CVDSiC txheejtab tom hloov kho cov kev txwv ntawm cov txheej txheem tsim khoom semiconductor ntawm qhov nrawm xav tsis thoob. Cov txheej txheem txheej txheem yooj yim no tau dhau los ua qhov kev daws teeb meem tseem ceeb rau peb qhov teeb meem tseem ceeb ntawm kev ua qias tuaj ntawm cov khoom me me, kev xeb kub siab thiab kev puas tsuaj ntawm plasma hauv kev tsim cov chip. Cov chaw tsim khoom siv semiconductor saum toj kawg nkaus hauv ntiaj teb tau teev nws ua cov thev naus laus zis txheem rau cov khoom siv tiam tom ntej. Yog li, dab tsi ua rau cov txheej txheem no ua "lub cuab yeej tsis pom" ntawm kev tsim cov chip? Tsab xov xwm no yuav tshuaj xyuas nws cov ntsiab cai kev siv tshuab, cov ntawv thov tseem ceeb thiab kev ua tiav tshiab.
Ⅰ. Lub ntsiab lus ntawm CVD SiC txheej
CVD SiC txheej yog hais txog ib txheej tiv thaiv ntawm silicon carbide (SiC) uas tau muab tso rau ntawm ib lub substrate los ntawm cov txheej txheem chemical vapor deposition (CVD). Silicon carbide yog ib qho sib xyaw ua ke ntawm silicon thiab carbon, uas paub txog nws qhov nyuaj heev, thermal conductivity siab, tshuaj inertness thiab kub tsis kam. CVD thev naus laus zis tuaj yeem tsim ib txheej SiC uas muaj qhov huv siab, ntom thiab tuab sib npaug, thiab tuaj yeem ua raws li cov geometries nyuaj. Qhov no ua rau CVD SiC txheej zoo heev rau cov ntawv thov uas nyuaj uas cov khoom siv ib txwm muaj lossis lwm txoj kev txheej tsis tuaj yeem ua tiav.
Ⅱ. Txoj cai ntawm CVD
Kev siv tshuaj lom neeg los ua kom cov khoom khov kho zoo thiab ua haujlwm tau zoo (Chemical vapor deposition - CVD) yog ib txoj kev tsim khoom uas siv tau ntau yam los tsim cov khoom khov kho zoo thiab ua tau zoo. Lub hauv paus ntsiab lus ntawm CVD yog kev ua kom cov pa roj ua rau ntawm qhov chaw ntawm cov khoom siv uas tau sov kom ua ib txheej khov kho.
Nov yog kev piav qhia yooj yim ntawm SiC CVD txheej txheem:
Daim duab qhia txog cov txheej txheem CVD
1. Kev taw qhia ua ntejCov pa roj ua ntej, feem ntau yog cov pa roj uas muaj silicon (piv txwv li, methyltrichlorosilane - MTS, lossis silane - SiH₄) thiab cov pa roj uas muaj carbon (piv txwv li, propane - C₃H₈), raug coj mus rau hauv chav tshuaj tiv thaiv.
2. Kev xa rojCov pa roj ua ntej no ntws hla lub substrate uas sov.
3. Kev nqus dej: Cov tshuaj precursor nqus mus rau saum npoo ntawm cov substrate kub.
4. Kev ua xua ntawm qhov chawThaum kub siab, cov molecules adsorbed yuav dhau los ua cov tshuaj lom neeg, ua rau cov khoom ua ntej lwj thiab tsim cov zaj duab xis SiC khov kho. Cov khoom seem raug tso tawm hauv daim ntawv ntawm cov pa roj.
5. Kev tshem tawm thiab kev tso pa tawmCov khoom siv roj tawm ntawm qhov chaw thiab tom qab ntawd tawm ntawm lub chamber. Kev tswj qhov kub thiab txias, siab, roj ntws thiab qhov concentration ntawm cov precursor yog qhov tseem ceeb rau kev ua tiav cov khoom zoo ntawm zaj duab xis, suav nrog tuab, huv, crystallinity thiab adhesion.
Ⅲ. Kev siv cov txheej txheem CVD SiC hauv cov txheej txheem semiconductor
Cov txheej txheem CVD SiC yog qhov tseem ceeb hauv kev tsim khoom semiconductor vim lawv cov khoom sib xyaw ua ke ncaj qha ua tau raws li qhov xwm txheej hnyav thiab cov kev cai huv huv ntawm qhov chaw tsim khoom. Lawv txhim kho kev tiv thaiv rau plasma corrosion, tshuaj lom neeg tawm tsam, thiab kev tsim cov khoom me me, txhua yam no yog qhov tseem ceeb rau kev ua kom cov wafer ntau thiab cov khoom siv ua haujlwm tau zoo tshaj plaws.
