ƙera kowace samfurin semiconductor yana buƙatar ɗaruruwan matakai. Mun raba dukkan tsarin ƙera zuwa matakai takwas:wafer ɗin wafersarrafawa-haɗakarwa-photolithography-etching-siraran ajiyar fim-ci gaban epitaxial-warwatse-ion dasawa.
Domin taimaka muku fahimtar da kuma gane na'urorin semiconductor da sauran hanyoyin da suka shafi hakan, za mu tura labaran WeChat a cikin kowace fitowa don gabatar da kowanne daga cikin matakan da ke sama ɗaya bayan ɗaya.
A cikin labarin da ya gabata, an ambaci cewa domin karewafer ɗin waferDaga ƙazanta daban-daban, an yi fim ɗin oxide -- tsarin oxidation. A yau za mu tattauna "tsarin photolithography" na ɗaukar hoton da'irar ƙirar semiconductor akan wafer tare da fim ɗin oxide da aka samar.
Tsarin daukar hoto
1. Menene tsarin photolithography?
Ana yin amfani da photolithography don yin da'irori da wuraren aiki da ake buƙata don samar da guntu.
Ana amfani da hasken da injin daukar hoto ke fitarwa don fallasa siririn fim ɗin da aka lulluɓe da mai hana daukar hoto ta hanyar abin rufe fuska mai tsari. Mai hana daukar hoto zai canza halayensa bayan ya ga hasken, ta yadda tsarin da ke kan abin rufe fuska zai kwafi siririn fim ɗin, ta yadda siririn fim ɗin zai yi aiki kamar zane na kewaye na lantarki. Wannan shine aikin daukar hoto, kamar ɗaukar hoto da kyamara. Hotunan da kyamara ta ɗauka an buga su a kan fim ɗin, yayin da hoton daukar hoto ba ya zana hotuna, sai dai zane-zanen kewaye da sauran kayan lantarki.
Photolithography wata fasaha ce ta micro-machine wadda aka tsara musamman don yin
Tsarin daukar hoto na al'ada tsari ne da ke amfani da hasken ultraviolet mai tsawon tsayin angstroms 2000 zuwa 4500 a matsayin mai ɗaukar bayanai na hoto, kuma yana amfani da photoresist a matsayin matsakaici (rikodin hoto) don cimma canji, canja wuri da sarrafa zane-zane, kuma a ƙarshe yana aika bayanan hoton zuwa guntu (galibi guntu na silicon) ko kuma layin dielectric.
Za a iya cewa daukar hoto shine ginshiƙin masana'antar semiconductor ta zamani, microelectronics, da kuma bayanai, kuma daukar hoto kai tsaye yana ƙayyade matakin ci gaban waɗannan fasahohin.
A cikin sama da shekaru 60 tun bayan nasarar ƙirƙirar da'irori masu haɗawa a shekarar 1959, faɗin layin zane-zanensa ya ragu da kimanin tsari huɗu na girma, kuma an inganta haɗin da'irori da fiye da tsari shida na girma. Ci gaban waɗannan fasahohin ya samo asali ne daga ci gaban photolithography.
(Bukatun fasahar photolithography a matakai daban-daban na haɓaka kera da'irori masu haɗawa)
2. Ka'idojin asali na daukar hoto
Kayan aikin photolithography gabaɗaya suna nufin masu hana haske, waɗanda aka fi sani da masu hana haske, waɗanda sune kayan aiki mafi mahimmanci a cikin photolithography. Wannan nau'in kayan yana da halayen amsawar haske (gami da hasken da ake iya gani, hasken ultraviolet, hasken lantarki, da sauransu). Bayan amsawar sinadarai, narkewar sa yana canzawa sosai.
Daga cikinsu, narkewar photoresist mai kyau a cikin mai haɓakawa yana ƙaruwa, kuma tsarin da aka samu iri ɗaya ne da abin rufe fuska; photoresist mai kyau akasin haka ne, wato, narkewar yana raguwa ko ma ya zama ba ya narkewa bayan an fallasa shi ga mai haɓakawa, kuma tsarin da aka samu ya saba da abin rufe fuska. Fagen aikace-aikacen nau'ikan photoresists guda biyu sun bambanta. Ana amfani da photoresists masu kyau, waɗanda suka kai sama da kashi 80% na jimlar.
Wannan zane ne na tsarin photolithography wanda ke sama
(1) Mannewa:
Wato, ƙirƙirar fim ɗin photoresist mai kauri iri ɗaya, mannewa mai ƙarfi kuma babu lahani a kan wafer ɗin silicon. Domin haɓaka mannewa tsakanin fim ɗin photoresist da wafer ɗin silicon, sau da yawa yana da mahimmanci a fara gyara saman wafer ɗin silicon tare da abubuwa kamar hexamethyldisilazane (HMDS) da trimethylsilyldiethylamine (TMSDEA). Sannan, ana shirya fim ɗin photoresist ta hanyar amfani da murfin juyawa.
