Ho kenngoa ha mouoane oa lik'hemik'hale(CVD)ke theknoloji e sebelisoang haholo indastering ea semiconductor bakeng sa ho boloka mefuta e fapaneng ea thepa, ho kenyeletsoa mefuta e mengata ea thepa e sireletsang mocheso, boholo ba thepa ea tšepe le thepa ea motsoako oa tšepe.
CVD ke theknoloji ea setso ea ho lokisa filimi e tšesaane. Molao-motheo oa eona ke ho sebelisa li-precursor tsa khase ho qhala likarolo tse itseng ka har'a precursor ka liketso tsa lik'hemik'hale pakeng tsa liathomo le limolek'hule, ebe li etsa filimi e tšesaane holim'a substrate. Litšobotsi tsa motheo tsa CVD ke: liphetoho tsa lik'hemik'hale (liketso tsa lik'hemik'hale kapa ho bola ha mocheso); thepa eohle ka har'a filimi e tsoa mehloling e kantle; li-reactant li tlameha ho nka karolo karabelong ka mokhoa oa mohato oa khase.
Ho beoa ha mouoane oa lik'hemik'hale tse nang le khatello e tlase (LPCVD), ho beoa ha mouoane oa lik'hemik'hale tse ntlafalitsoeng ka plasma (PECVD) le ho beoa ha mouoane oa lik'hemik'hale tse nang le density e phahameng (HDP-CVD) ke mahlale a mararo a tloaelehileng a CVD, a nang le liphapang tse kholo ho beoeng ha thepa, litlhoko tsa lisebelisoa, maemo a ts'ebetso, jj. Tlhaloso e bonolo le papiso ea mahlale ana a mararo ke ena.
1. LPCVD (Khatello e Tlase ea CVD)
Molao-motheo: Ts'ebetso ea CVD tlas'a maemo a khatello e tlase. Molao-motheo oa eona ke ho kenya khase ea karabelo ka phapusing ea karabelo tlas'a vacuum kapa tikoloho ea khatello e tlase, ho bolisa kapa ho arabela khase ka mocheso o phahameng, le ho etsa filimi e tiileng e behiloeng holim'a substrate. Kaha khatello e tlase e fokotsa ho thulana ha khase le moferefere, ho tšoana le boleng ba filimi lia ntlafala. LPCVD e sebelisoa haholo ho silicon dioxide (LTO TEOS), silicon nitride (Si3N4), polysilicon (POLY), khalase ea phosphosilicate (BSG), khalase ea borophosphosilicate (BPSG), polysilicon e nang le doped, graphene, carbon nanotubes le lifilimi tse ling.
Likaroloana:
▪ Mocheso oa ts'ebetso: hangata o pakeng tsa 500 ~ 900°C, mocheso oa ts'ebetso o phahame haholo;
▪ Kgatelelo ya kgase: tikoloho ya kgatelelo e tlase ya 0.1 ~ 10 Torr;
▪ Boleng ba filimi: boleng bo holimo, ho tšoana hantle, ho ba le sekgahla se setle, le diphoso tse fokolang;
▪ Sekhahla sa ho ntsha thepa: sekhahla sa ho ntsha thepa butle;
▪ Ho tšoana: ho loketse li-substrate tse kholo, ho kenngoa ha tsona ka mokhoa o ts'oanang;
Melemo le mathata:
▪ E ka beha lifilimi tse tšoanang haholo le tse teteaneng;
▪ E sebetsa hantle holim'a li-substrate tse kholo, tse loketseng tlhahiso ea bongata;
▪ Theko e tlase;
▪ Mocheso o phahameng, ha o lokele thepa e tshabang mocheso;
▪ Sekhahla sa ho ntsha thepa se lieha 'me tlhahiso e tlase haholo.
2. PECVD (Plasma Enhanced CVD)
Molao-motheo: Sebelisa plasma ho kenya tshebetsong dikarabelo tsa mokgahlelo wa kgase mochesong o tlase, etsa ionize le ho bolisa dimolek'hule tse ka hara kgase ya karabelo, ebe o beha difilimi tse tshesane hodima bokahodimo ba substrate. Matla a plasma a ka fokotsa mocheso o hlokahalang haholo bakeng sa karabelo, mme a na le mefuta e mengata ya ditshebediso. Difilimi tse fapaneng tsa tshepe, difilimi tse sa pheleng le difilimi tsa organic di ka lokiswa.
