Ukufakwa komusi wamakhemikhali(I-CVD)ubuchwepheshe obusetshenziswa kakhulu embonini ye-semiconductor ekufakeni izinto ezahlukahlukene, kufaka phakathi izinto eziningi zokuvikela ugesi, izinto eziningi zensimbi kanye nezinto ze-alloy zensimbi.
I-CVD ubuchwepheshe bendabuko bokulungiselela ifilimu encane. Isimiso sayo ukusebenzisa izandulela zegesi ukubola izingxenye ezithile ku-precursor ngokusebenzisa ukusabela kwamakhemikhali phakathi kwama-athomu nama-molecule, bese kwakha ifilimu encane ku-substrate. Izici eziyisisekelo ze-CVD yilezi: izinguquko zamakhemikhali (ukusabela kwamakhemikhali noma ukubola kokushisa); zonke izinto ezikufilimu zivela emithonjeni yangaphandle; ama-reactant kumele ahlanganyele ekusabeleni ngesimo sesigaba segesi.
Ukufakwa komusi wamakhemikhali okucindezela okuphansi (i-LPCVD), ukufakwa komusi wamakhemikhali othuthukisiwe nge-plasma (i-PECVD) kanye nokufakwa komusi wamakhemikhali okuqina kwe-plasma (i-HDP-CVD) yizindlela ezintathu zobuchwepheshe ezivamile ze-CVD, ezinomehluko omkhulu ekufakweni kwezinto, izidingo zemishini, izimo zenqubo, njll. Okulandelayo incazelo elula kanye nokuqhathanisa lezi zindlela zobuchwepheshe ezintathu.
1. I-LPCVD (I-CVD Ephansi Yokucindezela)
Isimiso: Inqubo ye-CVD ngaphansi kwezimo zokucindezela okuphansi. Isimiso sayo ukufaka igesi yokusabela ekamelweni lokusabela ngaphansi kwendawo yokuhlanza noma indawo yokucindezela okuphansi, ukubola noma ukusabela igesi ngokushisa okuphezulu, bese kwakha ifilimu eqinile ebekwe ebusweni be-substrate. Njengoba ingcindezi ephansi inciphisa ukungqubuzana kwegesi kanye nokuxokozela, ukufana kanye nekhwalithi yefilimu kuyathuthukiswa. I-LPCVD isetshenziswa kabanzi ku-silicon dioxide (LTO TEOS), i-silicon nitride (Si3N4), i-polysilicon (POLY), ingilazi ye-phosphosilicate (BSG), ingilazi ye-borophosphosilicate (BPSG), i-polysilicon exutshwe ne-doped, i-graphene, ama-carbon nanotubes nakwamanye amafilimu.
Izici:
▪ Izinga lokushisa lenqubo: ngokuvamile liphakathi kuka-500~900°C, izinga lokushisa lenqubo liphezulu kakhulu;
▪ Uhla lokucindezela kwegesi: indawo yokucindezela okuphansi okungu-0.1 ~ 10 Torr;
▪ Ikhwalithi yefilimu: ikhwalithi ephezulu, ukufana okuhle, ubuningi obuhle, kanye namaphutha ambalwa;
▪ Izinga lokufakwa: izinga lokufakwa kancane;
▪ Ukufana: kufanelekile kuma-substrates amakhulu, ukufakwa okufanayo;
Izinzuzo kanye nokungalungi:
▪ Ingabeka amafilimu afanayo futhi aminyene;
▪ Isebenza kahle ezindaweni ezinkulu, ezifanele ukukhiqizwa ngobuningi;
▪ Izindleko eziphansi;
▪ Izinga lokushisa eliphezulu, alifaneleki ezintweni ezithinta ukushisa;
▪ Izinga lokufakwa kwemali lihamba kancane futhi umkhiqizo uphansi kakhulu.
2. I-PECVD (i-Plasma Enhanced CVD)
Isimiso: Sebenzisa i-plasma ukuze usebenzise ukusabela kwesigaba segesi emazingeni okushisa aphansi, u-ionize futhi ubolise ama-molecule kugesi yokusabela, bese ubeka amafilimu amancane ebusweni be-substrate. Amandla e-plasma anganciphisa kakhulu izinga lokushisa elidingekayo ukuze kwenzeke ukusabela, futhi anezinhlelo eziningi zokusebenza. Amafilimu ahlukahlukene ensimbi, amafilimu angaphili kanye namafilimu e-organic angalungiswa.
