Intshayelelo kwiteknoloji yokubeka ifilimu encinci ye-chemical vapor deposition (CVD)

Ukususwa koMphunga weKhemikhali (i-CVD) bubuchwepheshe obubalulekileyo bokubeka ifilimu encinci, obusetyenziswa rhoqo ekulungiseleleni iifilimu ezahlukeneyo ezisebenzayo kunye nezinto ezinomaleko omncinci, kwaye busetyenziswa kakhulu kwimveliso ye-semiconductor nakwezinye iindawo.

1. Umgaqo wokusebenza we-CVD

Kwinkqubo ye-CVD, i-gas precursor (i-gaseous precursor compounds enye okanye ezingaphezulu) iziswa kumphezulu we-substrate kwaye ifudunyezwe kubushushu obuthile ukuze kubangele i-chemical reaction kwaye idiphozithe kumphezulu we-substrate ukuze yenze ifilimu okanye umaleko ofunekayo. Imveliso yale chemical reaction yi-solid, idla ngokuba yi-compound yezinto ezifunwayo. Ukuba sifuna ukunamathelisa i-silicon kumphezulu, singasebenzisa i-trichlorosilane (SiHCl3) njenge-precursor gas: I-SiHCl3 → Si + Cl2 + HCl I-Silicon iya kubopha kuyo nayiphi na indawo eveziweyo (ngaphakathi nangaphandle), ngelixa i-chlorine kunye nee-hydrochloric acid gases ziya kukhutshwa kwigumbi.

2. Udidi lwe-CVD

I-CVD eshushu: Ngokufudumeza igesi engaphambili ukuze ibole kwaye ibekwe phezu komphezulu we-substrate. I-Plasma Enhanced CVD (PECVD): I-Plasma yongezwa kwi-CVD eshushu ukuze kuphuculwe izinga lokuphendula kunye nokulawula inkqubo yokufakwa. I-Metal Organic CVD (MOCVD): Kusetyenziswa iikhompawundi ze-metal organic njengeegesi ezingaphambili, iifilimu ezincinci zesinyithi kunye nee-semiconductors zinokulungiswa, kwaye zihlala zisetyenziswa ekwenzeni izixhobo ezifana nee-LED.

3. Isicelo

(1) Ukuveliswa kwee-semiconductors

Ifilimu ye-silicide: esetyenziselwa ukulungiselela iileya zokuthintela ubushushu, ii-substrates, iileya zokwahlukanisa, njl. Ifilimu ye-nitride: esetyenziselwa ukulungiselela i-silicon nitride, i-aluminium nitride, njl., esetyenziswa kwii-LED, izixhobo zamandla, njl. Ifilimu yesinyithi: esetyenziselwa ukulungiselela iileya eziqhuba umbane, iileya ezenziwe ngesinyithi, njl.

(2) Itekhnoloji yokubonisa

Ifilimu ye-ITO: Ifilimu ye-oxide eqhubayo ebonakalayo, esetyenziswa rhoqo kwizibonisi zephaneli ezisicaba nakwiisikrini zokuchukumisa. Ifilimu yekopolo: isetyenziselwa ukulungiselela iileya zokupakisha, imigca eqhubayo, njl.njl., ukuphucula ukusebenza kwezixhobo zokubonisa.

(3) Amanye amasimi

Iingubo ezibonakalayo: kuquka iingubo ezingabonisi kukhanya, izihluzi ezibonakalayo, njl. Iingubo ezingabonisi kukhanya: ezisetyenziswa kwiindawo zeemoto, kwizixhobo zeenqwelo-moya, njl.

4. Iimpawu zenkqubo ye-CVD

Sebenzisa indawo enobushushu obuphezulu ukukhuthaza isantya sokuphendula. Idla ngokwenziwa kwindawo engenamoya. Izinto ezingcolisayo kumphezulu wenxalenye kufuneka zisuswe ngaphambi kokupeyinta. Le nkqubo inokuba nemida kwi-substrates ezinokugqunywa, oko kukuthi, imida yobushushu okanye imida yokusabela. I-CVD coating iya kugubungela zonke iindawo zenxalenye, kuquka imisonto, imingxunya engaboniyo kunye nemiphezulu yangaphakathi. Inganciphisa amandla okufihla iindawo ezithile ekujoliswe kuzo. Ubukhulu befilimu bunqunyelwe yinkqubo kunye neemeko zezinto. Ukunamathela okuphezulu.