Likaroloana:
▪ Mocheso oa ts'ebetso: hangata o pakeng tsa 200 ~ 400°C, mocheso o tlase haholo;
▪ Kgatelelo ya kgase: hangata ke makgolo a di-mTorr ho isa ho di-Torr tse mmalwa;
▪ Boleng ba filimi: leha ho tšoana ha filimi ho le hotle, bongata le boleng ba filimi ha li ntle joaloka LPCVD ka lebaka la liphoso tse ka hlahisoang ke plasma;
▪ Sekhahla sa ho ntsha: sekgahla se phahameng, bokgoni bo phahameng ba tlhahiso;
▪ Ho tšoana: ho batla ho le tlase ho feta LPCVD holim'a li-substrate tse kholo;
Melemo le mathata:
▪ Lifilimi tse tšesaane li ka beoa mochesong o tlase, li loketse thepa e nang le mocheso o phahameng;
▪ Lebelo le potlakileng la ho kenya, le loketseng tlhahiso e sebetsang hantle;
▪ Ts'ebetso e tenyetsehang, thepa ea filimi e ka laoloa ka ho fetola liparamente tsa plasma;
▪ Plasma e ka hlahisa diphoso tsa filimi tse kang masoba a pin kapa ho se tshwane;
▪ Ha ho bapisoa le LPCVD, bongata ba filimi le boleng ba eona li mpefala hanyane.
3. HDP-CVD (High Density Plasma CVD)
Molao-motheo: Theknoloji e ikhethang ea PECVD. HDP-CVD (e tsejoang hape e le ICP-CVD) e ka hlahisa bongata bo phahameng ba plasma le boleng ho feta lisebelisoa tsa PECVD tsa setso mochesong o tlase oa ho kenya. Ho phaella moo, HDP-CVD e fana ka phallo ea ion e ikemetseng le taolo ea matla, e ntlafatsa bokhoni ba ho tlatsa liforo kapa masoba bakeng sa ho kenya filimi ka bongata bo batlang bo le boima, joalo ka liphahlo tse thibelang ho bonahatsa, ho kenya thepa e sa fetoheng ea dielectric e tlase, jj.
Likaroloana:
▪ Mocheso oa ts'ebetso: mocheso oa kamore ho fihlela ho 300℃, mocheso oa ts'ebetso o tlase haholo;
▪ Kgatelelo ya kgase: pakeng tsa 1 le 100 mTorr, e ka tlase ho PECVD;
▪ Boleng ba filimi: ho ba le plasma e ngata, boleng bo phahameng ba filimi, ho tšoana hantle;
▪ Sekhahla sa ho ntsha: sekhahla sa ho ntsha se pakeng tsa LPCVD le PECVD, se phahame hanyane ho feta LPCVD;
▪ Ho tšoana: ka lebaka la plasma e nang le bongata bo boholo, ho tšoana ha filimi ho hotle haholo, ho loketse libaka tse rarahaneng tsa substrate;
Melemo le mathata:
▪ E khona ho beha lifilimi tsa boleng bo holimo mochesong o tlase, e loketse haholo thepa e thibang mocheso;
▪ Ho tšoana hantle ha filimi, ho ba teteaneng le ho boreleli ha bokaholimo;
▪ Bongata bo phahameng ba plasma bo ntlafatsa ho tšoana ha ho boloka le thepa ea filimi;
▪ Lisebelisoa tse rarahaneng le litšenyehelo tse phahameng;
▪ Lebelo la ho ntsha plasma le lieha, 'me matla a mangata a plasma a ka baka tšenyo e nyane.
Amohela bareki ba tsoang lefats'eng lohle ho re etela bakeng sa puisano e 'ngoe!
https://www.vet-china.com/
https://www.facebook.com/people/Ningbo-Miami-Advanced-Material-Technology-Co-Ltd/100085673110923/
https://www.linkedin.com/company/100890232/admin/page-posts/published/
https://www.youtube.com/@user-oo9nl2qp6j
Nako ea poso: Tshitwe-03-2024