Ukukhiqizwa komkhiqizo ngamunye we-semiconductor kudinga amakhulu ezinqubo. Sihlukanisa yonke inqubo yokukhiqiza ibe yizinyathelo eziyisishiyagalombili:i-waferukucubungula-ukuxutshwa-i-photolithography-ukuqopha-ukufakwa kwefilimu encane-ukufakwa kwe-epitaxial-ukusabalalisa-i-ion.
Ukuze sikusize uqonde futhi uqaphele ama-semiconductor kanye nezinqubo ezihlobene, sizocindezela izihloko ze-WeChat kumagazini ngamunye ukuthi zethule isinyathelo ngasinye esingenhla ngasinye.
Esihlokweni esandulele, kukhulunywe ukuthi ukuze kuvikelwei-waferkusuka ekungcoleni okuhlukahlukene, kwenziwa ifilimu ye-oxide - inqubo ye-oxidation. Namuhla sizoxoxa "ngenqubo ye-photolithography" yokuthwebula isekethe yokuklama ye-semiconductor ku-wafer ngefilimu ye-oxide eyakhiwe.
Inqubo ye-Photolithography
1. Iyini inqubo ye-photolithography
I-Photolithography iwukwenza amasekethe nezindawo ezisebenzayo ezidingekayo ekukhiqizweni kwama-chip.
Ukukhanya okukhishwa umshini we-photolithography kusetshenziselwa ukuveza ifilimu encane embozwe nge-photoresist ngemaski enephethini. I-photoresist izoshintsha izakhiwo zayo ngemva kokubona ukukhanya, ukuze iphethini ekwimaski ikopishwe kwifilimu encane, ukuze ifilimu encane ibe nomsebenzi womdwebo wesekethe kagesi. Lena indima ye-photolithography, efana nokuthatha izithombe ngekhamera. Izithombe ezithathwe yikhamera ziphrintwa kwifilimu, kuyilapho i-photolithography ingaqophi izithombe, kodwa imidwebo yesekethe nezinye izingxenye ze-elekthronikhi.
I-Photolithography ubuchwepheshe obunembile bokwenza imishini emincane
I-photolithography evamile inqubo esebenzisa ukukhanya kwe-ultraviolet okunobude be-wavelength obungu-2000 kuya ku-4500 angstroms njengomthwali wolwazi lwesithombe, futhi isebenzisa i-photoresist njengendlela ephakathi (yokuqopha isithombe) ukuze kufezwe ukuguqulwa, ukudluliselwa kanye nokucutshungulwa kwehluzo, futhi ekugcineni idlulisele ulwazi lwesithombe ku-chip (ikakhulukazi i-silicon chip) noma ungqimba lwe-dielectric.
Kungashiwo ukuthi i-photolithography iyisisekelo sezimboni zesimanje ze-semiconductor, microelectronics, kanye nolwazi, futhi i-photolithography inquma ngqo izinga lokuthuthukiswa kwalezi zobuchwepheshe.
Eminyakeni engaphezu kwengu-60 selokhu kwasungulwa ngempumelelo amasekethe ahlanganisiwe ngo-1959, ububanzi bomugqa wezithombe zawo buncishisiwe ngama-oda amane ngobukhulu, kanti ukuhlanganiswa kwesekethe kuthuthukiswe ngama-oda angaphezu kwayisithupha ngobukhulu. Intuthuko esheshayo yalobu buchwepheshe ibangelwa kakhulu ukuthuthukiswa kwe-photolithography.
(Izidingo zobuchwepheshe be-photolithography ezigabeni ezahlukene zokuthuthukiswa kokukhiqizwa kwesekethe ehlanganisiwe)
2. Izimiso eziyisisekelo ze-photolithography
Izinto ze-photolithography ngokuvamile zibhekisela kuma-photoresists, aziwa nangokuthi ama-photoresists, okuyizinto ezibaluleke kakhulu ekusebenzeni kwe-photolithography. Lolu hlobo lwezinto lunezici zokusabela kokukhanya (kufaka phakathi ukukhanya okubonakalayo, ukukhanya kwe-ultraviolet, i-electron beam, njll.). Ngemva kokusabela kwe-photochemical, ukuncibilika kwayo kushintsha kakhulu.