Cov hauv qab no yog qee qhov CVD SiC coated feem ntau thiab lawv cov xwm txheej thov:
1. Plasma Etching Chamber thiab Focus Ring
Cov khoomCov ntaub thaiv dej CVD SiC, cov taub hau da dej, cov khoom siv nqus pa, thiab cov nplhaib tsom xam.
Daim Ntawv ThovHauv plasma etching, cov plasma uas ua haujlwm ntau heev yog siv los xaiv cov khoom siv los ntawm cov wafers. Cov khoom tsis muaj txheej lossis cov khoom siv tsis ruaj khov yuav lwj sai sai, ua rau muaj kev sib kis ntawm cov khoom me me thiab lub sijhawm tsis ua haujlwm ntau zaus. CVD SiC coatings muaj kev tiv thaiv zoo rau cov tshuaj plasma uas muaj zog (piv txwv li, fluorine, chlorine, bromine plasmas), ua kom lub neej ntawm cov khoom tseem ceeb hauv chav, thiab txo cov khoom me me, uas ua rau cov wafer ntau ntxiv.
2. Cov chav PECVD thiab HDPCVD
Cov khoomCov chav ua tshuaj tiv thaiv thiab cov electrodes uas muaj CVD SiC coated.
Cov ntawv thovCov txheej txheem no kuj suav nrog cov chaw muaj plasma hnyav. Cov txheej txheem CVD SiC tiv thaiv cov phab ntsa thiab cov electrodes los ntawm kev yaig, ua kom cov yeeb yaj kiab zoo thiab txo qhov tsis zoo.
3. Cov khoom siv cog ion
Cov khoom: CVD SiC coated beamline Cheebtsam (piv txwv li, apertures, Faraday khob).
Cov ntawv thov: Kev cog cov ion ua rau cov ions dopant nkag mus rau hauv cov khoom siv semiconductor. Cov kab hluav taws xob ion muaj zog heev tuaj yeem ua rau cov khoom tawg thiab lwj. Qhov nyuaj thiab qhov huv siab ntawm CVD SiC txo cov khoom me me los ntawm cov khoom siv beamline, tiv thaiv kev ua qias tuaj ntawm cov wafers thaum lub sijhawm doping tseem ceeb no.
4. Cov khoom siv Epitaxial reactor
Cov khoomCov khoom siv CVD SiC coated susceptors thiab cov roj faib tawm.
Cov ntawv thovKev loj hlob ntawm Epitaxial (EPI) cuam tshuam nrog kev loj hlob ntawm cov txheej txheem crystalline uas muaj qib siab ntawm cov substrate ntawm qhov kub siab. CVD SiC coated susceptors muab kev ruaj khov thermal zoo heev thiab kev tsis muaj zog tshuaj lom neeg ntawm qhov kub siab, ua kom muaj cua sov sib npaug thiab tiv thaiv kev ua qias tuaj ntawm susceptor nws tus kheej, uas yog qhov tseem ceeb rau kev ua tiav cov txheej epitaxial zoo.
Raws li cov duab ntawm cov chip me me thiab cov txheej txheem xav tau ntau zuj zus, qhov kev thov rau cov neeg muab khoom zoo CVD SiC txheej thiab cov chaw tsim khoom CVD txheej txuas ntxiv mus.
IV. Cov teeb meem ntawm CVD SiC txheej txheem yog dab tsi?
Txawm hais tias muaj cov txiaj ntsig zoo ntawm CVD SiC txheej, nws txoj kev tsim khoom thiab kev siv tseem ntsib qee qhov teeb meem ntawm cov txheej txheem. Kev daws cov teeb meem no yog qhov tseem ceeb rau kev ua tiav kev ua tau zoo thiab kev siv nyiaj tsawg.
Cov Kev Sib Tw:
1. Kev nplaum rau cov khoom siv hauv qab
SiC tuaj yeem nyuaj rau kev ua kom muaj zog thiab sib npaug rau ntau yam khoom siv substrate (piv txwv li, graphite, silicon, ceramic) vim muaj qhov sib txawv ntawm cov coefficients thermal expansion thiab lub zog ntawm qhov chaw. Kev nplaum tsis zoo tuaj yeem ua rau delamination thaum lub sijhawm thermal cycling lossis kev ntxhov siab mechanical.
Cov Kev Daws Teeb Meem:
Kev npaj ntoKev ntxuav thiab kho qhov chaw kom zoo (piv txwv li, etching, plasma treatment) ntawm lub substrate kom tshem tawm cov pa phem thiab tsim kom muaj qhov chaw zoo tshaj plaws rau kev sib txuas.
Cov txheej txheem sib txuasTso ib txheej nyias nyias thiab kho raws li qhov xav tau (piv txwv li, pyrolytic carbon, TaC - zoo ib yam li CVD TaC txheej hauv cov ntawv thov tshwj xeeb) kom txo qhov tsis sib xws ntawm kev nthuav dav thermal thiab txhawb kev nplaum.
