Izindandatho zokugxila ze-CVD coatingzidlala indima ebalulekile ekuqopheni kwe-semiconductor yesimanje ngokuqinisa imingcele ye-plasma nokuqinisekisa ukusatshalaliswa kwama-ion okufanayo kuyo yonke i-wafer. Lesi sihloko sichaza ukuthi kungani zibalulekile kuma-node athuthukile, sigqamisa umthelela wazo ekufaneni kwe-etch, ukulawulwa kwe-CD, ukunciphisa ukungcola, kanye nokukhiqiza kwenqubo iyonke.
Ⅰ. Kusukela Ekuqopheni I-Plasma Kuya Kubunjiniyela Bendandatho Egxilile
Ukuqopha nge-plasma kungenye yezindlela zobuchwepheshe ezibaluleke kakhulu zokudweba amaphethini ekukhiqizweni kwe-semiconductor yesimanje, okuvumela ukudalwa kwezici ze-nanoscale ezidingekayo kumadivayisi e-logic athuthukile kanye nememori. Njengoba ama-node obuchwepheshe eqhubeka nokuncipha ngaphansi kwama-nanometer ayi-10 kanye nokwakheka kwamadivayisi kuguqukela ezakhiweni ze-FinFET kanye ne-Gate-All-Around (GAA), ukubekezelelana kokushintshashintsha kwenqubo kunciphe kakhulu. Namuhla, amapharamitha afana nokufana kwe-etch, ukulawulwa kobukhulu obubalulekile (CD), kanye nobuningi bephutha kumele kulawulwe ngokunemba okucishe kube yi-athomu.
Nakuba ukwenza ngcono inqubo kuvame ukugxila kumakhemikhali e-plasma, amandla e-radio frequency (RF), kanye nomklamo wegumbi, into ebaluleke ngokulinganayo—kodwa evame ukungagqami kangako—ilele ekulawuleni izimo zomngcele emaphethelweni e-wafer. Yilapho kanye indandatho yokugxila idlala khona indima ebalulekile. Itholakala eduze kwe-wafer ku-electrostatic chuck (ESC), indandatho yokugxila isebenza njengokuguqula umngcele, ishintsha insimu kagesi yendawo, izinzise i-plasma sheath, futhi iqinisekise ukusatshalaliswa kwe-ion okufanayo kuwo wonke umphezulu we-wafer.
Ezindaweni ezithuthukisiwe zokuqopha, amasongo okugxila ambozwe nge-chemical vapor deposition (CVD) aseyindinganiso embonini ngenxa yezakhiwo zawo ezisezingeni eliphezulu. Lezi zingxenye azizona nje izinto ezisetshenziswayo; ziyizindawo eziklanywe ngokunemba ezithinta ngqo ukuziphatha kwe-plasma, ukuzinza kwenqubo, futhi ekugcineni zinqume ukukhiqizwa kwedivayisi.
Ⅱ. Kungani Amasongo Okugxila Ebaluleke Kakhulu Ekuqopheni Okunembe Kakhulu
Ezinhlelweni zokuqopha nge-plasma, imiphetho ye-wafer ibonisa ukungaqhubeki kokubili ezimweni ze-geometry kanye nemingcele kagesi. Ngaphandle kwezinyathelo ezifanele zokubuyisela, lokhu kungaqhubeki kuholela ekuphazamisekeni okukhulu ensimini kagesi kanye ne-plasma sheath, okubangela lokho okubizwa ngokuthi "umphumela womphetho." Lo mphumela ubonakala njengama-engeli okungahambisani kwama-ion kanye nokushintshashintsha kobuningi be-ion flux, okuholela ekuphambukeni kwamazinga e-etch kanye namaphrofayili e-etch eduze komphetho we-wafer.
Izifundo zokuhlola nezethiyori zibonisa ukuthi, uma kungekho zakhiwo zokunciphisa umkhawulo, indawo edlula amamilimitha amaningana ingena kusukela onqenqemeni lwe-wafer iba yindawo engasetshenzisekiyo¹. Kuma-node obuchwepheshe obuthuthukisiwe, lapho osayizi be-chip bukhulu khona futhi imingcele yenqubo iqine kakhulu, ukulahlekelwa kwendawo okunjalo akwamukeleki ngokwezomnotho.
Ukwethulwa kwendandatho yokugxila kwandisa ngempumelelo umngcele we-plasma ngaphandle komphetho ongokoqobo we-wafer, ngaleyo ndlela kudala isakhiwo se-sheath esifanayo. Ngokuhlinzeka ngendawo kagesi neyomzimba elawulwayo, indandatho yokugxila iqinisekisa ukuthi imizila yama-ion ihlala ihambisana kakhulu kuyo yonke indawo ye-wafer. Lokhu kubalulekile ekufinyeleleni amazinga afanayo adingekayo ekukhiqizweni kwesisindo kwesimanje; ezindaweni ezinjalo zokukhiqiza, umgomo wokufana kwe-etch ngaphakathi kwe-wafer ngokuvamile ubekwa ngaphakathi kwebanga elingu-±2%.