(2) Kafin yin burodi:
Bayan an yi amfani da fenti mai juyi, fim ɗin photoresist har yanzu yana ɗauke da wani adadin sinadarin narkewa. Bayan an yi amfani da shi a zafin jiki mafi girma, ana iya cire sinadarin narkewar sosai gwargwadon iko. Bayan an yi amfani da shi kafin a yi amfani da shi, yawan sinadarin photoresist ɗin zai ragu zuwa kusan kashi 5%.
(3) Bayyanawa:
Wato, ana fallasa mai hana haske ga haske. A wannan lokacin, ana samun amsawar haske, kuma bambancin narkewa tsakanin ɓangaren da aka haskaka da ɓangaren da ba a haskaka ba yana faruwa.
(4) Ci gaba da taurarewa:
Samfurin yana nutsewa cikin mai haɓaka. A wannan lokacin, yankin da aka fallasa na mai tsayayyar hoto mai kyau da kuma yankin da ba a fallasa na mai tsayayyar hoto mai korau za su narke a cikin ci gaban. Wannan yana nuna tsari mai girma uku. Bayan haɓakawa, guntu yana buƙatar tsarin magani mai zafi don ya zama fim mai tauri, wanda galibi yana taimakawa wajen ƙara haɓaka mannewar mai tsayayyar hoto ga substrate.
(5) Sassaka:
An yi wa kayan da ke ƙarƙashin na'urar photoresist ɗin fenti. Ya haɗa da fenti mai ruwa da kuma fenti mai bushewar iskar gas. Misali, don fenti mai ruwa da silicon, ana amfani da ruwan acid mai acidic na hydrofluoric acid; don fenti mai ruwa da jan ƙarfe, ana amfani da ruwan acid mai ƙarfi kamar nitric acid da sulfuric acid, yayin da fenti mai bushe yakan yi amfani da hasken plasma ko ion mai ƙarfi don lalata saman kayan da kuma fenti shi.
(6) Rage gudu:
A ƙarshe, ana buƙatar cire mai hana haske daga saman ruwan tabarau. Wannan matakin ana kiransa degumming.
Tsaro shine mafi mahimmancin batu a cikin dukkan samar da semiconductor. Manyan iskar gas masu haɗari da cutarwa na photolithography a cikin tsarin lithography na guntu sune kamar haka:
1. Hydrogen peroxide
Hydrogen peroxide (H2O2) yana da ƙarfi wajen hana tsufa. Haɗuwa kai tsaye na iya haifar da kumburi da ƙonewa a fata da idanu.
2. Xylene
Xylene wani sinadari ne mai narkewa kuma mai haɓaka sinadarai wanda ake amfani da shi a cikin lithography mara kyau. Yana da sauƙin ƙonewa kuma yana da ƙarancin zafin jiki na 27.3℃ kawai (kimanin zafin ɗaki). Yana fashewa lokacin da yawan iskar ke cikin 1%-7%. Maimaita hulɗa da xylene na iya haifar da kumburin fata. Tururin Xylene yana da daɗi, kamar warin jirgin sama; fallasa ga xylene na iya haifar da kumburin idanu, hanci da makogwaro. Shaƙar iskar na iya haifar da ciwon kai, jiri, rashin ci da gajiya.
3. Hexamethyldisilazane (HMDS)
Ana amfani da Hexamethyldisilazane (HMDS) a matsayin layer na farko don ƙara mannewar photoresist a saman samfurin. Yana da wuta kuma yana da yanayin walƙiya na 6.7°C. Yana fashewa lokacin da yawan iska ya kai 0.8%-16%. HMDS yana amsawa sosai da ruwa, barasa da ma'adanai don fitar da ammonia.
4. Tetramethylammonium hydroxide
Ana amfani da Tetramethylammonium hydroxide (TMAH) sosai a matsayin mai haɓaka aikin lithography mai kyau. Yana da guba kuma yana lalata fata. Yana iya zama mai mutuwa idan an haɗiye shi ko kuma a taɓa fata kai tsaye. Idan aka taɓa shi da ƙurar TMAH ko hazo, zai iya haifar da kumburi a idanu, fata, hanci da makogwaro. Shaƙar TMAH mai yawa zai haifar da mutuwa.
5. Chlorine da fluorine
Ana amfani da Chlorine (Cl2) da fluorine (F2) a cikin na'urorin laser na excimer a matsayin tushen hasken ultraviolet mai zurfi da kuma hasken ultraviolet mai tsanani (EUV). Dukansu iskar gas suna da guba, suna kama da kore, kuma suna da ƙamshi mai ƙarfi. Shaƙar wannan iskar gas mai yawa zai haifar da mutuwa. Iskar fluorine na iya amsawa da ruwa don samar da iskar hydrogen fluoride. Iskar hydrogen fluoride wani sinadari ne mai ƙarfi wanda ke fusata fata, idanu da hanyoyin numfashi kuma yana iya haifar da alamu kamar ƙonewa da wahalar numfashi. Yawan sinadarin fluoride na iya haifar da guba ga jikin ɗan adam, yana haifar da alamu kamar ciwon kai, amai, gudawa, da suma.
