nghọta nke teknụzụ Chemical Vapor Deposition (CVD)

Ndobe anwụrụ kemịkalụ (CVD) bụ usoro nke gụnyere itinye ihe nkiri siri ike n'elu wafer silicon site na mmeghachi omume kemịkalụ kemịkalụ nke ngwakọta gas. Enwere ike kewaa usoro a n'ime ụdị ngwaọrụ dị iche iche dabere na ọnọdụ mmeghachi omume kemịkalụ dị iche iche dịka nrụgide na ihe mmalite.

Kedu usoro eji ngwaọrụ abụọ a eme?A na-ejikarị ngwa PECVD (Plasma Enhanced) eme ihe n'ọtụtụ ebe dịka OX, Nitride, ọnụ ụzọ metallic element gate, na amorphous carbon. N'aka nke ọzọ, a na-ejikarị LPCVD (Low Power) eme ihe maka Nitride, poly, na TEOS.

Gịnị bụ ụkpụrụ ahụ?Teknụzụ PECVD na-ejikọta ike plasma na CVD site na iji plasma dị ala na-ekpo ọkụ iji mee ka mwepụta ọhụrụ na cathode nke ụlọ usoro ahụ. Nke a na-enye ohere maka njikwa mmeghachi omume kemịkalụ kemịkalụ na plasma iji mepụta ihe nkiri siri ike n'elu ihe nlele ahụ. N'otu aka ahụ, LPCVD na-eme atụmatụ ịrụ ọrụ na ibelata nrụgide gas mmeghachi omume kemịkalụ na reactor.

mee ka AI dị mma: Ojiji nke Humanize AI n'ọhịa nke teknụzụ CVD nwere ike ime ka arụmọrụ na izi ezi nke usoro itinye ihe nkiri dịkwuo mma nke ukwuu. Site na algọridim AI leverage, enwere ike ime ka nlekota na nhazi nke paramita dịka paramita ion, ọnụego mmiri gas, okpomọkụ, na ọkpụrụkpụ ihe nkiri ka mma maka nsonaazụ ka mma.