ImvelisoDumbhalo
I-Silicon carbide Wafer Boat isetyenziswa ngokubanzi njengesibambi se-wafer kwinkqubo yokusasazwa kobushushu obuphezulu.
Izinto eziluncedo:
Ukumelana nobushushu obuphezulu:ukusetyenziswa okuqhelekileyo kwi-1800 ℃
I-conductivity ephezulu ye-thermal:ilingana nezinto zegraphite
Ukuqina okuphezulu:ukuqina okwesibini kuphela kwidayimane, i-boron nitride
Ukumelana nokubola:iasidi eyomeleleyo kunye ne-alkali ayinamhlwa kuyo, ukuxhathisa ukubola kungcono kune-tungsten carbide kunye ne-alumina.
Ubunzima obulula:ubuninzi obuphantsi, kufutshane ne-aluminiyam
Akukho deformation: i-coefficient ephantsi yokwandiswa kwe-thermal
Ukuxhathisa ukothuka kwe-Thermal:inokumelana nokutshintsha kobushushu obubukhali, ukuxhathisa ukothuka kwe-thermal, kwaye inokusebenza okuzinzile
IiPropati zoBume beSiC
| Ipropati | Ixabiso | Indlela |
| Ukuxinana | 3.21 g/cc | I-Sink-float kunye ne-dimension |
| Ubushushu obuthile | 0.66 J/g °K | I-Pulsed laser flash |
| Amandla e-Flexural | 450 MPa560 MPa | I-4 point bend, i-RT4 point bend, i-1300 ° |
| Ukuqina kokwaphuka | 2.94 MPa m1/2 | I-Microindentation |
| Ukuqina | 2800 | Vicker's, 500g umthwalo |
| Elastic ModulusOlutsha's Modulus | 450 GPA430 GPA | 4 pt ukugoba, RT4 pt ukugoba, 1300 °C |
| Ubungakanani beenkozo | 2 – 10 µm | I-SEM |
Iipropati zoThermal zeSiC
| I-Thermal Conductivity | 250 W/m °K | Indlela yeLaser flash, RT |
| Ukwandiswa kweThermal (CTE) | 4.5 x 10-6 °K | Ubushushu begumbi ukuya kuma-950 °C, i-silica dilatometer |
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