Izici:
▪ Izinga lokushisa lenqubo: ngokuvamile liphakathi kuka-200~400°C, izinga lokushisa liphansi kakhulu;
▪ Uhla lokucindezela kwegesi: ngokuvamile amakhulu e-mTorr kuya kuma-Torr amaningana;
▪ Ikhwalithi yefilimu: yize ukufana kwefilimu kukuhle, ubuningi kanye nekhwalithi yefilimu akukuhle njenge-LPCVD ngenxa yeziphambeko ezingase zilethwe yi-plasma;
▪ Izinga lokufakwa: izinga eliphezulu, ukusebenza kahle kokukhiqiza okuphezulu;
▪ Ukufana: kuncane kancane kune-LPCVD kuma-substrate amakhulu;
Izinzuzo kanye nokungalungi:
▪ Amafilimu amancane angabekwa emazingeni okushisa aphansi, afanele izinto ezithinta ukushisa;
▪ Isivinini sokufaka esisheshayo, esifanele ukukhiqizwa okuphumelelayo;
▪ Inqubo eguquguqukayo, izakhiwo zefilimu zingalawulwa ngokulungisa amapharamitha e-plasma;
▪ I-plasma ingase iveze amaphutha efilimu njengemigodi noma ukungalingani;
▪ Uma kuqhathaniswa ne-LPCVD, ubuningi befilimu kanye nekhwalithi yayo kubi kancane.
3. I-HDP-CVD (I-High Density Plasma CVD)
Isimiso: Ubuchwepheshe obukhethekile be-PECVD. I-HDP-CVD (eyaziwa nangokuthi i-ICP-CVD) ingakhiqiza ukuminyana kwe-plasma okuphezulu kanye nekhwalithi kunemishini ye-PECVD yendabuko emazingeni okushisa aphansi okufakwa. Ngaphezu kwalokho, i-HDP-CVD inikeza cishe ukujikeleza kwe-ion okuzimele kanye nokulawula amandla, ithuthukisa amakhono okugcwalisa imisele noma imigodi okufakwa kwefilimu okufunwayo, njengezembozo ezilwa nokukhanya, ukufakwa kwezinto ezihlala njalo ze-dielectric eziphansi, njll.
Izici:
▪ Izinga lokushisa lenqubo: izinga lokushisa legumbi lifinyelela ku-300℃, izinga lokushisa lenqubo liphansi kakhulu;
▪ Uhla lokucindezela kwegesi: phakathi kuka-1 no-100 mTorr, oluphansi kune-PECVD;
▪ Ikhwalithi yefilimu: ukuminyana okuphezulu kwe-plasma, ikhwalithi ephezulu yefilimu, ukufana okuhle;
▪ Izinga lokufakwa: izinga lokufakwa liphakathi kwe-LPCVD ne-PECVD, liphakeme kancane kune-LPCVD;
▪ Ukufana: ngenxa ye-plasma enobuningi obukhulu, ukufana kwefilimu kuhle kakhulu, kufaneleka ezindaweni eziyinkimbinkimbi ze-substrate;
Izinzuzo kanye nokungalungi:
▪ Iyakwazi ukubeka amafilimu asezingeni eliphezulu emazingeni okushisa aphansi, ifaneleka kakhulu ezintweni ezizwela ukushisa;
▪ Ukufana okuhle kakhulu kwefilimu, ubuningi kanye nokushelela kobuso;
▪ Ubuningi obukhulu be-plasma buthuthukisa ukufana kwe-deposition kanye nezakhiwo zefilimu;
▪ Imishini eyinkimbinkimbi kanye nezindleko eziphakeme;
▪ Ijubane lokufakwa kwe-plasma lihamba kancane, futhi amandla aphezulu e-plasma angase alethe inani elincane lomonakalo.
Yamukela noma yimaphi amakhasimende avela emhlabeni wonke ukuthi asivakashele ukuze sixoxe kabanzi!
https://www.vet-china.com/
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https://www.linkedin.com/company/100890232/admin/page-posts/published/
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Isikhathi sokuthunyelwe: Disemba-03-2024