gusobanukirwa ikoranabuhanga ryo gusiga umwuka w'ubushyuhe mu binyabutabire (CVD)

Gushyira umwuka w’ubumara mu buryo bwa chemical (CVD) ni uburyo busaba gushyira agace gakomeye ku buso bwa silicon wafer binyuze mu buryo bwa chemical chemical reaction buvangwa na gaze. Ubu buryo bushobora kugabanywamo ibikoresho bitandukanye byashyizweho ku miterere itandukanye ya chemical reaction nk'umuvuduko n'ibibanziriza.

Ni ubuhe buryo ibi bikoresho byombi bikoreshwamo?Ibikoresho bya PECVD (Plasma Enhanced) bikoreshwa cyane mu bikorwa nka OX, Nitride, metallic element gate, na amorphous carbon. Ku rundi ruhande, LPCVD (Low Power) ikoreshwa cyane muri Nitride, poly, na TEOS.

Ihame ni irihe?Ikoranabuhanga rya PECVD rihuza ingufu za plasma na CVD binyuze mu gukoresha plasma y'ubushyuhe buke kugira ngo itume habaho ubushyuhe kuri cathode y'icyumba cyo gukora. Ibi bituma habaho kugenzura uburyo imiti n'imiti bya plasma bihinduka filime ikomeye ku buso bw'icyitegererezo. Mu buryo nk'ubwo, LPCVD irateganya gukora mu kugabanya umuvuduko wa gaze ya chemical reaction muri reactor.

guhindura ubumuntu mu bwenge bwa muntu: Gukoresha Humanize AI mu rwego rw'ikoranabuhanga rya CVD bishobora kongera cyane imikorere myiza n'ukuri mu buryo bwo gushyira filime mu buryo buboneye. Binyuze muri algorithme ya AI, kugenzura no guhindura ibipimo nka parameter ya ion, umuvuduko w'amazi ya gaze, ubushyuhe, n'ubugari bwa filime bishobora kunozwa kugira ngo birusheho gutanga umusaruro mwiza.