Ukufakwa komphunga weekhemikhali (i-CVD) yinkqubo equka ukufaka ifilimu eqinileyo kumphezulu we-silicon wafer ngokusebenzisa i-chemical chemical reaction yomxube wegesi. Le nkqubo ingahlulwahlulwa ibe yimodeli yezixhobo ezahlukeneyo ezisekwe kwiimeko ezahlukeneyo ze-chemical reaction ezifana noxinzelelo kunye nomzekelo.
Zeziphi iinkqubo ezisetyenziswa kwezi zixhobo zimbini?Izixhobo zePECVD (Plasma Enhanced) zisetyenziswa kakhulu kwiindlela ezifana ne-OX, iNitride, isango le-metallic element, kunye ne-amorphous carbon. Kwelinye icala, i-LPCVD (i-Low Power) idla ngokusetyenziswa kwi-Nitride, i-poly, kunye ne-TEOS.
Yintoni umgaqo?Itekhnoloji ye-PECVD idibanisa amandla e-plasma kunye ne-CVD ngokusebenzisa i-plasma enobushushu obuphantsi ukuze ikhuphe ukungcola okutsha kwi-cathode yegumbi lenkqubo. Oku kuvumela ukulawula impendulo yeekhemikhali kunye ne-plasma chemical ukuze kwenze ifilimu eqinileyo kumphezulu wesampuli. Ngokufanayo, i-LPCVD icwangciselwe ukusebenza ekunciphiseni uxinzelelo lwegesi yempendulo yeekhemikhali kwi-reactor.
yenza i-AI ibe yeyomntu: Ukusetyenziswa kwe-Humanize AI kwicandelo lobuchwepheshe be-CVD kunokuphucula kakhulu ukusebenza kakuhle kunye nokuchaneka kwenkqubo yokubeka iimuvi. Ngokusebenzisa i-algorithm ye-AI yokusebenzisa i-leverage, ukujonga kunye nokulungisa iiparameter ezifana ne-ion parameter, isantya sokuhamba kwegesi, ubushushu, kunye nobukhulu bemuvi kunokulungiswa ukuze kufunyanwe iziphumo ezingcono.
Ixesha leposi: Oktobha-24-2024