Kev tso pa tshuaj lom neeg(CVD)yog cov thev naus laus zis siv dav tshaj plaws hauv kev lag luam semiconductor rau kev tso ntau yam khoom siv, suav nrog ntau yam khoom siv rwb thaiv tsev, feem ntau cov khoom siv hlau thiab cov khoom siv hlau sib xyaw.
CVD yog ib txoj kev siv tshuab ua zaj duab xis nyias ib txwm muaj. Nws lub hauv paus ntsiab lus yog siv cov roj ua ntej los rhuav tshem qee yam khoom hauv cov ua ntej los ntawm kev sib xyaw tshuaj ntawm cov atoms thiab molecules, thiab tom qab ntawd tsim ib zaj duab xis nyias rau ntawm lub substrate. Cov yam ntxwv tseem ceeb ntawm CVD yog: kev hloov pauv tshuaj (kev sib xyaw tshuaj lossis kev rhuav tshem thermal); txhua yam khoom siv hauv zaj duab xis los ntawm cov chaw sab nraud; cov tshuaj reactants yuav tsum koom nrog hauv kev sib xyaw ua ke hauv daim ntawv ntawm theem roj.
Kev tso pa tshuaj lom neeg qis (LPCVD), plasma enhanced chemical vapor deposition (PECVD) thiab high density plasma chemical vapor deposition (HDP-CVD) yog peb txoj kev siv CVD, uas muaj qhov sib txawv tseem ceeb hauv kev tso cov khoom siv, cov khoom siv xav tau, cov xwm txheej txheej txheem, thiab lwm yam. Cov hauv qab no yog cov lus piav qhia yooj yim thiab kev sib piv ntawm peb txoj kev siv tshuab no.
1. LPCVD (CVD Siab Tsawg)
Lub Ntsiab Cai: Ib qho txheej txheem CVD nyob rau hauv qhov xwm txheej siab qis. Nws lub hauv paus ntsiab lus yog txhaj cov roj tshuaj tiv thaiv rau hauv chav tshuaj tiv thaiv nyob rau hauv lub tshuab nqus tsev lossis qhov chaw siab qis, rhuav tshem lossis tshuaj tiv thaiv cov roj los ntawm qhov kub siab, thiab tsim cov zaj duab xis khov kho tso rau ntawm qhov chaw substrate. Txij li thaum qhov siab qis txo cov roj sib tsoo thiab kev ntxhov siab, qhov sib xws thiab zoo ntawm cov zaj duab xis tau txhim kho. LPCVD siv dav hauv silicon dioxide (LTO TEOS), silicon nitride (Si3N4), polysilicon (POLY), phosphosilicate iav (BSG), borophosphosilicate iav (BPSG), doped polysilicon, graphene, carbon nanotubes thiab lwm yam zaj duab xis.
Nta:
▪ Qhov kub ntawm cov txheej txheem: feem ntau ntawm 500 ~ 900 ° C, qhov kub ntawm cov txheej txheem yog siab heev;
▪ Qhov siab ntawm cov roj: qhov chaw siab tsawg ntawm 0.1 ~ 10 Torr;
▪ Zaj duab xis zoo: zoo, sib npaug zoo, ceev zoo, thiab ob peb qhov tsis zoo;
▪ Tus nqi tso tawm: tus nqi tso tawm qeeb;
▪ Kev sib xws: tsim nyog rau cov khoom loj, kev tso dej sib xws;
Cov txiaj ntsig thiab qhov tsis zoo:
▪ Muaj peev xwm tso cov yeeb yaj kiab sib xws thiab ntom ntom heev;
▪ Ua tau zoo rau ntawm cov khoom loj, tsim nyog rau kev tsim khoom loj;
▪ Tus nqi qis;
▪ Kub heev, tsis haum rau cov ntaub ntawv uas rhiab heev rau cua sov;
▪ Tus nqi tso tawm qeeb thiab cov zis tawm kuj tsawg.
2. PECVD (Plasma Enhanced CVD)
Lub Ntsiab Cai: Siv cov plasma los ua kom cov tshuaj tiv thaiv theem roj ntawm qhov kub qis dua, ionize thiab decompose cov molecules hauv cov roj tshuaj tiv thaiv, thiab tom qab ntawd tso cov zaj duab xis nyias rau ntawm qhov chaw substrate. Lub zog ntawm plasma tuaj yeem txo qhov kub uas xav tau rau cov tshuaj tiv thaiv, thiab muaj ntau yam kev siv. Ntau yam zaj duab xis hlau, cov zaj duab xis inorganic thiab cov zaj duab xis organic tuaj yeem npaj tau.
