Ka'idar jirgin ruwan graphite na PECVD don tantanin hasken rana (shafi) | Makamashin VET

Da farko, muna buƙatar saniPECVD(Bacewar Tururin Sinadarin Plasma). Plasma shine ƙara ƙarfin motsin zafi na ƙwayoyin halitta. Haɗarin da ke tsakaninsu zai sa ƙwayoyin iskar gas su zama ionized, kuma kayan zai zama cakuda ions masu motsi kyauta, electrons da barbashi masu tsaka-tsaki waɗanda ke hulɗa da juna.

 

An kiyasta cewa ƙimar asarar haske a saman silicon ya kai kusan kashi 35%. Fim ɗin hana haske zai iya inganta yawan amfani da hasken rana ta hanyar ƙwayar batirin, wanda ke taimakawa wajen ƙara yawan hasken da aka samar ta hanyar photogenerated da kuma inganta ingancin juyawa. A lokaci guda, hydrogen da ke cikin fim ɗin yana ratsa saman ƙwayar batirin, yana rage yawan haɗuwar saman mahaɗin emitter, yana rage yawan duhu, yana ƙara ƙarfin wutar lantarki na buɗewa, kuma yana inganta ingancin juyawar photoelectric. Ƙara yawan zafin jiki mai zafi a cikin tsarin ƙonewa yana karya wasu haɗin Si-H da NH, kuma an sake H ɗin yana ƙara ƙarfafa passivation na baturin.

 

Tunda kayan silicon masu siffar photovoltaic ba makawa suna ɗauke da adadi mai yawa na ƙazanta da lahani, tsawon rayuwar mai ɗaukar silikon da kuma tsawon watsawa a cikin silicon yana raguwa, wanda ke haifar da raguwar ingancin juyawar batirin. H na iya amsawa da lahani ko ƙazanta a cikin silicon, ta haka yana canja wurin madaurin makamashi a cikin madaurin valence ko madaurin conduction.

 

1. Ka'idar PECVD

Tsarin PECVD jerin janareta ne da ke amfani daJirgin ruwan graphite na PECVD da kuma abubuwan da ke fitar da sinadarin plasma mai yawan mita. Ana sanya janareta na plasma kai tsaye a tsakiyar farantin murfin don mayar da martani a ƙarƙashin ƙaramin matsin lamba da zafin jiki mai yawa. Iskar gas masu aiki da ake amfani da su sune silane SiH4 da ammonia NH3. Waɗannan iskar gas suna aiki akan silicon nitride da aka adana a kan silicon wafer. Ana iya samun ma'aunin haske daban-daban ta hanyar canza rabon silane zuwa ammonia. A lokacin aikin adanawa, ana samar da adadi mai yawa na atoms na hydrogen da ions na hydrogen, wanda ke sa hydrogen passivation na wafer ɗin yayi kyau sosai. A cikin injin daskarewa da zafin jiki na yanayi na digiri 480 Celsius, ana shafa wani Layer na SixNy a saman silicon wafer ta hanyar gudanar da shi.Jirgin ruwan graphite na PECVD.

 

3SiH4+4NH3 → Si3N4+12H2

 

2. Si3N4

Launin fim ɗin Si3N4 yana canzawa da kauri. Gabaɗaya, kauri mafi kyau yana tsakanin 75 zuwa 80 nm, wanda ke kama da shuɗi mai duhu. Ma'aunin haske na fim ɗin Si3N4 ya fi kyau tsakanin 2.0 da 2.5. Yawanci ana amfani da barasa don auna ma'aunin haske.

Kyakkyawan tasirin surface passivation, ingantaccen aikin hana haske na gani (daidaitawa tsakanin kauri da refractive index), tsarin ƙarancin zafin jiki (yana rage farashi yadda ya kamata), da kuma ions na H da aka samar suna lalata saman silicon wafer.

 

3. Al'amura na yau da kullun a fannin aikin rufe fuska

Kauri a fim: 

Lokacin ajiyewa ya bambanta ga kauri daban-daban na fim. Ya kamata a ƙara ko rage lokacin ajiyewa daidai gwargwadon launin murfin. Idan fim ɗin fari ne, ya kamata a rage lokacin ajiyewa. Idan ja ne, ya kamata a ƙara shi yadda ya kamata. Ya kamata a tabbatar da cewa kowace jirgin ruwa na fina-finai sun yi daidai, kuma ba a barin samfuran da ke da lahani su shiga cikin tsari na gaba ba. Misali, idan murfin bai yi kyau ba, kamar dige-dige da alamun alamun ruwa, ya kamata a zaɓi farin saman da aka fi sani, bambancin launi, da fari a layin samarwa akan lokaci. Farin saman galibi yana faruwa ne ta hanyar fim ɗin silicon nitride mai kauri, wanda za'a iya gyarawa ta hanyar daidaita lokacin ajiye fim ɗin; fim ɗin bambancin launi galibi yana faruwa ne ta hanyar toshe hanyar gas, zubar bututun quartz, gazawar microwave, da sauransu; fararen dige galibi suna faruwa ne ta hanyar ƙananan dige-dige baƙi a cikin aikin da ya gabata. Kula da haske, ma'aunin haske, da sauransu, amincin iskar gas na musamman, da sauransu.

 

Farin tabo a saman:

PECVD wani muhimmin tsari ne a cikin ƙwayoyin hasken rana kuma muhimmin alama ne na ingancin ƙwayoyin hasken rana na kamfani. Tsarin PECVD gabaɗaya yana da aiki, kuma kowane rukuni na ƙwayoyin yana buƙatar a sa ido a kai. Akwai bututun murhu da yawa, kuma kowane bututu gabaɗaya yana da ɗaruruwan ƙwayoyin halitta (ya danganta da kayan aiki). Bayan canza sigogin tsari, zagayowar tabbatarwa tana da tsawo. Fasahar rufewa fasaha ce da duk masana'antar photovoltaic ke ba da mahimmanci a kanta. Ana iya inganta ingancin ƙwayoyin hasken rana ta hanyar inganta fasahar rufewa. A nan gaba, fasahar saman ƙwayoyin hasken rana na iya zama ci gaba a cikin ingancin ka'idar ƙwayoyin hasken rana.