Ngaphezu kwalokho, ngokuqinisa izimo zomngcele wegumbi phakathi kwama-wafer ahlukene, indandatho yokugxila isiza ekuthuthukiseni ukuphindaphindeka kwenqubo. Ezindaweni zokukhiqiza ezisebenzisa amandla amaningi, ngisho nokushintshashintsha okuncane ezimweni zomphetho kungaholela ekukhukhuleni kwenqubo eqongelelekayo; ngakho-ke, ukuzinza kokusebenza kwendandatho yokugxila kubaluleke kakhulu.
Ⅲ. Inani Eliyinhloko Lezingubo Ze-CVD
Njengoba izinqubo zokuqopha i-plasma ziba nzima kakhulu—ikakhulukazi ngokwamukelwa kabanzi kwezinqubo zamakhemikhali ezisekelwe ku-fluorine kanye ne-chlorine—izidingo zezinto zokwakha izindandatho zokugxila nazo ziye zaba nzima kakhulu. Izinto zendabuko ezifana ne-quartz noma i-ceramics eningi zivame ukuba namazinga aphezulu okuqopha, ukuthambekela kokukhiqiza izinhlayiya, kanye nokuqina okungekuhle ngaphansi kokuchayeka isikhathi eside ku-plasma. Izembozo ze-CVD—ikakhulukazi i-CVD SiC (i-silicon carbide) kanye nezembozo ze-CVD carbon—zinqoba ngempumelelo le mikhawulo ngenxa yesakhiwo sazo esincane kanye nezakhiwo zamakhemikhali.
Isici esibalulekile sezingubo ze-CVD ubuningi bazo obuphezulu kakhulu, obuseduze nobuningi bethiyori, kanye ne-porosity yazo ephansi kakhulu, okuthuthukisa kakhulu ukumelana kwazo nokugqwala okubangelwa yi-plasma. Izifundo zibonise② ukuthi endaweni ye-plasma esekelwe ku-fluorine, izinga lokugqwala le-CVD SiC liyingxenyana nje ye-quartz, okwenza kube yinto efanelekile yezinqubo zokugqwala ezinde, ezinamandla aphezulu. Lokhu kuqina okwandisiwe kuhumushela ngqo ekuphileni kwesikhathi eside kwezingxenye kanye nemvamisa yokugcinwa encishisiwe.
Okubaluleke ngokulinganayo udaba lokulawulwa kokungcola. Izinhlayiya ezikhiqizwe yizingxenye zegumbi zihlala zingenye yezimbangela eziyinhloko zokulahlekelwa kwesivuno ezinqubweni zokukhiqiza ze-semiconductor ezithuthukisiwe. Ngokwezindinganiso ze-SEMI kanye nezifundo zokulawula ukungcola ezifanele, ngisho nezinhlayiya ze-sub-micron zingabangela amaphutha abalulekile, ikakhulukazi kuma-node enqubo athuthukile angaphansi kwama-nanometer ayi-10. Izembozo ze-CVD, ezinezakhiwo zazo eziqinile nezizinzile, zinciphisa kakhulu ingozi yokuchitheka okuncane komhlaba kanye nokukhishwa kokungcola, ngaleyo ndlela zisize ekudaleni indawo yenqubo ehlanzekile futhi zithuthukise isivuno.
I-CVD SiC Film Crystal kanye nesakhiwo esincane
Esinye isici esibalulekile ukulawulwa kokukhishwa kwama-electron okwesibili (SEE). Ukusebenzisana phakathi kwe-plasma kanye nobuso bekamelo kuthonywa kakhulu yizici ze-SEE, ezithinta ukuminyana kwe-plasma kanye nokuzinza. Uma kuqhathaniswa nezinto zendabuko, izindawo ezimbozwe nge-CVD zibonisa izici ze-SEE ezihambisanayo nezibikezelayo, okuvumela ukulawulwa okunembe kakhudlwana kwezimo ze-plasma kanye nokuthuthukisa ukuphindaphindwa kwenqubo.
Ukuzinza kokushisa kungenye inzuzo ebalulekile yezingubo ze-CVD. Izinqubo ze-plasma ezixinene kakhulu zivame ukukhiqiza imithwalo ebalulekile yokushisa, ikakhulukazi ezindaweni ezisemaphethelweni e-wafer. Izinto ezifana ne-CVD SiC zinokuqhuba okuhle kakhulu kokushisa kanye nezakhiwo zokukhulisa ukushisa ezilawulwayo, okunciphisa ngempumelelo ingozi yokuqhekeka, ukugoba, noma ukuhlukanisa ngaphansi kokucindezeleka kokushisa okujikelezayo. Lokhu kuqina kwesakhiwo kubalulekile ekuqinisekiseni ukusebenza okuqhubekayo kuyo yonke imijikelezo yenqubo ende.
