- Typical BMW dynamics assured: First technical details on the powertrain system for the BMW i Hydrogen NEXT – Development collaboration with Toyota Motor Corporation to continue TechnologyDe...
Thin film deposition is to coat a layer of film on the main substrate material of the semiconductor. This film can be made of various materials, such as insulating compound silicon dioxide, semicon...
Sintered silicon carbide is a kind of advanced ceramic material with excellent properties, which has the characteristics of high strength, high hardness, high temperature stability and chemical ine...
1. Third-generation semiconductors
The first-generation semiconductor technology was developed based on semiconductor materials such as Si and Ge. It is the material basis for the development of tr...
Metal-organic chemical vapor deposition (MOCVD) is a commonly used semiconductor epitaxy technique used to deposit multilayer films on the surface of semiconductor wafers to prepare high-quality se...
The core technology for the growth of SiC epitaxial materials is firstly defect control technology, especially for defect control technology that is prone to device failure or reliability degradati...