Enwere ike ịkwadebe mkpuchi SiC site na iji ihe nchekwa anwụrụ kemịkalụ (CVD), mgbanwe precursor, ịgbasa plasma, wdg. Mkpuchi nke CHEMICAL vapor deposition kwadebere bụ otu ma dị obere, ma nwee ike imepụta ya nke ọma. Site na iji methyl trichlosilane. (CHZSiCl3, MTS) dị ka isi iyi silicon, mkpuchi SiC nke usoro CVD kwadebere bụ usoro tozuru oke maka itinye mkpuchi a.
Mkpuchi SiC na graphite nwere ezigbo ndakọrịta kemịkalụ, ọdịiche dị n'etiti ha dị obere, iji mkpuchi SiC nwere ike ime ka iguzogide iyi na iguzogide oxidation nke ihe graphite dịkwuo mma nke ọma. N'ime ha, oke stoichiometric, okpomọkụ mmeghachi omume, gas dilution, gas na-adịghị ọcha na ọnọdụ ndị ọzọ nwere nnukwu mmetụta na mmeghachi omume ahụ.
Oge ozi: Sep-14-2022