgoholeho ya plasma tlhahisong ya di-chip. Bahlahisi ba ka sehloohong ba disebediswa tsa di-semiconductor lefatsheng ba e thathamisitse e le theknoloji e tloaelehileng bakeng sa disebediswa tsa moloko o latelang. Jwale, ke eng e etsang hore roala ena e be "sehlomo se sa bonahaleng" sa tlhahiso ya di-chip? Sengoloa sena se tla sekaseka ka botebo melaomotheo ya sona ya botekgeniki, ditshebediso tsa mantlha le diphetoho tse ntjha.
Ⅰ. Tlhaloso ea sekoahelo sa CVD SiC
Sekoahelo sa CVD SiC se bolela lera le sireletsang la silicon carbide (SiC) le kentsweng hodima substrate ke tshebetso ya ho bewa ha mouoane wa dikhemikhale (CVD). Silicon carbide ke motsoako wa silicon le carbon, o tsebahalang ka ho thatafala ha wona ho hoholo, ho tsamaisa mocheso o phahameng, ho se sebetse ha dikhemikhale le ho hanyetsa mocheso o phahameng. Theknoloji ya CVD e ka etsa lera la SiC le hlwekileng haholo, le teteaneng le le lekanang, mme le ka dumellana haholo le dijiometri tse rarahaneng. Sena se etsa hore dikoahelo tsa CVD SiC di lokele haholo bakeng sa ditshebediso tse hlokang boiteko tse ke keng tsa fihlellwa ke thepa ya setso ya bongata kapa mekgwa e meng ya ho bewa.
Molao-motheo oa ts'ebetso ea CVD
Ho beoa ha mouoane oa lik'hemik'hale (CVD) ke mokhoa o feto-fetohang oa tlhahiso o sebelisoang ho hlahisa thepa e tiileng ea boleng bo holimo le e sebetsang hantle. Molao-motheo oa mantlha oa CVD o kenyelletsa karabelo ea likhase tse etellang pele holim'a substrate e futhumetseng ho etsa lesela le tiileng.
Mona ke tlhaloso e nolofalitsoeng ea ts'ebetso ea SiC CVD:
Setšoantšo sa molao-motheo oa ts'ebetso ea CVD
1. Selelekela sa selelekela: Di-precursor tsa khase, hangata dikhase tse nang le silicon (mohlala, methyltrichlorosilane – MTS, kapa silane – SiH₄) le dikhase tse nang le carbon (mohlala, propane – C₃H₈), di kenngwa ka phaposing ya karabelo.
2. Phano ea khase: Likhase tsena tse etellang pele li phalla holim'a substrate e futhumetseng.
3. Ho monya metsi: Limolek'hule tsa pele ho khetla li monya holim'a substrate e chesang.
4. Karabelo ea holim'a metsi: Maemong a mocheso o phahameng, limolek'hule tse amohuoang li feta liketsong tsa lik'hemik'hale, e leng se fellang ka ho bola ha selelekela le ho thehoa ha filimi e tiileng ea SiC. Lihlahisoa tse ling li lokolloa ka mokhoa oa likhase.
5. Ho felloa ke metsi le ho ntša mosi: Lihlahisoa tse tsoang ho khase lia tsoa holim'a metsi ebe li ntša mosi ka phapusing. Taolo e nepahetseng ea mocheso, khatello, sekhahla sa phallo ea khase le mahloriso a pele ho eona ke ea bohlokoa ho fihlelleng litšobotsi tse lakatsehang tsa filimi, ho kenyeletsoa botenya, bohloeki, kristale le ho khomarela.
Ⅲ. Tšebeliso ea Liaparo tsa CVD SiC Mekhoeng ea Semiconductor
Liaparo tsa CVD SiC li bohlokoa haholo tlhahisong ea li-semiconductor hobane motsoako oa tsona o ikhethang oa thepa o fihlela maemo a feteletseng le litlhoko tse thata tsa bohloeki ba tikoloho ea tlhahiso. Li eketsa khanyetso khahlanong le mafome a plasma, tlhaselo ea lik'hemik'hale le tlhahiso ea likaroloana, tseo kaofela li leng bohlokoa ho holiseng chai ea wafer le nako ea ho sebetsa ha lisebelisoa.
Tse latelang ke tse ling tsa likarolo tse tloaelehileng tse koahetsoeng ke CVD SiC le maemo a ts'ebeliso ea tsona:
1. Phaposi ea ho Sebetsa ka Plasma le Lesale la ho Tsepamisa Maikutlo
Lihlahisoa: Li-liner tse koahetsoeng ka CVD SiC, lihlooho tsa shaoara, li-susceptor, le masale a ho tsepamisa maikutlo.