Phakathi kwazo, ukuncibilika kwe-photoresist enhle kunjiniyela kuyanda, futhi iphethini etholiwe iyafana nemaski; i-photoresist engemihle iphambene nalokho, okungukuthi, ukuncibilika kuncipha noma kungancibiliki ngisho nangemva kokuvezwa kunjiniyela, futhi iphethini etholiwe iphambene nemaski. Izinkambu zokusetshenziswa zezinhlobo ezimbili ze-photoresists zihlukile. Ama-photoresist amahle asetshenziswa kakhulu, afinyelela ngaphezu kuka-80% wenani eliphelele.
Lokhu okungenhla kuyisithombe esichaza inqubo ye-photolithography
(1) Ukunamathisela:
Okusho ukuthi, ukwakha ifilimu yokumelana ne-photo enokujiya okufanayo, ukunamathela okuqinile futhi okungenamaphutha ku-silicon wafer. Ukuze kuthuthukiswe ukunamathelana phakathi kwefilimu yokumelana ne-photo kanye ne-silicon wafer, ngokuvamile kuyadingeka ukuthi uqale ushintshe ubuso be-silicon wafer ngezinto ezifana ne-hexamethyldisilazane (HMDS) kanye ne-trimethylsilyldiethylamine (TMSDEA). Ngemuva kwalokho, ifilimu yokumelana ne-photo ilungiswa nge-spin coating.
(2) Ukubhaka kusengaphambili:
Ngemva kokufaka i-spin coating, ifilimu ye-photoresist isaqukethe inani elithile le-solvent. Ngemva kokubhaka ekushiseni okuphezulu, i-solvent ingasuswa kancane ngangokunokwenzeka. Ngemva kokubhaka kusengaphambili, okuqukethwe kwe-photoresist kwehliswa kube cishe ngu-5%.
(3) Ukuchayeka:
Okusho ukuthi, i-photoresist ivezwa ekukhanyeni. Ngalesi sikhathi, kwenzeka i-photoreaction, bese kuba nomehluko wokuncibilika phakathi kwengxenye ekhanyisiwe nengxenye engakhanyisiwe.
(4) Ukuthuthukiswa nokuqina:
Umkhiqizo ucwiliswe kunjiniyela. Ngalesi sikhathi, indawo eveziwe ye-photoresist enhle kanye nendawo engaveziwe ye-photoresist engemihle izoncibilika ekuthuthukisweni. Lokhu kuveza iphethini enezinhlangothi ezintathu. Ngemva kokuthuthukiswa, i-chip idinga inqubo yokwelashwa ngokushisa okuphezulu ukuze ibe ifilimu eqinile, okusebenza kakhulu ekuthuthukiseni ukunamathela kwe-photoresist ku-substrate.
(5) Ukuqopha:
Izinto ezingaphansi kwe-photoresist ziyaqoshwa. Kuhlanganisa ukuqoshwa okumanzi okumanzi kanye nokuqoshwa okomile okunegesi. Isibonelo, ekuqoshweni okumanzi kwe-silicon, kusetshenziswa isixazululo samanzi esinosawoti se-hydrofluoric acid; ekuqoshweni okumanzi kwethusi, kusetshenziswa isixazululo esinomswakama esinamandla njenge-nitric acid kanye ne-sulfuric acid, kuyilapho ukuqoshwa okomile kuvame ukusebenzisa imisebe ye-plasma noma ye-ion enamandla aphezulu ukuze kulimaze ubuso bento bese kuyiqoshwa.
(6) Ukususa i-gum:
Ekugcineni, i-photoresist idinga ukususwa ebusweni belensi. Lesi sinyathelo sibizwa ngokuthi i-degumming.
Ukuphepha kuyinkinga ebaluleke kakhulu kukho konke ukukhiqizwa kwe-semiconductor. Amagesi amakhulu ayingozi futhi ayingozi e-photolithography enqubweni ye-chip lithography yilena elandelayo:
1. I-hydrogen peroxide
I-hydrogen peroxide (H2O2) iyi-oxidant enamandla. Ukuthintana ngqo kungabangela ukuvuvukala nokusha kwesikhumba namehlo.