Ⅳ. Umthelela kumaMethrikhi Okusebenza Kokuqopha Okubalulekile
Indandatho Yokugxila Yokumboza I-CVD Ehlanganisiwe
Le ring yokugxila izoba nomthelela oqondile futhi olinganiswayo kuma-metric amaningi okusebenza okubalulekile ezinqubweni zokuqopha ze-semiconductor. Enye yezilinganiso ezibaluleke kakhulu ukufana kwe-etch. Ngokuzinzisa i-plasma sheath nokuqinisekisa ukusatshalaliswa kwe-ion flux efanayo, ama-focused rings ahlanganiswe ne-CVD avumela ukulawula okuqinile kokufana kwe-wafer-wide, ngokuvamile afinyelela ukunemba okungu-±2% okudingekayo ekukhiqizweni kwedivayisi okuthuthukisiwe. Leli zinga lokulawula libaluleke kakhulu ezinqubweni zokuqopha ze-aspect ratio ephezulu, lapho ngisho nokuphambuka okuncane kungaholela ekuphazamisekeni okukhulu kwephrofayili ye-etch.
Ukulawulwa Kwezinga Elibucayi (CD)
Ukuguquguquka kwama-engeli okwenzeka kwama-ion emaphethelweni e-wafer kungabangela ukuphambuka kwe-CD, futhi le nkinga iba yinselele njengoba ubukhulu besici buqhubeka nokuncipha. Ngokulondoloza izimo zensimu kagesi ezihambisanayo, indandatho yokugxila isiza ukuqinisekisa ukufana kwezindlela ze-ion, ngaleyo ndlela kunciphisa ukuguquguquka kwe-CD kulo lonke i-wafer. Lokhu kubalulekile ekugcineni ukusebenza kwedivayisi nokuhlangabezana nemininingwane yomklamo kuma-node enqubo athuthukile.
Ukuthuthukisa Ukuphindaphinda Kwenqubo Nokuzinza
Izembozo ze-CVD zinikeza indawo ezinzile nehlala isikhathi eside enezakhiwo ezihlala zifana ngokuhamba kwesikhathi, ngaleyo ndlela kunciphisa ukukhukhuleka kwesimo se-plasma futhi kuvumela ukusebenza okuhlala njalo kuzo zonke izingcezu ze-wafer. Ezindaweni zokukhiqiza ezinomthamo omkhulu, lokhu kubalulekile ekusebenziseni i-Statistical Process Control (SPC).
Ukusebenza Okuthuthukisiwe Kokulawula Izinhlayiya
Ukuncipha kokuguguleka kanye nokuqina kobuso okuthuthukisiwe kunciphisa ukukhiqizwa kwezinhlayiya, okuthinta ngqo ukukhiqizwa kanye nokuthembeka kwedivayisi. Ekukhiqizweni kwe-semiconductor okuthuthukisiwe, lapho imigomo yokulawula ubuningi besici iqine kakhulu, le nzuzo iyodwa yanele ukuthethelela ukwamukelwa kwezingxenye ezimbozwe yi-CVD.
Njengoba izidingo zemboni ye-semiconductor zokunemba kokulawula inqubo kanye nokusebenza kwezinto ziqhubeka nokukhula, ukuthuthukiswa kanye nokunikezwa kwe-Izindandatho zokugxila ezimbozwe nge-CVDzigxile kakhulu phakathi kwabakhiqizi abambalwa abakhethekile, abaqhutshwa ubuchwepheshe. Izinkampani ezifanaI-Hexcarbon, I-Vetek Semiconductor, futhiI-SemiceraBasungule isikhundla esiqinile emakethe kulo mkhakha ngokusebenzisa ubuchwepheshe babo obuthuthukisiwe bokumboza i-CVD, amakhono okucubungula izinto ezihlanzekile kakhulu, kanye nokuhlanganiswa okujulile nezidingo zemishini ye-semiconductor. Ngokukhethekile, izinkampani ezifana ne-Vetek ne-Semicera zigxile ekuhlinzekeni ngezixazululo zobunjiniyela ezenziwe ngokwezifiso, zivumelanisa imiklamo yendandatho yokugxila nezakhiwo ezithile ze-etch chemistry kanye namapulatifomu emishini; kuyilapho i-Hexcarbon yakhe idumela eliqinile emakethe ngokusekelwe kubuchwepheshe bayo ku-graphite ehlanzekile kakhulu kanye nezingxenye ezimboziwe zezinhlelo zokusebenza ze-semiconductor. Lokhu kuhlanganiswa kobuchwepheshe besayensi yezinto zokwakha kanye nolwazi lobuchwepheshe bezinqubo kwenza lezi zinkampani zihlangabezane nezidingo eziqinile zokukhiqiza i-semiconductor yesizukulwane esilandelayo.
Izinkomba:
"Izimiso Zokukhishwa Kwe-Plasma Nokucubungula Izinto"
"I-Journal of Vacuum Science & Technology A"
Isikhathi sokuthunyelwe: Mashi-20-2026