Nta:
▪ Qhov kub ntawm cov txheej txheem: feem ntau ntawm 200 ~ 400 ° C, qhov kub thiab txias qis heev;
▪ Qhov ntau ntawm cov pa roj: feem ntau yog pua pua ntawm mTorr mus rau ntau Torr;
▪ Qhov zoo ntawm zaj duab xis: txawm hais tias zaj duab xis sib xws zoo, qhov ceev thiab zoo ntawm zaj duab xis tsis zoo li LPCVD vim muaj qhov tsis zoo uas yuav tshwm sim los ntawm cov ntshav;
▪ Tus nqi tso tawm: tus nqi siab, kev ua haujlwm siab;
▪ Kev sib xws: me ntsis qis dua LPCVD ntawm cov khoom loj;
Cov txiaj ntsig thiab qhov tsis zoo:
▪ Cov yeeb yaj kiab nyias nyias tuaj yeem tso rau ntawm qhov kub qis dua, tsim nyog rau cov ntaub ntawv uas rhiab heev rau cua sov;
▪ Kev ceev ceev ntawm kev tso dej, tsim nyog rau kev tsim khoom zoo;
▪ Cov txheej txheem yooj ywm, cov khoom zaj duab xis tuaj yeem tswj tau los ntawm kev kho cov plasma parameters;
▪ Plasma tej zaum yuav ua rau muaj qhov tsis zoo ntawm zaj duab xis xws li cov qhov me me lossis cov tsis sib xws;
▪ Piv nrog LPCVD, qhov ceev thiab zoo ntawm zaj duab xis phem dua me ntsis.
3. HDP-CVD (Kev Siv Plasma Ceev Heev)
Lub Ntsiab Cai: Ib qho thev naus laus zis tshwj xeeb PECVD. HDP-CVD (tseem hu ua ICP-CVD) tuaj yeem tsim cov plasma ceev thiab zoo dua li cov khoom siv PECVD ib txwm muaj ntawm qhov kub qis dua. Tsis tas li ntawd, HDP-CVD muab kev tswj hwm ion flux thiab lub zog yuav luag ywj pheej, txhim kho qhov trench lossis qhov puv peev xwm rau kev tso zaj duab xis uas xav tau, xws li cov txheej tiv thaiv kev cuam tshuam, cov khoom siv dielectric qis, thiab lwm yam.
Nta:
▪ Qhov kub ntawm cov txheej txheem: qhov kub ntawm chav tsev mus txog 300 ℃, qhov kub ntawm cov txheej txheem qis heev;
▪ Qhov siab ntawm cov roj: ntawm 1 thiab 100 mTorr, qis dua PECVD;
▪ Zaj duab xis zoo: siab plasma ceev, zaj duab xis zoo, zoo uniformity;
▪ Tus nqi tso tawm: tus nqi tso tawm yog nyob nruab nrab ntawm LPCVD thiab PECVD, siab dua me ntsis ntawm LPCVD;
▪ Kev sib xws: vim yog cov plasma siab, kev sib xws ntawm zaj duab xis zoo heev, tsim rau cov khoom siv sib xyaw ua ke;
Cov txiaj ntsig thiab qhov tsis zoo:
▪ Muaj peev xwm tso cov yeeb yaj kiab zoo ntawm qhov kub qis dua, tsim nyog rau cov ntaub ntawv kub-rhiab;
▪ Kev sib npaug zoo heev ntawm zaj duab xis, qhov ceev thiab qhov du ntawm qhov chaw;
▪ Qhov ceev ntawm cov ntshav siab dua ua rau kev sib npaug ntawm cov dej thiab cov khoom ntawm zaj duab xis zoo dua;
▪ Cov khoom siv nyuaj thiab tus nqi siab dua;
▪ Qhov ceev ntawm kev tso tawm qeeb, thiab lub zog plasma siab dua yuav ua rau muaj kev puas tsuaj me ntsis.
Txais tos cov neeg siv khoom los ntawm thoob plaws lub ntiaj teb tuaj xyuas peb rau kev sib tham ntxiv!
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Lub sijhawm tshaj tawm: Lub Kaum Ob Hlis-03-2024