Si Epitaxial Parts

Zigawo Zophimbidwa ndi CVD SiC za Silicon Epitaxy (Si Epi)

Yopangidwa mwaluso kwambiri kuti igwiritsidwe ntchito pa single-wafer ndi batch Silicon Epitaxial deposition systems, ma CVD SiC coated susceptors, satellite disks, ndi zigawo za thermal field zimapereka kutentha kofanana kwambiri komanso kusakhala ndi mpweya woipa. Chophimba cha cubic β-SiC chokhala ndi kuchuluka kwakukulu chimaphimba bwino gawo la graphite loyera kwambiri, kuletsa reactive gas etching (SiH₄, SiH₂Cl₂, HCl) ndikutsimikizira kuchuluka kwa zinthu zodetsedwa zachitsulo (<5 ppm) panthawi yokonza Si Epi yotentha kwambiri (1000°C - 1200°C).

Kufanana kwa Munda Wotentha

Kutulutsa kwamphamvu kwa filimuyo kumatsimikizira kuti makulidwe ake ndi ofanana ndi a wafer m'mphepete mpaka pakati.

Kukana kwa HCl Etch

Amapereka chitetezo champhamvu ku mankhwala oyeretsera m'chipindamo komanso kutentha komwe kumawotchedwa.

Kugwirizana kwa OEM System

Makina a CNC opangidwa bwino kuti agwirizane ndi zida zazikulu za 200mm/300mm za Epi zokhala ndi wafer imodzi (Zipangizo Zogwiritsidwa Ntchito, ASM).

Chizindikiro chaukadaulo Mtengo Wofotokozera Njira Yoyenera / Yoyesera
Zopangira Zophimba CVD β-SiC (Gawo la Cubic) Kapangidwe ka Makristalo Okhala ndi Kachulukidwe Kakakulu
Zinthu Zoyambira Graphite Yoyera Kwambiri Yopanda Chisokonezo Kuchuluka: 1.82 - 1.88 g/cm³
Kuyera kwa Mankhwala Zonyansa Zonse < 5 ppm Kuyesedwa kwa GDMS
Kuphimba makulidwe 80 μm - 150 μm Kufanana ≤ ± 5%
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