Tacewar tururin sinadarai (CVD) hanya ce da ta ƙunshi sanya wani fim mai ƙarfi a saman wafer ɗin silicon ta hanyar haɗakar sinadarai ta hanyar haɗakar iskar gas. Wannan hanyar za a iya raba ta zuwa nau'ikan kayan aiki daban-daban waɗanda aka kafa bisa ga yanayin amsawar sinadarai daban-daban kamar matsin lamba da abin da ke haifar da shi.
Wane tsari ake amfani da waɗannan na'urori guda biyu?Ana amfani da kayan aikin PECVD (Plasma Enhanced) sosai a aikace-aikace kamar OX, Nitride, ƙofar ƙarfe, da kuma amorphous carbon. A gefe guda kuma, yawanci ana amfani da LPCVD (Low Power) don Nitride, poly, da TEOS.
Menene ƙa'idar?Fasahar PECVD ta haɗa makamashin plasma da CVD ta hanyar amfani da ƙaramin zafin plasma don haifar da fitar da sabo a cathode na ɗakin tiyata. Wannan yana ba da damar sarrafa amsawar sinadarai da plasma don samar da fim mai ƙarfi akan saman samfurin. Hakazalika, LPCVD yana shirin yin aiki don rage matsin lamba na iskar gas a cikin reactor.
ɗan adamta AI: Amfani da Humanize AI a fannin fasahar CVD na iya ƙara inganci da daidaiton tsarin adana fina-finai. Ta hanyar amfani da algorithm na leverage AI, ana iya inganta sa ido da daidaita sigogi kamar sigar ion, ƙimar kwararar iskar gas, zafin jiki, da kauri fim don samun sakamako mafi kyau.
Lokacin Saƙo: Oktoba-24-2024