Optimize cov txheej txheem deposition: Ua tib zoo tswj qhov kub thiab txias, siab, thiab qhov sib piv ntawm cov roj kom zoo tshaj plaws rau kev tsim cov nucleation thiab kev loj hlob ntawm cov yeeb yaj kiab SiC thiab txhawb kev sib txuas lus zoo.
2. Kev Nyuaj Siab thiab Kev Tawg Ntawm Zaj Duab Xis
Thaum lub sijhawm tso tawm lossis tom qab txias, cov kev ntxhov siab seem yuav tshwm sim hauv SiC zaj duab xis, ua rau tawg lossis warping, tshwj xeeb tshaj yog rau ntawm cov duab loj dua lossis nyuaj.
Cov Kev Daws Teeb Meem:
Kev Tswj Kub: Tswj cov cua sov thiab cua txias kom meej kom txo tau qhov kub thiab txias thiab kev ntxhov siab.
Txheej GradientSiv cov txheej txheem ntau txheej lossis gradient txheej kom maj mam hloov cov khoom siv sib xyaw lossis cov qauv kom haum rau kev ntxhov siab.
Kev Kho Mob Tom Qab Kev Rho Tawm: Ua kom cov khoom uas tau coated kom tshem tawm cov kev ntxhov siab seem thiab txhim kho kev ua kom zoo ntawm zaj duab xis.
3. Kev sib haum xeeb thiab kev sib npaug ntawm cov qauv sib xyaw ua ke
Kev tso cov txheej txheem tuab thiab sib xws rau ntawm cov khoom uas muaj cov duab nyuaj, cov piv ntawm cov ces kaum siab, lossis cov channel sab hauv tuaj yeem nyuaj vim muaj kev txwv hauv kev sib kis ntawm cov khoom ua ntej thiab cov kinetics ntawm cov tshuaj tiv thaiv.
Cov Kev Daws Teeb Meem:
Kev Tsim Qauv Reactor Zoo Tshaj PlawsTsim cov CVD reactors nrog cov roj ntws zoo tshaj plaws thiab qhov kub thiab txias sib xws kom ntseeg tau tias cov precursors faib sib xws.
Kev Kho Kom Zoo Dua Cov Txheej Txheem: Kho kom zoo dua qhov siab ntawm cov dej tso tawm, qhov nrawm ntawm cov dej ntws, thiab qhov concentration ntawm cov khoom ua ntej kom txhim kho cov roj theem sib kis mus rau hauv cov yam ntxwv nyuaj.
Kev tso dej ntau theemSiv cov kauj ruam tso dej tas mus li lossis cov khoom siv tig kom ntseeg tau tias txhua qhov chaw tau coated txaus.
V. Cov Lus Nug Feem Ntau
Q1: Qhov txawv tseem ceeb ntawm CVD SiC thiab PVD SiC hauv cov ntawv thov semiconductor yog dab tsi?
A: CVD coatings yog cov qauv siv lead ua ke nrog qhov huv ntawm > 99.99%, tsim nyog rau cov chaw plasma; PVD coatings feem ntau yog amorphous / nanocrystalline nrog qhov huv ntawm <99.9%, feem ntau yog siv rau cov khoom siv kho kom zoo nkauj.
Q2: Qhov kub siab tshaj plaws uas lub txheej tuaj yeem tiv taus yog dab tsi?
A: Kev kam rau lub sijhawm luv luv ntawm 1650 ° C (xws li cov txheej txheem annealing), kev siv mus sij hawm ntev ntawm 1450 ° C, tshaj qhov kub no yuav ua rau muaj kev hloov pauv theem ntawm β-SiC mus rau α-SiC.
Q3: Feem ntau cov txheej tuab tuab?
A: Cov khoom siv semiconductor feem ntau yog 80-150μm, thiab cov txheej txheem EBC ntawm lub cav dav hlau tuaj yeem ncav cuag 300-500μm.
Q4: Cov yam tseem ceeb uas cuam tshuam rau tus nqi yog dab tsi?
A: Kev huv ntawm cov khoom ua ntej (40%), kev siv zog ntawm cov khoom siv (30%), kev poob qoob loo (20%). Tus nqi ntawm cov txheej txheem siab kawg tuaj yeem ncav cuag $ 5,000 / kg.
Q5: Cov neeg muab khoom loj thoob ntiaj teb yog dab tsi?
A: Tebchaws Europe thiab Tebchaws Meskas: CoorsTek, Mersen, Ionbond; Asia: Semixlab, Veteksemicon, Kallex (Taiwan), Scientech (Taiwan)
Lub sijhawm tshaj tawm: Lub Rau Hli-09-2025