SiC txheej tuaj yeem npaj tau los ntawm kev tso tshuaj lom neeg (CVD), kev hloov pauv ua ntej, kev txau plasma, thiab lwm yam. Cov txheej txheem npaj los ntawm CHEMICAL vapor deposition yog sib xws thiab compact, thiab muaj kev tsim qauv zoo. Siv methyl trichlosilane. (CHzSiCl3, MTS) ua qhov chaw silicon, SiC txheej npaj los ntawm CVD txoj kev yog ib txoj hauv kev paub tab rau kev siv cov txheej txheem no.
SiC txheej thiab graphite muaj kev sib raug zoo ntawm cov tshuaj lom neeg, qhov sib txawv ntawm cov coefficient thermal expansion ntawm lawv yog me me, siv SiC txheej tuaj yeem txhim kho qhov hnav tsis kam thiab oxidation tsis kam ntawm cov khoom graphite. Ntawm lawv, stoichiometric piv, qhov kub ntawm cov tshuaj tiv thaiv, roj dilution, roj impurity thiab lwm yam mob muaj kev cuam tshuam loj rau cov tshuaj tiv thaiv.
Lub sijhawm tshaj tawm: Cuaj hlis-14-2022