kunzwisisa tekinoroji yeChemical Vapor Deposition (CVD)

Kuisa makemikari emhepo (CVD) inzira inosanganisira kuisa firimu rakasimba pamusoro pesilicon wafer kuburikidza nemakemikari emakemikari anobva mugasi. Maitiro aya anogona kupatsanurwa kuita mhando dzakasiyana dzemidziyo dzakagadzirwa mumamiriro akasiyana emakemikari akadai sekumanikidzwa uye precursor.

Midziyo iyi miviri inoshandiswa pakuita sei?Midziyo yePECVD (Plasma Enhanced) inoshandiswa zvakanyanya mukushandiswa senge OX, Nitride, metallic element gate, uye amorphous carbon. Kune rumwe rutivi, LPCVD (Low Power) inowanzo shandiswa paNitride, poly, uye TEOS.

Chii chiri musimboti wacho?Tekinoroji yePECVD inosanganisa simba replasma neCVD nekushandisa plasma inodziya zvishoma kuti ibudise hunyoro pa cathode yekamuri rekurapwa. Izvi zvinobvumira kudzora maitiro emakemikari neplasma kuti zvigadzire firimu rakasimba pamusoro pemuenzaniso. Saizvozvowo, LPCVD yakarongwa kushanda kuderedza kumanikidzwa kwegesi mu reactor.

ita kuti AI ive yemunhu: Kushandiswa kweHumanize AI mumunda weCVD tekinoroji kunogona kuwedzera kushanda zvakanaka uye kururama kwemaitiro ekuisa mafirimu. Nekushandisa leverage AI algorithm, kutarisa nekugadzirisa ma parameter akadai se ion parameter, gas flow rate, tembiricha, uye ukobvu hwemafirimu zvinogona kugadziriswa kuti zvive nani.


Nguva yekutumira: Gumiguru-24-2024
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