Ukufakwa komusi wamakhemikhali (i-CVD) inqubo ehilela ukufaka ifilimu eqinile ebusweni be-silicon wafer ngokusebenzisa ukusabela kwamakhemikhali kwamakhemikhali kwengxube yegesi. Le nqubo ingahlukaniswa ngemodeli yemishini ehlukahlukene esekwe ezimweni ezahlukene zokusabela kwamakhemikhali njengokucindezela kanye nokwandulela.
Yiliphi inqubo esetshenziswa la madivayisi amabili?Imishini ye-PECVD (Plasma Enhanced) isetshenziswa kabanzi ekusetshenzisweni njenge-OX, i-Nitride, i-metallic element gate, kanye ne-carbon e-amorphous. Ngakolunye uhlangothi, i-LPCVD (Low Power) ivame ukusetshenziswa kwi-Nitride, i-poly, kanye ne-TEOS.
Iyini isimiso?Ubuchwepheshe be-PECVD buhlanganisa amandla e-plasma kanye ne-CVD ngokusebenzisa i-plasma enokushisa okuphansi ukuze kukhishwe ukukhishwa okusha ku-cathode yegumbi lenqubo. Lokhu kuvumela ukulawula ukusabela kwamakhemikhali kanye namakhemikhali e-plasma ukuze kwakheke ifilimu eqinile ebusweni besampula. Ngokufanayo, i-LPCVD ihlose ukusebenza ekunciphiseni ingcindezi yegesi yokusabela kwamakhemikhali ku-reactor.
yenza i-AI ibe ngumuntu: Ukusetshenziswa kwe-Humanize AI emkhakheni wobuchwepheshe be-CVD kungathuthukisa kakhulu ukusebenza kahle kanye nokunemba kwenqubo yokufaka ama-movie. Ngokusebenzisa i-algorithm ye-AI yokusebenzisa amandla, ukuqapha kanye nokulungiswa kwamapharamitha afana nepharamitha ye-ion, izinga lokugeleza kwegesi, izinga lokushisa, kanye nobukhulu be-movie kungathuthukiswa ukuze kube nemiphumela engcono.
Isikhathi sokuthunyelwe: Okthoba-24-2024