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Third-generation semiconductor GaN and related epitaxial technology brief introduction
1. Third-generation semiconductors The first-generation semiconductor technology was developed based on semiconductor materials such as Si and Ge. It is the material basis for the development of transistors and integrated circuit technology. The first-generation semiconductor materials laid the...Read more -
23.5 billion, Suzhou’s super unicorn is going to IPO
After 9 years of entrepreneurship, Innoscience has raised more than 6 billion yuan in total financing, and its valuation has reached an astonishing 23.5 billion yuan. The list of investors is as long as dozens of companies: Fukun Venture Capital, Dongfang State-owned Assets, Suzhou Zhanyi, Wujian...Read more -
How do tantalum carbide coated products enhance the corrosion resistance of materials?
Tantalum carbide coating is a commonly used surface treatment technology that can significantly improve the corrosion resistance of materials. Tantalum carbide coating can be attached to the surface of the substrate through different preparation methods, such as chemical vapor deposition, physica...Read more -
Introduction to the third generation semiconductor GaN and related epitaxial technology
1. Third-generation semiconductors The first-generation semiconductor technology was developed based on semiconductor materials such as Si and Ge. It is the material basis for the development of transistors and integrated circuit technology. The first-generation semiconductor materials laid the f...Read more -
Numerical simulation study on the effect of porous graphite on silicon carbide crystal growth
The basic process of SiC crystal growth is divided into sublimation and decomposition of raw materials at high temperature, transportation of gas phase substances under the action of temperature gradient, and recrystallization growth of gas phase substances at the seed crystal. Based on this, the...Read more -
Types of Special Graphite
Special graphite is a high purity, high density and high strength graphite material and has excellent corrosion resistance, high temperature stability and great electrical conductivity. It is made of natural or artificial graphite after high temperature heat treatment and high pressure processing...Read more -
Analysis of thin film deposition equipment – the principles and applications of PECVD/LPCVD/ALD equipment
Thin film deposition is to coat a layer of film on the main substrate material of the semiconductor. This film can be made of various materials, such as insulating compound silicon dioxide, semiconductor polysilicon, metal copper, etc. The equipment used for coating is called thin film deposition...Read more -
Important materials that determine the quality of monocrystalline silicon growth – thermal field
The growth process of monocrystalline silicon is completely carried out in the thermal field. A good thermal field is conducive to improving the quality of crystals and has a higher crystallization efficiency. The design of the thermal field largely determines the changes in temperature gradients...Read more -
What are the technical difficulties of silicon carbide crystal growth furnace?
The crystal growth furnace is the core equipment for silicon carbide crystal growth. It is similar to the traditional crystalline silicon grade crystal growth furnace. The furnace structure is not very complicated. It is mainly composed of furnace body, heating system, coil transmission mechanism...Read more
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