Mhete dzeCVD dzekuputiraDzinoita basa rakakosha mukuchekerera kwema semiconductor emazuva ano nekudzikamisa miganhu yeplasma uye kuona kuti maion anopararira zvakaenzana muwafer. Chinyorwa chino chinotsanangura kuti nei zvichikosha kune ma node epamusoro, zvichiratidza kukanganisa kwadzo pakufanana kwe etch, kudzora CD, kuderedza kusvibiswa, uye kugona kwese kwekuita.
Ⅰ. Kubva paPlasma Etching kusvika kuFocused Ring Engineering
Kucheka kweplasma ndeimwe yematekinoroji akakosha ekugadzira mapatani mukugadzirwa kwema semiconductor emazuva ano, zvichigonesa kugadzirwa kwezvinhu zve nanoscale zvinodiwa pakushandisa logic ne memory devices yepamusoro. Sezvo ma node etekinoroji achiramba achiderera pasi pe 10 nanometers uye magadzirirwo emidziyo achichinja kuenda kuFinFET neGate-All-Around (GAA), kushivirira kwekuchinja kwemaitiro kwaderera zvakanyanya. Nhasi, ma parameter akadai se etch uniformity, critical dimension (CD) control, uye defect density anofanirwa kudzorwa ne near-atomic precision.
Kunyange hazvo kugadzirisa maitiro kuchinyanya kutarisa pa plasma chemistry, radio frequency (RF), uye dhizaini yekamuri, chinhu chakakosha zvakafanana - asi kazhinji chisinganyanyi kukosha - chiri mukudzora mamiriro emiganhu pamucheto wewafer. Apa ndipo chaipo apo focus ring inoita basa rakakosha. Iri pedyo newafer iri pa electrostatic chuck (ESC), focus ring inoshanda se boundary modifier, ichichinja patsva nzvimbo yemagetsi yemuno, ichidzikamisa plasma sheath, uye ichiona kugoverwa kwemaion kwakafanana pamusoro pewafer yese.
Munzvimbo dzakagadzirwa zvakanaka, ma "focus rings" akaputirwa ne "chemical vapor deposition" (CVD) ave ndiwo anonyanya kushandiswa muindasitiri nekuda kwehunhu hwawo hwepamusoro hwezvinhu. Izvi zvinhu hazvisi zvinhu zvinongoshandiswa chete; zvinhu zvakagadzirwa nemazvo zvinokanganisa maitiro eplasma, kugadzikana kwemaitiro, uye pakupedzisira zvinosarudza kugona kwemidziyo.
Ⅱ. Nei Mhete Dzekutarisa Dzichikosha Pakunyora Zvakanyanya Kunaka
Mumasystem ekucheka kweplasma, mipendero yewafer inoratidza kusagadzikana mumamiriro ese ari maviri ejometri uye emagetsi. Pasina matanho akakodzera ekubhadhara, kusagadzikana uku kunotungamira mukukanganiswa kwakakosha mumunda wemagetsi uye plasma sheath, zvichikonzera chinonzi "edge effect." Mhedzisiro iyi inoratidzwa semakona einjini yeion isina kufanana uye kuchinja-chinja kwehuwandu hweion flux, zvichikonzera kutsauka mumazinga eetch uye ma profiles etch pedyo newafer edge.
Zvidzidzo zvekuedza uye zvedzidziso zvinoratidza kuti, kana pasina magadzirirwo emupendero wemucheto, nzvimbo inosvika mamirimita akati wandei mukati kubva kumucheto wewafer inova nzvimbo yemupendero isingashandiswi¹. Kune ma node etekinoroji yepamusoro, uko saizi dzemachipu dzakakura uye miganho yekushanda yakamanikana zvakanyanya, kurasikirwa kwakadaro kwenzvimbo hakugamuchirwi mune zvemari.
Kuunzwa kwering yekutarisisa kunotambanudza muganhu weplasma kupfuura mupendero chaiwo wewafer, nokudaro zvichigadzira chimiro chesheath chakafanana. Nekupa nharaunda yemagetsi neyakajairika inodzorwa, ring yekutarisisa inoita kuti nzira dzemaion dzirambe dzakafanana zvakanyanya pamusoro pewafer yese. Izvi zvakakosha kuti pave nemazinga akafanana anodiwa nekugadzirwa kwehuwandu hwemazuva ano; munzvimbo dzakadaro dzekugadzira, chinangwa chekufanana kwein-wafer etch chinowanzoiswa mukati mehuwandu hwe±2%.
