ʻO "ʻO ka ʻoiaʻiʻo, ka hana hou, ka paʻakikī, a me ka pono" ka manaʻo mau o kā mākou hui no ka wā lōʻihi e hoʻomohala pū me nā mea kūʻai aku no ka pānaʻi like ʻana a me ka pōmaikaʻi like no ka Nānā Kūlana no ka Polycrystalline ʻoihana KinaPauka Daimana3-6um no Sapphire Wafer, Ua hilinaʻi mākou e hiki iā mākou ke hāʻawi i nā huahana kiʻekiʻe a me nā hoʻonā ma ke kumukūʻai kūpono, ke kākoʻo ma hope o ke kūʻai aku i nā mea kūʻai. A e kūkulu mākou i kahi holo lōʻihi olaola.
ʻO "ʻoiaʻiʻo, hana hou, koʻikoʻi, a me ka pono" ka manaʻo mau o kā mākou hui no ka wā lōʻihi e hoʻomohala pū me nā mea kūʻai aku no ka pānaʻi like ʻana a me ka pōmaikaʻi like noKina Synthetic Diamond, Pauka Daimana, Ke koi mau nei mākou i ka manaʻo hoʻokele o "ʻO ka maikaʻi ka mea mua, ʻo ka ʻenehana ke kumu, ʻoiaʻiʻo a me ka hana hou". Hiki iā mākou ke hoʻomohala mau i nā huahana hou i kahi kiʻekiʻe e hoʻokō i nā pono like ʻole o nā mea kūʻai aku.
Wehewehe Huahana
Hāʻawi kā mākou hui i nā lawelawe hana uhi SiC ma o ke ʻano CVD ma luna o ka graphite, keramika a me nā mea ʻē aʻe, i hiki ai i nā kinoea kūikawā e loaʻa ana ke kalapona a me ka silicon ke hana i ka mahana kiʻekiʻe e loaʻa ai nā molekala SiC maʻemaʻe kiʻekiʻe, nā molekala i waiho ʻia ma luna o ka ʻili o nā mea i uhi ʻia, e hana ana i ka papa pale SIC.
Nā hiʻohiʻona nui:
1. Ke kūpaʻa ʻana i ka oxidation wela kiʻekiʻe:
He maikaʻi loa nō ke kūpaʻa ʻana i ka oxidation ke kiʻekiʻe ka mahana i 1600 C.
2. Maʻemaʻe kiʻekiʻe: hana ʻia e ka waiho ʻana o ka mahu kemika ma lalo o ke kūlana chlorination wela kiʻekiʻe.
3. Ke kūpaʻa ʻana i ka ʻino: paʻakikī kiʻekiʻe, ʻili paʻa, nā ʻāpana maikaʻi.
4. Ke kūpaʻa ʻana i ka palaho: waikawa, alkali, paʻakai a me nā reagents organik.
Nā Kikoʻī Nui o ka Uhi ʻana o CVD-SIC
| Nā Waiwai SiC-CVD | ||
| ʻAno Crystal | Pae FCC β | |
| Ka nui o ka paʻa | g/cm³ | 3.21 |
| Paʻakikī | Paʻakikī Vickers | 2500 |
| Ka nui o ka palaoa | μm | 2~10 |
| Maʻemaʻe Kemika | % | 99.99995 |
| Ka Mana Wela | J·kg-1 ·K-1 | 640 |
| Mahana Sublimation | ℃ | 2700 |
| Ikaika Felexural | MPa (RT 4-kiko) | 415 |
| Modulus o Young | Gpa (4pt kūlou, 1300 ℃) | 430 |
| Hoʻonui Wela (CTE) | 10-6K-1 | 4.5 |
| Ka hoʻokele wela | (W/mK) | 300 |
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