Hordhac ku saabsan tignoolajiyada dhigista uumiga kiimikada (CVD) ee khafiifka ah ee dhigista filimka

Kaydinta Uumiga Kiimikada (CVD) waa tignoolajiyad muhiim ah oo kaydin filim khafiif ah, oo inta badan loo isticmaalo diyaarinta filimaan kala duwan oo shaqeynaya iyo agab lakab khafiif ah, waxaana si weyn loogu isticmaalaa wax soo saarka semiconductor-ka iyo meelaha kale.

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1. Mabda'a shaqada ee CVD

Habka CVD, hordhaca gaaska (hal ama in ka badan iskudhisyada horudhaca gaaska) ayaa la taabtaa dusha sare ee substrate-ka waxaana lagu kululeeyaa heerkul gaar ah si loo sameeyo falgal kiimiko ah oo lagu shubo dusha sare ee substrate-ka si loo sameeyo filim ama dahaar la rabo. Lakabka la rabo ee falgalkan kiimikada ah waa mid adag, badanaa iskudhis ka mid ah walxaha la rabo. Haddii aan rabno inaan silicon ku dhejino dusha sare, waxaan u isticmaali karnaa trichlorosilane (SiHCl3) gaaska horudhaca ah: SiHCl3 → Si + Cl2 + HCl Silicon wuxuu ku xidhmi doonaa dusha sare ee la soo bandhigay (gudaha iyo dibaddaba), halka gaasaska chlorine iyo hydrochloric acid laga soo saari doono qolka.

 

2. Kala soocidda CVD

CVD-ga Kulaylka: Iyadoo la kululeynayo gaaska horudhaca ah si uu u burburo oo uu ugu shubo dusha sare ee substrate-ka. CVD-ga La Kordhiyay ee Balaasmaha (PECVD): Balaasmaha waxaa lagu daraa CVD-ga kuleylka si loo xoojiyo heerka falcelinta loona xakameeyo habka dhigista. CVD-ga Dabiiciga ah ee Birta (MOCVD): Iyadoo la adeegsanayo isku-dhafka dabiiciga ah ee birta sida gaasaska horudhaca ah, filimada khafiifka ah ee biraha iyo semiconductors-ka ayaa la diyaarin karaa, waxaana badanaa loo isticmaalaa soo saarista aaladaha sida LED-yada.

 

3. Codsiga


(1) Soo saarista Semiconductor-ka

Filim silikoon ah: waxaa loo isticmaalaa in lagu diyaariyo lakabyo dahaadh ah, substrate-yo, lakabyo go'doomin ah, iwm. Filimka Nitride: waxaa loo isticmaalaa in lagu diyaariyo nitride silicon, nitride aluminium, iwm., oo loo isticmaalo LED-yada, aaladaha korontada, iwm. Filimka birta: waxaa loo isticmaalaa in lagu diyaariyo lakabyo gudbiye ah, lakabyo bir ah, iwm.

 

(2) Tiknoolajiyada bandhigga

Filim ITO ah: Filim oksaydh ah oo hufan, oo badanaa loo isticmaalo bandhigyada looxyada fidsan iyo shaashadaha taabashada. Filim naxaas ah: waxaa loo isticmaalaa in lagu diyaariyo lakabyada baakadaha, khadadka gudbiyaha, iwm., si loo horumariyo waxqabadka aaladaha bandhigga.

 

(3) Goobo kale

Dahaarka indhaha: oo ay ku jiraan dahaarka ka hortagga milicsiga, shaandheeyayaasha indhaha, iwm. Dahaarka ka hortagga daxalka: waxaa loo isticmaalaa qaybaha baabuurta, aaladaha hawada sare, iwm.

 

4. Astaamaha habka CVD

Adeegso jawi heerkul sare leh si aad u horumariso xawaaraha falcelinta. Badanaa waxaa lagu sameeyaa jawi faaruq ah. Wasakhda dusha sare ee qaybta waa in laga saaraa ka hor inta aan la rinjiyeynin. Hawshu waxay yeelan kartaa xaddidaadyo ku saabsan substrate-ka la dahaadhi karo, tusaale ahaan xaddidaadaha heerkulka ama xaddidaadaha falcelinta. Dahaarka CVD wuxuu dabooli doonaa dhammaan meelaha qaybta, oo ay ku jiraan dunta, godadka indhaha la' iyo dusha sare ee gudaha. Waxay xaddidi kartaa awoodda lagu qarin karo meelaha gaarka ah ee bartilmaameedka ah. Dhumucda filimka waxaa xaddidaya xaaladaha habka iyo walxaha. Ku dhegganaan heer sare ah.

 

5. Faa'iidooyinka tiknoolajiyada CVD

Midaysanaan: Awood u leh inuu gaaro dhigaalka isku midka ah ee dhulka ballaaran.

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Xakamaynta: Heerka dhigista iyo sifooyinka filimka waxaa lagu hagaajin karaa iyadoo la xakameynayo heerka socodka iyo heerkulka gaaska horudhaca ah.

Kala Duwanaanshaha: Ku habboon kaydinta agab kala duwan, sida biraha, semiconductors, oksaydhyada, iwm.


Waqtiga boostada: Maajo-06-2024
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