Uyezve, nekusimbisa mamiriro emuganho wekamuri pakati pemawafer akasiyana, ring yekutarisisa inobatsira kuvandudza kudzokorora kwemaitiro. Munzvimbo dzekugadzira dzine simba rakawanda, kunyangwe kuchinja kudiki mumamiriro emuganho kunogona kutungamira mukudonha kwemaitiro; saka, kugadzikana kwekushanda kwering yekutarisisa kwakakosha zvikuru.
Ⅲ. Kukosha Kwakakosha Kwemachira eCVD
Sezvo maitiro ekucheka plasma ari kuramba achinetsa—kunyanya nekushandiswa kwakawanda kwemakemikari akavakirwa pafluorine nechlorine—zvinodiwa nezvinhu zvema focus rings zvavewo zvakaoma. Zvinhu zvechinyakare zvakaita se quartz kana bulk ceramics zvinowanzova nematambudziko e etch rates, katsika kekugadzira zvidimbu, uye kusagadzikana kwakashata kana zvasvika pakusangana neplasma kwenguva refu. CVD coatings—kunyanya CVD SiC (silicon carbide) uye CVD carbon coatings—zvinobudirira kukunda zvipingamupinyi izvi nekuda kwehunhu hwazvo hwakasiyana hwe microstructure uye makemikari.
Chinhu chikuru chinowanikwa paCVD coatings ndechekuti ine huwandu hwakanyanya, hunosvika padanho redzidziso, uye ine porosity yakaderera, izvo zvinoita kuti irambe yakasimba pa plasma-induced etching. Zvidzidzo zvakaratidza kuti munzvimbo ine fluorine-based plasma, etch rate yeCVD SiC inongova chidimbu chidiki pane yequartz, zvichiita kuti ive chinhu chakakodzera che etching processes kwenguva refu, ine simba guru. Kugara kwenguva refu uku kunoreva zvakananga kuti zvikamu zvinorarama kwenguva refu uye nguva shoma yekuchengetedza.
Chinhu chakakoshawo inyaya yekudzora kusvibiswa. Zvidimbu zvinogadzirwa nezvikamu zvemukamuri zvinoramba zviri chimwe chezvikonzero zvikuru zvekurasikirwa negoho mumabasa ekugadzira e semiconductor epamusoro. Zvichienderana neSEMI standards uye zvidzidzo zvekudzora kusvibiswa zvine chekuita nazvo, kunyange zvidimbu zve sub-micron zvinogona kukonzera zvikanganiso zvakakomba, kunyanya muma node epamusoro ari pasi pe10 nanometers. CVD coatings, ine hunhu hwayo hwakakora uye hwakagadzikana pamusoro, inoderedza zvakanyanya njodzi yekupararira kwe micro-spalling pamusoro uye kusunungurwa kwetsvina, nokudaro ichibatsira kugadzira nzvimbo yakachena yemaitiro uye kuvandudza goho.
CVD SiC Film Crystal uye Micro Structure
Chimwe chinhu chakakosha ndechekudzora kubuda kwemaerekitironi maviri (SEE). Kudyidzana kuripo pakati peplasma nepamusoro pekamuri kunokanganiswa zvakanyanya nehunhu hweSEE, izvo zvinokanganisa huwandu hweplasma uye kugadzikana. Zvichienzaniswa nezvinhu zvechinyakare, nzvimbo dzakaputirwa neCVD dzinoratidza hunhu hweSEE hwakafanana uye hunogoneka, zvichiita kuti kutonga kwemamiriro eplasma kuve kwakanyatsojeka uye kuvandudza kudzokorora kwemaitiro.
Kugadzikana kwekupisa ndeimwe mukana mukuru weCVD coatings. Maitiro eplasma ane density yakawanda anowanzo buritsa mafuta akawanda, kunyanya munzvimbo dzewafer edge. Zvinhu zvakaita seCVD SiC zvine thermal conductivity yakanaka uye zvinogona kudzora thermal expansion properties, zvichideredza njodzi yekutsemuka, kukotama, kana delamination pasi pe cyclic thermal stress. Kusimba kwechimiro ichi kwakakosha pakuona kushanda kwakafanana mukati menguva refu yekushanda.
