The growth process of monocrystalline silicon is completely carried out in the thermal field. A good thermal field is conducive to improving the quality of crystals and has a higher crystallization...
Silicon carbide coating technology is a method of forming silicon carbide layer on the surface of materials, usually using chemical vapor deposition, physicochemical vapor deposition, melt impregna...
Wafer cutting is one of the important links in power semiconductor production. This step is designed to accurately separate individual integrated circuits or chips from semiconductor wafers.
The ke...
Before entering the PE furnace tube, check whether the graphite boat is in good condition again. It is recommended to pretreat (saturated) at normal time, it is recommended not to pretreat in empty...
Non-uniformity of ion bombardment
Dry etching is usually a process that combines physical and chemical effects, in which ion bombardment is an important physical etching method. During the etchin...
CVD (Chemical Vapor Deposition) is a commonly used method for preparing silicon carbide coatings. CVD silicon carbide coatings have many unique performance characteristics. This article will introd...