Kopo: Ho epeng ha plasma, plasma e sebetsang haholo e sebelisoa ho tlosa thepa ho tsoa ho li-wafer ka mokhoa o ikhethileng. Lisebelisoa tse sa koaheloang kapa tse sa tšoarellang haholo li senyeha ka potlako, e leng se fellang ka tšilafalo ea likaroloana le ho se sebetse khafetsa. Liaparo tsa CVD SiC li na le khanyetso e ntle ho lik'hemik'hale tse matla tsa plasma (mohlala, fluorine, chlorine, bromine plasma), li lelefatsa bophelo ba likarolo tsa bohlokoa tsa kamore, 'me li fokotsa tlhahiso ea likaroloana, e leng se eketsang ka ho toba chai ea wafer.
2. Likamore tsa PECVD le HDPCVD
Lihlahisoa: Likamore tsa karabelo tse koahetsoeng ka CVD SiC le li-electrode.
Likopo: Ho kenngoa ha mouoane oa lik'hemik'hale tse ntlafalitsoeng ka plasma (PECVD) le plasma CVD e nang le density e phahameng (HDPCVD) li sebelisoa ho beha lifilimi tse tšesaane (mohlala, likarolo tsa dielectric, likarolo tsa passivation). Mekhoa ena e boetse e kenyelletsa libaka tse thata tsa plasma. Liaparo tsa CVD SiC li sireletsa mabota a kamore le li-electrode ho khoholeho ea mobu, li netefatsa boleng bo tsitsitseng ba filimi le ho fokotsa liphoso.
3. Lisebelisoa tsa ho kenya li-ion
Lihlahisoa: Likarolo tsa beamline tse koahetsoeng ka CVD SiC (mohlala, masoba, likopi tsa Faraday).
Likopo: Ho kenngoa ha li-ion ho kenya li-ion tse nang le dopant ka har'a li-substrate tsa semiconductor. Mahlaseli a li-ion a matla a mangata a ka baka ho phatloha le ho senyeha ha likarolo tse pepesitsoeng. Ho thatafala le bohloeki bo phahameng ba CVD SiC li fokotsa tlhahiso ea likaroloana ho tsoa likarolong tsa beamline, ho thibela tšilafalo ea li-wafer nakong ea mohato ona oa bohlokoa oa doping.
4. Likarolo tsa reactor ea Epitaxial
Lihlahisoa: Li-susceptor tse koahetsoeng ka CVD SiC le baabi ba khase.
Likopo: Kgolo ya Epitaxial (EPI) e kenyeletsa ho hodisa dikarolo tse nang le kristale tse hlophisehileng haholo hodima substrate maemong a mocheso o phahameng. Di-susceptor tse kwahetsweng ke CVD SiC di fana ka botsitso bo botle ba mocheso le ho se sebetse hantle ha dikhemikhale maemong a mocheso o phahameng, ho netefatsa ho futhumala ho tshwanang le ho thibela tshilafatso ya di-susceptor ka botsona, e leng ntho ya bohlokwa ho fihlelleng dikarolo tse nang le boleng bo hodimo tsa epitaxial.
Ha di-geometri tsa di-chip di ntse di fokotseha mme ditlhoko tsa tshebetso di ntse di eketseha, tlhokeho ya bafepedi ba di-coating ba CVD SiC ba boleng bo hodimo le bahlahisi ba di-coating ba CVD e ntse e tswela pele ho hola.
IV. Mathata a ts'ebetso ea ho koahela CVD SiC ke afe?
Ho sa tsotellehe melemo e meholo ea ho koahela CVD SiC, tlhahiso le ts'ebeliso ea eona li ntse li tobana le liphephetso tse ling tsa ts'ebetso. Ho rarolla liphephetso tsena ke senotlolo sa ho fihlela ts'ebetso e tsitsitseng le katleho ea litšenyehelo.
Liphephetso:
1. Ho khomarela substrate
SiC e ka ba phephetso ho fihlella kgomarelo e matla le e tshwanang ho thepa e fapaneng ya substrate (mohlala, graphite, silicon, ceramic) ka lebaka la dipharologanyo tsa katoloso ya mocheso le matla a hodima metsi. Kgomarelo e fokolang e ka lebisa ho kgaohaneng nakong ya potoloho ya mocheso kapa kgatello ya mechine.
Litharollo:
Tokiso ea holim'a metsi: Ho hlwekisa ka hloko le ho phekola bokaholimo (mohlala, ho tjhesa, kalafo ya plasma) ya substrate ho tlosa ditshila le ho etsa bokaholimo bo botle bakeng sa ho kopana.