Ⅳ. Mhedzisiro paMaitiro Ekuita Etching Key Etching
Mhete Yekutarisa YeCVD Yakabatanidzwa
Mhete iyi yekutarisa ichave nemhedzisiro yakananga uye inogoneka kuverengwa pamatanho akawanda ekushanda akakosha mumaitiro ekucheka e semiconductor. Chimwe chezviyero zvakakosha ndeyekuenzana kwe etch. Nekudzikamisa plasma sheath uye kuona kuti kugoverwa kweion flux kwakaenzana, mhete dzekutarisa dzakaputirwa neCVD dzinogonesa kudzora kwakasimba pamusoro pekuenzana kwewafer-wide, kazhinji dzichiwana ±2% chaiyo inodiwa pakugadzira michina yepamusoro. Iyi nhanho yekudzora inonyanya kukosha kune maitiro ekucheka ane aspect ratio, uko kunyangwe kutsauka kudiki kunogona kutungamira mukukanganiswa kwakanyanya kweprofile ye etch.
Kudzora Kwechikamu Chinokosha (CD)
Kuchinja-chinja kwema ion incidence angles pamucheto we wafer kunogona kukonzera kutsauka kweCD, uye nyaya iyi inowedzera kuoma sezvo saizi dzechinhu dzichiramba dzichiderera. Nekuchengetedza mamiriro emagetsi akafanana, ring yekutarisa inobatsira kuona kuti ma ion trajectories akafanana, nokudaro ichideredza kushanduka kweCD pa wafer yese. Izvi zvakakosha pakuchengetedza mashandiro emudziyo uye kusangana nezvinodiwa pakugadzira ma process nodes epamusoro.
Kuvandudza Kudzokorora uye Kugadzikana Kwemaitiro
Machira eCVD anopa nzvimbo yakasimba uye inogara kwenguva refu ine hunhu hwayo hunoramba hwakafanana nekufamba kwenguva, zvichideredza kuyerera kwemamiriro eplasma uye zvichiita kuti pave nekushanda kwakafanana mumawafers. Munzvimbo dzekugadzira dzakawanda, izvi zvakakosha pakushandisa Statistical Process Control (SPC).
Kubudirira Kwekudzora Zvidimbu
Kuderedzwa kwekupfekwa uye kuvandudzwa kwehunhu hwepamusoro kunoderedza kugadzirwa kwezvikamu, izvo zvinokanganisa zvakananga goho uye kuvimbika kwemidziyo. Mukugadzirwa kwe semiconductor yepamusoro, uko zvinangwa zvekudzora defect density zvakanyanya kuoma, mukana uyu wega wakakwana kuti uratidze kushandiswa kwezvikamu zvakaputirwa neCVD.
Sezvo indasitiri yesemiconductor ichida kunyatsorongeka kwemaitiro uye mashandiro ezvigadzirwa zvichiramba zvichikwira, kuvandudzwa nekuwanikwa kweMhete dzekutarisa dzakaputirwa neCVDvari kuramba vachiwanda pakati pevagadziri vashoma vakasarudzwa vane hunyanzvi, vanotungamirirwa netekinoroji. Makambani akadai seHeksabhoni, Vetek SemiconductoruyeSemiceraVakagadzira chinzvimbo chakasimba mumusika uyu kuburikidza nehunyanzvi hwavo hwepamusoro hweCVD coating, kugona kwavo kugadzirisa zvinhu zvine hutsanana, uye kubatanidzwa kwakadzika nezvinodiwa zvemidziyo ye semiconductor. Kunyanya, makambani akaita seVetek neSemicera anotarisa pakupa mhinduro dzeinjiniya dzakagadzirirwa ivo, kugadzirisa magadzirirwo emhete dze focus zvichienderana nemafomula chaiwo e etch chemistry uye mapuratifomu emidziyo; nepo Hexcarbon yakavaka mukurumbira wakasimba mumusika zvichibva pahunyanzvi hwayo mu high-purity graphite uye zvikamu zvakaputirwa zvekushandisa semiconductor. Kusanganiswa uku kwehunyanzvi hwesainzi yezvinhu uye ruzivo rwehunyanzvi hwe process technology kunoita kuti makambani aya akwanise kusangana nezvinodiwa zvakanyanya zvekugadzira semiconductor yechizvarwa chinotevera.
Mareferensi:
"Nheyo dzePlasma Discharges uye Kugadziriswa kweZvinhu"
"Journal of Vacuum Science & Technology A"
Nguva yekutumira: Kurume-20-2026