6. Argon
Argon (Ar) iskar gas ce da ba ta haifar da wata illa ga jikin ɗan adam ba, wadda yawanci ba ta haifar da illa ga jikin ɗan adam. A yanayi na yau da kullun, iskar da mutane ke shaka tana ɗauke da kusan kashi 0.93% na argon, kuma wannan yawan sinadarin ba shi da wani tasiri a jikin ɗan adam. Duk da haka, a wasu lokuta, argon na iya haifar da illa ga jikin ɗan adam.
Ga wasu yanayi da ka iya faruwa: A cikin wani wuri mai tsauri, yawan sinadarin argon na iya ƙaruwa, ta haka ne zai rage yawan iskar oxygen a cikin iska kuma ya haifar da hypoxia. Wannan na iya haifar da alamu kamar jiri, gajiya, da kuma ƙarancin numfashi. Bugu da ƙari, argon iska ce mara aiki, amma tana iya fashewa a ƙarƙashin zafi mai yawa ko matsin lamba mai yawa.
7. Neon
Neon (Ne) iskar gas ce mai karko, mara launi kuma mara wari wadda ba ta shiga cikinta. Iskar neon ba ta shiga cikin tsarin numfashin ɗan adam, don haka shaƙa iskar neon mai yawa zai haifar da hypoxia. Idan kana cikin yanayin hypoxia na dogon lokaci, za ka iya fuskantar alamu kamar ciwon kai, tashin zuciya, da amai. Bugu da ƙari, iskar neon na iya amsawa da wasu abubuwa a ƙarƙashin zafi mai yawa ko matsin lamba mai yawa don haifar da gobara ko fashewa.
8. Iskar Xenon
Iskar Xenon (Xe) iskar gas ce mai karko, mara launi kuma mara wari wadda ba ta shiga cikin tsarin numfashin ɗan adam, don haka shaƙar iskar xenon mai yawa zai haifar da rashin isasshen iskar oxygen. Idan kana cikin yanayin rashin isasshen iskar oxygen na dogon lokaci, za ka iya fuskantar alamu kamar ciwon kai, tashin zuciya, da amai. Bugu da ƙari, iskar neon na iya amsawa da wasu abubuwa a ƙarƙashin zafi mai yawa ko matsin lamba mai yawa don haifar da gobara ko fashewa.
9. Iskar Krypton
Iskar Krypton (Kr) iskar gas ce mai karko, mara launi kuma mara wari wadda ba ta shiga cikin tsarin numfashin ɗan adam, don haka shaƙa iskar krypton mai yawa zai haifar da hypoxia. Idan kana cikin yanayin hypoxia na dogon lokaci, za ka iya fuskantar alamu kamar ciwon kai, tashin zuciya, da amai. Bugu da ƙari, iskar xenon na iya amsawa da wasu abubuwa a ƙarƙashin zafin jiki mai yawa ko matsin lamba mai yawa don haifar da wuta ko fashewa. Shaƙa a cikin yanayi tare da ƙarancin iskar oxygen na iya haifar da hypoxia. Idan kana cikin yanayin hypoxia na dogon lokaci, za ka iya fuskantar alamu kamar ciwon kai, tashin zuciya, da amai. Bugu da ƙari, iskar krypton na iya amsawa da wasu abubuwa a ƙarƙashin zafin jiki mai yawa ko matsin lamba mai yawa don haifar da wuta ko fashewa.
Magani mai haɗari na gano iskar gas ga masana'antar semiconductor
Masana'antar semiconductor ta ƙunshi samarwa, ƙera, da kuma aiwatar da iskar gas mai kama da wuta, mai fashewa, mai guba, da kuma mai cutarwa. A matsayinka na mai amfani da iskar gas a masana'antar kera semiconductor, kowane ma'aikaci ya kamata ya fahimci bayanan aminci na iskar gas mai haɗari daban-daban kafin amfani, kuma ya kamata ya san yadda zai magance hanyoyin gaggawa idan waɗannan iskar gas ɗin suna zubewa.
A fannin samarwa, ƙera, da kuma adana masana'antar semiconductor, domin guje wa asarar rayuka da dukiyoyi sakamakon zubewar waɗannan iskar gas masu haɗari, ya zama dole a sanya kayan aikin gano iskar gas don gano iskar da ake so.
Na'urorin gano iskar gas sun zama muhimman kayan aikin sa ido kan muhalli a masana'antar semiconductor ta yau, kuma su ne kayan aikin sa ido kai tsaye.
Riken Keiki koyaushe yana mai da hankali kan ci gaban masana'antar kera semiconductor lafiya, tare da manufar ƙirƙirar yanayi mai aminci ga mutane, kuma ya sadaukar da kansa ga ƙirƙirar na'urori masu auna iskar gas waɗanda suka dace da masana'antar semiconductor, samar da mafita masu dacewa don matsaloli daban-daban da masu amfani ke fuskanta, da kuma ci gaba da haɓaka ayyukan samfura da inganta tsarin.
Lokacin Saƙo: Yuli-16-2024