He maha ngā wā e aro ana ki te kiritaki, ā, ko tā mātou whāinga matua kia noho hei kaiwhakarato rongonui, pono, me te pono, engari hei hoa hoki mō ā mātou kiritaki mō te Utu Tino Iti rawa atu o Haina 1200c Plasma Enhanced Chemical Vapor Deposition.PecvdPūrere Whakakore Korehau, Mō ētahi atu mōhiohio e pā ana ki ā mātou mahi māu, whakapā mai ki a mātou i ngā wā katoa. Kei te tumanako mātou ki te whakatū hononga pakihi pai, roa hoki ki a koe.
He maha ngā wā e aro ana ki te kiritaki, ā, ko tā mātou whāinga matua kia noho hei kaiwhakarato rongonui, pono, me te pono, engari hei hoa hoki mō ā mātou kiritaki.Te Whakatakotoranga Matū Whakarei Plasma Haina, Pecvd, Mā ā mātou taputapu matatau, te whakahaere kounga teitei, te kaha ki te rangahau me te whakawhanake ka iti ake te utu. Ahakoa ehara te utu e tukuna ana e mātou i te mea iti rawa, ka oati mātou he tino whakataetae! Nau mai ki te whakapā mai ki a mātou mō te whanaungatanga pakihi ā muri ake nei me te angitu tahi!
Ngā mea whakakotahi waro / waro(e kiia nei i muri nei ko ""C / C, CFC rānei") he momo rauemi hiato e ahu mai ana i te waro, ā, e whakapakaritia ana e te muka waro me ōna hua (muka waro kua oti te hanga). He rite tōna āhua ki te waro, he rite hoki tōna kaha ki te muka waro. He pai ōna āhuatanga miihini, he ātete wera, he ātete waikura, he ārai waku, he pai hoki ōna āhuatanga kawe wera me te hiko.
CVD-SiCKo ngā āhuatanga o te paninga he hanganga ōrite, he rauemi kiato, he ātete pāmahana teitei, he ātete waikura, he parakore teitei, he ātete waikawa me te kawakore me te matū matū waro, me ngā āhuatanga ā-tinana me te matū pumau.
Ki te whakatauritea ki ngā rauemi karāpeti parakore-teitei, ka tīmata te karāpeti ki te waikura i te 400C, ka ngaro te paura nā te waikura, ka hua ake te parahanga taiao ki ngā taputapu taha me ngā rūma korehau, ka piki ake hoki ngā poke o te taiao parakore-teitei.
Heoi, ka taea e te paninga SiC te pupuri i te pumau ā-tinana me te matū i te 1600 nekehanga, he mea whakamahi whānuitia i roto i te ahumahi hou, inā koa i roto i te ahumahi semiconductor.
Ka whakaratohia e tā mātou kamupene ngā ratonga tukanga paninga SiC mā te tikanga CVD i runga i te mata o te karāpeti, te uku me ētahi atu rauemi, kia tauhohe ai ngā hau motuhake kei roto te waro me te silicon i te pāmahana teitei hei whiwhi i ngā ngota SiC parakore teitei, ka whakatakotoria ngā ngota ki runga i te mata o ngā rauemi pania, ka hanga he paparanga tiaki SIC. Ka piri pūmau te SIC i hangaia ki te turanga karāpeti, ka hoatu he āhuatanga motuhake ki te turanga karāpeti, nā reira ka hanga te mata o te karāpeti kia kiato, kia kore he porosity, kia ātete ki te pāmahana teitei, kia ātete ki te waikura me te ātete ki te waikura.
Ngā āhuatanga matua:
1. Ātete waikura pāmahana teitei:
He tino pai tonu te ātete ki te waikura ahakoa te teitei o te pāmahana ki te 1600 C.
2. Teitei o te parakore: i hangaia mā te whakatakotoranga kohu matū i raro i te āhuatanga whakapūkara pāmahana teitei.
3. Ātete ki te horo: he pakeke teitei, he mata kiato, he matūriki angiangi.
4. Ātete ki te waikura: waikawa, kawakore, tote me ngā matū waro.
Ngā Whakatakotoranga Matua o ngā Paninga CVD-SIC:
| SiC-CVD | ||
| Kiato | (karamu/cc)
| 3.21 |
| Kaha piko | (Mpa)
| 470 |
| Te whakawhānui wera | (10-6/K) | 4
|
| Te kawe wera | (W/mK) | 300
|
