Sekoahelo sa CVD

Liaparo tsa CVD bakeng sa Ts'ebetso e Tsoetseng Pele ea Semiconductor

Liaparo tsa rona tsa Chemical Vapor Deposition (CVD) Silicon Carbide (SiC), Tantalum Carbide (TaC), le Pyrolytic Carbon (PyC) tse entsoeng bakeng sa tikoloho ea bohlokoa ea tlhahiso ea li-semiconductor, li fana ka ho se sebetse hantle ha lik'hemik'hale, botsitso bo feteletseng ba mocheso, le bohloeki bo phahameng haholo (<5 ppm). Li etselitsoe ho sireletsa graphite e hloekileng haholo le li-substrate tsa ceramic ho tsoa plasma e mabifi, likhase tsa ts'ebetso e arabelang, le potoloho e phahameng ea mocheso, liaparo tsa rona tse tsoetseng pele li fokotsa tlhahiso ea likaroloana 'me li atolosa bophelo ba likarolo haholo.Silicon/SiC Epitaxy, MOCVD, Plasma Etching, le Monocrystal Growthlits'ebetso.

Bohloeki bo Phahameng ka ho Fetisisa (<5 ppm)

Litšila tse tlase tsa tšepe tse netefalitsoeng ke GDMS ho thibela tšilafalo ea wafer lits'ebetsong tsa bohlokoa.

Khanyetso e Phahameng ea Plasma le Khase

Sebopeho se teteaneng sa kristale se sireletsa khahlanong le plasma ea halogen (CF₄, NF₃, Cl₂) le likhase tse senyang.

Ho bapisa mocheso o ntlafalitsoeng

Taolo e tiileng ea CTE e felisa ho petsoha ha mapetso a manyenyane le ho aroloa ha mapetso tlas'a litšisinyeho tse matla tsa mocheso.

Mofuta oa ho roala	Melemo ea Bohlokoa ea Tekheniki	Ts'ebetso ea Motheo ea Ts'ebetso
Sekoahelo sa CVD SiC	Ho khanna ha mocheso o phahameng, ho hanyetsa khoholeho ea plasma hantle haholo	Etch e omileng, Si Epitaxy, MOCVD, Khōlo ea Crystal
Sekoahelo sa CVD TaC	Ho hanyetsa mocheso o feteletseng (>2000°C), thibelo ea ts'enyeho ea H₂/SiH₄	Kholo ea SiC Epitaxy, SiC PVT e le 'Ngoe
Sekoahelo sa PyC	Ho tiisoa ha khase ea hermetic, bokaholimo ba khabone ea anisotropic bo boreleli haholo	Ho thibela mocheso, CZ Monocrystalline Silicon