Kumvetsetsa ukadaulo wa Chemical Vapor Deposition (CVD)

Kuyika nthunzi ya mankhwala (CVD) ndi njira yomwe imaphatikizapo kuyika filimu yolimba pamwamba pa wafer ya silicon kudzera mu njira ya mankhwala ya mankhwala yosakanikirana ndi mpweya. Njirayi ikhoza kugawidwa m'magulu osiyanasiyana a zida zomwe zimayikidwa pamikhalidwe yosiyanasiyana ya machitidwe a mankhwala monga kupanikizika ndi precursor.

Kodi zipangizo ziwirizi zimagwiritsidwa ntchito pa njira iti?Zipangizo za PECVD (Plasma Enhanced) zimagwiritsidwa ntchito kwambiri monga OX, Nitride, metallic element gate, ndi amorphous carbon. Kumbali ina, LPCVD (Low Power) nthawi zambiri imagwiritsidwa ntchito pa Nitride, poly, ndi TEOS.

Kodi mfundo yake ndi iti?Ukadaulo wa PECVD umaphatikiza mphamvu ya plasma ndi CVD pogwiritsa ntchito plasma yotsika kutentha kuti ipangitse kutuluka kwatsopano pa cathode ya chipinda chochitira opaleshoni. Izi zimathandiza kuwongolera momwe mankhwala ndi plasma zimachitikira kuti apange filimu yolimba pamwamba pa chitsanzo. Mofananamo, LPCVD ikukonzekera kugwira ntchito pochepetsa kuthamanga kwa mpweya wa chemical reaction mu reactor.

pangitsani AI kukhala yaumunthuKugwiritsa ntchito Humanize AI m'munda wa ukadaulo wa CVD kungathandize kwambiri kuti njira yosungira mafilimu ikhale yogwira mtima komanso yolondola. Pogwiritsa ntchito njira yogwiritsira ntchito AI, kuyang'anira ndi kusintha magawo monga ion parameter, kuchuluka kwa mpweya, kutentha, ndi makulidwe a mafilimu kungathandize kuti pakhale zotsatira zabwino.