Zvikamu zveSiC Epitaxial

Mapeti eCVD epamusoro eSiC Epitaxial Growth

Yakagadzirirwa michina yedu ye semiconductor ine simba guru inoshanda pasi pekumanikidzwa kwakanyanya kwekupisa (1500°C - 1700°C), maCVD SiC neTaC coated planetary susceptors edu, satellite disks, uye gas deflectors zvakagadzirwa kuti zvibudirire. Yakagadzirwa kudzivirira kugadzirwa kwezvikamu, kuora kwenzvimbo, uye reactive gas etching (H₂, SiH₄, C₃H∯), macoatings edu epamusoro anovimbisa kushanda kwenguva refu, kutonga kwepamusoro kwedopant, uye kufanana kwehupamhi hwefirimu mukati mese.Mawafer eSiC epitaxial ane 6-inch uye 8-inch.

Kugadzikana Kwekupisa Kwakanyanya

Kugara zvakanaka pakupisa kusvika 1700°C munzvimbo dzakaoma dzekuderedza H₂/silane.

Kufananidza kweGradient CTE

Inobvisa kucheka kweganda, kutsemuka kweganda, uye kupwanyika kweganda panguva yekupisa kunokurumidza.

Kugadzirira Chikero cheWafer che 8-Inch

Machining eCNC akagadzirwa zvakanaka kuti ashandiswe neSiC Epi reactors yepamusoro-soro (LPE, Aixtron, Nuflare).

Chiratidzo cheUnyanzvi Kukosha Kwekutsanangurwa Nzira Yakajairwa / Yekuyedza
Sarudzo dzezvinhu zvekuputira CVD SiC / Tantalum Carbide (TaC) Rutivi rweHemetic Rwakachena Kwazvo
Chikamu chepasi Graphite Yakacheneswa Isostatic Kusachena Kwakawanda < 5 ppm
Kuramba Kupisa Kwekupisa Delta T > 500°C Rate Rate Hapana Kutsemuka/Kubvunda
Kuoma Kwepamusoro (Ra) ≤ 0.4 μm (Girazi Rakakweshwa) Inodzivirira Wafer Kunamira & Zvidimbu
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