In recent years, the application of SiC materials in the semiconductor industry has gradually increased, especially in power electronics, optoelectronic devices and high-frequency equipment, where their application has become increasingly widespread. SiC, with its extremely high hardness, excellent thermal stability and good electrical properties, has become an important alternative to silicon (Si) materials in industry. However, to achieve efficient and high-quality production of SiC devices, in addition to having strict requirements for the manufacturing process of SiC wafers, the wafer support technology cannot be ignored either. In this process, the role of the SiC Wafer Holder becomes particularly important.
A SiC Wafer Holder is a device specifically designed for supporting and fixing SiC wafers. Wafers need to go through multiple processes in the semiconductor manufacturing process, including chemical vapor deposition (CVD), thin film deposition, photolithography, etching, etc. All these processes require precise positioning and stable support of the wafers. The SiC Wafer Holder is precisely designed to provide stable support, ensuring that the wafers do not shift, bend or deform during these processes. Due to the extremely high hardness and high-temperature resistance of SiC material, SiC Wafer holders are usually made of materials with high temperature resistance and corrosion resistance, and need to have good thermal conductivity and chemical stability.
In the semiconductor manufacturing process, SiC wafers usually need to be processed in a high-temperature and high-pressure environment. Under these process conditions, wafers are prone to the influence of external physical impacts, thermal expansion and other factors, leading to deformation, scratches or contamination of the wafers. The role of the SiC Wafer Holder is precisely to prevent these problems from occurring by providing a strong and stable support force.
Application
- CVD (Chemical Vapor Deposition):In the CVD process, it can provide precise positioning support for the wafer, ensuring uniform deposition of the film in the atmosphere
- Lithography and Etching:It can ensure the precise alignment of the wafer, avoid offset and asymmetrical patterns, and guarantee the accuracy of the etching effect
- PVD:In processes such as PVD and sputtering, it is necessary to provide good support and also be able to withstand the impact of high-energy particles to maintain stable performance
- Testing and Packaging: During the testing and packaging of semiconductor devices, especially in the testing of high-frequency and high-power devices, an extremely precise support system is required
Post time: Aug-08-2025