2. I-Xylene
I-Xylene iyi-solvent kanye nonjiniyela osetshenziswa ku-lithography engalungile. Iyasha futhi inokushisa okuphansi okungu-27.3℃ kuphela (cishe izinga lokushisa legumbi). Iyaqhuma uma izinga lokushisa emoyeni lingu-1%-7%. Ukuxhumana okuphindaphindiwe ne-xylene kungabangela ukuvuvukala kwesikhumba. Umhwamuko we-Xylene umnandi, ufana nephunga le-aircraft tack; ukuchayeka ku-xylene kungabangela ukuvuvukala kwamehlo, impumulo kanye nomphimbo. Ukuphefumula igesi kungabangela ikhanda elibuhlungu, isiyezi, ukulahlekelwa yisifiso sokudla kanye nokukhathala.
3. I-Hexamethyldisilazane (i-HMDS)
I-Hexamethyldisilazane (HMDS) isetshenziswa kakhulu njengesendlalelo sokuqala ukwandisa ukunamathela kwe-photoresist ebusweni bomkhiqizo. Iyavutha futhi ine-flash point engu-6.7°C. Iyaqhuma uma ukuhlushwa emoyeni kungu-0.8%-16%. I-HMDS isabela ngamandla namanzi, utshwala kanye nama-mineral acid ukuze ikhiphe i-ammonia.
4. I-Tetramethylammonium hydroxide
I-Tetramethylammonium hydroxide (TMAH) isetshenziswa kabanzi njengonjiniyela we-lithography enhle. Inobuthi futhi iyagqwala. Ingabulala uma igwinywa noma ithintana ngqo nesikhumba. Ukuthinta uthuli noma inkungu ye-TMAH kungabangela ukuvuvukala kwamehlo, isikhumba, impumulo kanye nomphimbo. Ukuphefumula amazinga aphezulu e-TMAH kuzoholela ekufeni.
5. I-chlorine ne-fluorine
I-Chlorine (Cl2) kanye ne-fluorine (F2) zombili zisetshenziswa kuma-laser e-excimer njengemithombo yokukhanya ye-ultraviolet ejulile kanye ne-ultraviolet extreme (EUV). Womabili la magesi anobuthi, abonakala eluhlaza okotshani, futhi anephunga elinamandla elicasulayo. Ukuhogela amazinga aphezulu ale gesi kuzoholela ekufeni. Igesi ye-fluorine ingase isabela namanzi ukuze ikhiqize igesi ye-hydrogen fluoride. Igesi ye-hydrogen fluoride iyi-asidi enamandla ecasula isikhumba, amehlo kanye nendlela yokuphefumula futhi ingabangela izimpawu ezifana nokusha kanye nobunzima bokuphefumula. Amazinga aphezulu e-fluoride angabangela ubuthi emzimbeni womuntu, okubangela izimpawu ezifana nekhanda elibuhlungu, ukuhlanza, isifo sohudo kanye ne-coma.
6. I-Argon
I-Argon (Ar) iyigesi engasebenzi kahle evame ukungalimazi umzimba womuntu. Ngaphansi kwezimo ezivamile, umoya abantu abawuphefumulayo uqukethe cishe i-argon engu-0.93%, futhi lokhu kuhlushwa akunawo umphumela ocacile emzimbeni womuntu. Kodwa-ke, kwezinye izimo, i-argon ingabangela umonakalo emzimbeni womuntu.
Nazi ezinye izimo ezingaba khona: Endaweni evalekile, ukugcwala kwe-argon kunganda, ngaleyo ndlela kuncishiswe ukugcwala kwe-oxygen emoyeni futhi kubangele i-hypoxia. Lokhu kungabangela izimpawu ezifana nokuzungeza, ukukhathala, kanye nokuphelelwa umoya. Ngaphezu kwalokho, i-argon iyigesi engasebenzi, kodwa ingaqhuma ngaphansi kokushisa okuphezulu noma ukucindezeleka okuphezulu.
