Thermal Oxidation ntawm Ib Leeg Crystal Silicon

Kev tsim cov silicon dioxide rau ntawm qhov chaw ntawm silicon hu ua oxidation, thiab kev tsim cov silicon dioxide ruaj khov thiab muaj zog ua rau muaj silicon integrated circuit planar technology. Txawm hais tias muaj ntau txoj hauv kev los cog silicon dioxide ncaj qha rau ntawm qhov chaw ntawm silicon, nws feem ntau yog ua los ntawm thermal oxidation, uas yog kom tso silicon rau hauv qhov kub siab oxidizing ib puag ncig (oxygen, dej). Cov txheej txheem thermal oxidation tuaj yeem tswj cov zaj duab xis tuab thiab cov yam ntxwv ntawm silicon / silicon dioxide interface thaum lub sijhawm npaj cov zaj duab xis silicon dioxide. Lwm cov txheej txheem rau kev cog silicon dioxide yog plasma anodization thiab ntub anodization, tab sis tsis muaj ib qho ntawm cov txheej txheem no tau siv dav hauv VLSI cov txheej txheem.

Silicon qhia tau hais tias nws muaj feem tsim cov silicon dioxide ruaj khov. Yog tias silicon tshiab raug rau qhov chaw oxidizing (xws li oxygen, dej), nws yuav tsim cov txheej oxide nyias heev (<20Å) txawm tias nyob rau hauv chav tsev kub. Thaum silicon raug rau qhov chaw oxidizing ntawm qhov kub siab, cov txheej oxide tuab dua yuav raug tsim ntawm qhov nrawm dua. Lub hauv paus ntsiab lus ntawm kev tsim silicon dioxide los ntawm silicon tau nkag siab zoo. Deal thiab Grove tau tsim cov qauv lej uas piav qhia meej txog kev loj hlob ntawm cov yeeb yaj kiab oxide tuab dua 300Å. Lawv tau hais tias oxidation yog ua tiav raws li hauv qab no, uas yog, cov oxidant (cov dej molecules thiab cov pa oxygen molecules) diffuses los ntawm cov txheej oxide uas twb muaj lawm mus rau Si/SiO2 interface, qhov twg cov oxidant reacts nrog silicon los tsim silicon dioxide. Lub ntsiab lus teb los tsim silicon dioxide yog piav qhia raws li hauv qab no:

Qhov kev tshuaj tiv thaiv oxidation tshwm sim ntawm Si/SiO2 interface, yog li thaum cov txheej oxide loj hlob, silicon raug noj tas li thiab qhov interface maj mam nkag mus rau silicon. Raws li qhov ceev thiab qhov hnyav molecular ntawm silicon thiab silicon dioxide, nws tuaj yeem pom tias silicon noj rau qhov tuab ntawm cov txheej oxide kawg yog 44%. Ua li no, yog tias cov txheej oxide loj hlob 10,000Å, 4400Å ntawm silicon yuav raug noj. Qhov kev sib raug zoo no tseem ceeb rau kev xam qhov siab ntawm cov kauj ruam tsim rau ntawmsilicon waferCov kauj ruam yog qhov tshwm sim ntawm cov nqi oxidation sib txawv ntawm qhov chaw sib txawv ntawm qhov chaw silicon wafer.

Peb kuj muab cov khoom siv graphite thiab silicon carbide uas muaj cov khoom purity siab, uas siv dav hauv kev ua wafer xws li oxidation, diffusion, thiab annealing.

Txais tos cov neeg siv khoom los ntawm thoob plaws lub ntiaj teb tuaj xyuas peb rau kev sib tham ntxiv!

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