Lera le arohaneng: Beha lera le lesesaane le entsoeng ka mokhoa o ikhethileng kapa le nang le buffer (mohlala, carbon ea pyrolytic, TaC - e tšoanang le CVD TaC coating lits'ebetsong tse ikhethileng) ho fokotsa ho se lumellane ha katoloso ea mocheso le ho khothaletsa ho khomarela.
Ntlafatsa liparamente tsa ho boloka: Laola ka hloko mocheso oa ho beha, khatello le karolelano ea khase ho ntlafatsa nucleation le kholo ea lifilimi tsa SiC le ho khothaletsa ho hokahana ho matla ha li-interfacial.
2. Khatello ea Filimi le ho Petsoha
Nakong ea ho kenngoa kapa ho pholisoa ho latelang, likhatello tse setseng li ka hlaha ka har'a lifilimi tsa SiC, tse bakang ho petsoha kapa ho sotha, haholo-holo liemahaleng tse kholo kapa tse rarahaneng.
Litharollo:
Taolo ea Mocheso: Laola ka nepo sekhahla sa ho futhumatsa le ho pholisa ho fokotsa ho thothomela le khatello ea mocheso.
Sekoahelo sa Gradient: Sebelisa mekhoa ea ho roala e nang le mekhahlelo e mengata kapa e nang le gradient ho fetola butle-butle sebopeho kapa sebopeho sa thepa ho amohela khatello.
Ho Hlomathisoa ha Morao ho Deposition: Kenya likarolo tse koahetsoeng ho felisa khatello e setseng le ho ntlafatsa botšepehi ba filimi.
3. Ho Lumellana le ho Tšoana Libopehong tse Rarahaneng tsa Geometri
Ho beha masela a teteaneng ka ho lekana le a sebopeho sa sebopeho likarolong tse nang le dibopeho tse rarahaneng, dikarolelano tse phahameng tsa ponahalo, kapa dikanale tsa kahare ho ka ba thata ka lebaka la meedi ya ho hasana ha pele ho nako le kinetics ya karabelo.
Litharollo:
Ntlafatso ea Moralo oa Reactor: Rala li-reactor tsa CVD tse nang le matla a phallo ea khase a ntlafalitsoeng le ho tšoana ha mocheso ho netefatsa kabo e ts'oanang ea li-precursor.
Phetoho ea Paramethara ea Ts'ebetso: Lokisa kgatello ya ho bokellana ha khase hantle, sekgahla sa phallo, le mahloriso a pele ho yona ho ntlafatsa ho hasana ha khase dikarolong tse rarahaneng.
Ho beoa ha mekhahlelo e mengata: Sebelisa mehato e tsoelang pele ea ho beha kapa lisebelisoa tse potolohang ho netefatsa hore libaka tsohle li koahetsoe ka ho lekaneng.
V. Lipotso Tse Botsoang Khafetsa
P1: Phapang ea mantlha ke efe pakeng tsa CVD SiC le PVD SiC lits'ebetsong tsa semiconductor?
K: Liaparo tsa CVD ke meaho ea kristale ea columnar e nang le bohloeki ba >99.99%, e loketseng tikoloho ea plasma; Liaparo tsa PVD boholo ba tsona ha li na sebopeho/likristale tse nang le bohloeki ba <99.9%, haholo-holo li sebelisetsoa ho khabisa.
P2: Mocheso o phahameng ka ho fetisisa oo sekoahelo se ka o mamellang ke ofe?
A: Ho mamella mocheso oa nako e khuts'oane oa 1650°C (joalo ka ts'ebetso ea ho annealing), moeli oa tšebeliso ea nako e telele oa 1450°C, ho feta mocheso ona ho tla baka phetoho ea mohato ho tloha ho β-SiC ho ea ho α-SiC.
P3: Mefuta e tloaelehileng ea botenya ba ho roala?
K: Dikarolo tsa semiconductor boholo ba tsona ke 80-150μm, mme dikoahelo tsa EBC tsa enjene ya difofane di ka fihla ho 300-500μm.
P4: Ke lintlha life tsa bohlokoa tse amang litšenyehelo?
A: Bohloeki ba pele ho nako (40%), tshebediso ya matla a disebediswa (30%), tahlehelo ya chai (20%). Theko ya yuniti ya dikobo tse phahameng e ka fihla ho $5,000/kg.
P5: Bafepedi ba ka sehloohong ba lefats'e ke bo-mang?
A: Yuropa le United States: CoorsTek, Mersen, Ionbond; Asia: Semixlab, Veteksemicon, Kallex (Taiwan), Scientech (Taiwan)
Nako ea poso: Phuptjane-09-2025