7. I-Neon
I-Neon (Ne) iyigesi ezinzile, engenambala futhi engenaphunga engahlanganyeli. Igesi ye-neon ayihilelekile enkambisweni yokuphefumula yomuntu, ngakho-ke ukuphefumula ngegesi ye-neon ephezulu kuzobangela i-hypoxia. Uma usesimeni se-hypoxia isikhathi eside, ungase ube nezimpawu ezifana nekhanda elibuhlungu, isicanucanu, nokuhlanza. Ngaphezu kwalokho, igesi ye-neon ingasabela nezinye izinto ngaphansi kokushisa okuphezulu noma ingcindezi ephezulu ukuze ibangele umlilo noma ukuqhuma.
8. Igesi ye-Xenon
Igesi i-Xenon (Xe) iyigesi ezinzile, engenambala futhi engenaphunga engahlanganyeli enkambisweni yokuphefumula komuntu, ngakho-ke ukuphefumula ngegesi ephezulu ye-xenon kuzobangela i-hypoxia. Uma usesimeni se-hypoxia isikhathi eside, ungase ube nezimpawu ezifana nekhanda elibuhlungu, isicanucanu, nokuhlanza. Ngaphezu kwalokho, igesi ye-neon ingasabela nezinye izinto ngaphansi kokushisa okuphezulu noma ingcindezi ephezulu ukuze ibangele umlilo noma ukuqhuma.
9. Igesi yeKrypton
Igesi i-Krypton (Kr) iyigesi eqinile, engenambala futhi engenaphunga engahlanganyeli enkambisweni yokuphefumula yomuntu, ngakho-ke ukuphefumula igesi i-krypton eningi kuzobangela i-hypoxia. Uma usesimeni se-hypoxia isikhathi eside, ungase ube nezimpawu ezifana nekhanda elibuhlungu, isicanucanu, nokuhlanza. Ngaphezu kwalokho, igesi i-xenon ingasabela nezinye izinto ezingaphansi kokushisa okuphezulu noma ingcindezi ephezulu ukuze ibangele umlilo noma ukuqhuma. Ukuphefumula endaweni entula umoya-mpilo kungabangela i-hypoxia. Uma usesimeni se-hypoxia isikhathi eside, ungase ube nezimpawu ezifana nekhanda elibuhlungu, isicanucanu, nokuhlanza. Ngaphezu kwalokho, igesi i-krypton ingasabela nezinye izinto ezingaphansi kokushisa okuphezulu noma ingcindezi ephezulu ukuze ibangele umlilo noma ukuqhuma.
Izixazululo zokuthola igesi eziyingozi embonini ye-semiconductor
Imboni ye-semiconductor ihilela ukukhiqizwa, ukukhiqizwa, kanye nenqubo yamagesi avuthayo, aqhumayo, anobuthi, futhi ayingozi. Njengomsebenzisi wamagesi ezitshalweni zokukhiqiza ze-semiconductor, wonke amalungu abasebenzi kufanele aqonde idatha yokuphepha yamagesi ahlukahlukene ayingozi ngaphambi kokusetshenziswa, futhi kufanele azi ukuthi angabhekana kanjani nezinqubo eziphuthumayo lapho la magesi evuza.
Ekukhiqizweni, ekukhiqizweni nasekugcinweni kwemboni ye-semiconductor, ukuze kugwenywe ukulahleka kwempilo kanye nempahla okubangelwa ukuvuza kwala magesi ayingozi, kuyadingeka ukufaka amathuluzi okuthola igesi ukuze kutholakale igesi eqondiwe.
Izitholi zegesi sezibe amathuluzi okuqapha imvelo abalulekile embonini ye-semiconductor yanamuhla, futhi futhi zingamathuluzi okuqapha aqondile kakhulu.
URiken Keiki ubelokhu eqaphela ukuthuthukiswa okuphephile kwemboni yokukhiqiza ye-semiconductor, ngenhloso yokudala indawo yokusebenza ephephile yabantu, futhi uzinikele ekuthuthukiseni izinzwa zegesi ezifanele imboni ye-semiconductor, enikeza izixazululo ezifanele zezinkinga ezahlukahlukene ezibhekene nabasebenzisi, kanye nokuthuthukisa njalo imisebenzi yomkhiqizo kanye nokwenza ngcono izinhlelo.
Isikhathi sokuthunyelwe: Julayi-16-2024