Cov thev naus laus zis photolithography feem ntau tsom mus rau kev siv cov tshuab kho qhov muag los qhia cov qauv hluav taws xob ntawm silicon wafers. Qhov tseeb ntawm cov txheej txheem no cuam tshuam ncaj qha rau kev ua tau zoo thiab cov txiaj ntsig ntawm cov integrated circuits. Raws li ib qho ntawm cov khoom siv saum toj kawg nkaus rau kev tsim cov chip, lub tshuab lithography muaj txog li pua pua txhiab tus khoom. Ob qho tib si cov khoom siv kho qhov muag thiab cov khoom hauv lub tshuab lithography xav tau qhov tseeb siab heev kom ntseeg tau tias cov khoom siv hluav taws xob ua tau zoo thiab raug.Cov khoom siv SiCtau siv rau hauvcov wafer chucksthiab cov iav ceramic square.
Lub tshuab nqus tsev waferLub wafer chuck hauv lub tshuab lithography dais thiab txav lub wafer thaum lub sijhawm txheej txheem. Kev sib phim meej ntawm lub wafer thiab lub chuck yog qhov tseem ceeb rau kev rov ua dua qhov qauv ntawm qhov chaw ntawm lub wafer.SiC waferCov chucks paub txog lawv qhov sib dua, ruaj khov siab thiab coefficient thermal expansion qis, uas tuaj yeem txo cov khoom thauj inertial thiab txhim kho kev txav mus los zoo, qhov tseeb ntawm qhov chaw thiab kev ruaj khov.
Daim iav plaub fab ceramic Hauv lub tshuab lithography, qhov kev sib dhos ntawm wafer chuck thiab lub ntsej muag theem yog qhov tseem ceeb, uas cuam tshuam ncaj qha rau qhov tseeb thiab qhov ua tau ntawm lithography. Lub reflector plaub fab yog ib qho tseem ceeb ntawm wafer chuck scanning positioning feedback measurement system, thiab nws cov khoom siv xav tau yog lub teeb thiab nruj. Txawm hais tias silicon carbide ceramics muaj cov khoom zoo tagnrho lub teeb, kev tsim cov khoom no yog qhov nyuaj. Tam sim no, cov tuam txhab tsim khoom siv hluav taws xob thoob ntiaj teb feem ntau siv cov ntaub ntawv xws li fused silica thiab cordierite. Txawm li cas los xij, nrog rau kev nce qib ntawm thev naus laus zis, cov kws tshaj lij Suav tau ua tiav kev tsim cov khoom loj, cov duab nyuaj, lub teeb heev, kaw tag nrho silicon carbide ceramic square iav thiab lwm yam khoom siv kho qhov muag rau cov tshuab photolithography. Lub photomask, tseem hu ua lub qhov (aperture), xa lub teeb los ntawm lub ntsej muag los tsim cov qauv ntawm cov khoom siv photosensitive. Txawm li cas los xij, thaum EUV lub teeb irradiates lub ntsej muag, nws tso tawm cua sov, tsa qhov kub thiab txias mus rau 600 txog 1000 degrees Celsius, uas yuav ua rau muaj kev puas tsuaj thermal. Yog li ntawd, ib txheej ntawm SiC zaj duab xis feem ntau yog tso rau ntawm photomask. Ntau lub tuam txhab txawv teb chaws, xws li ASML, tam sim no muab cov yeeb yaj kiab nrog kev xa tawm ntau dua 90% los txo kev ntxuav thiab kev tshuaj xyuas thaum siv lub photomask thiab txhim kho kev ua haujlwm zoo thiab cov khoom tsim tawm ntawm EUV photolithography tshuab.
Kev Txiav Plasmathiab Deposition Photomasks, tseem hu ua crosshairs, muaj lub luag haujlwm tseem ceeb ntawm kev xa lub teeb los ntawm lub ntsej muag thiab tsim cov qauv ntawm cov khoom siv photosensitive. Txawm li cas los xij, thaum EUV (extreme ultraviolet) lub teeb irradiates lub photomask, nws tso tawm cua sov, tsa qhov kub mus rau ntawm 600 thiab 1000 degrees Celsius, uas yuav ua rau muaj kev puas tsuaj thermal. Yog li ntawd, ib txheej ntawm silicon carbide (SiC) zaj duab xis feem ntau yog tso rau ntawm lub photomask kom txo qhov teeb meem no. Tam sim no, ntau lub tuam txhab txawv teb chaws, xws li ASML, tau pib muab cov zaj duab xis nrog pob tshab ntau dua 90% los txo qhov xav tau kev ntxuav thiab kev tshuaj xyuas thaum lub sijhawm siv lub photomask, yog li txhim kho kev ua haujlwm zoo thiab cov khoom tsim tawm ntawm EUV lithography tshuab. Plasma Etching thiabLub nplhaib tsom xam tso tawmthiab lwm tus Hauv kev tsim khoom semiconductor, cov txheej txheem etching siv cov kua lossis roj etchants (xws li cov roj fluorine) ionized rau hauv plasma los bombard lub wafer thiab xaiv tshem tawm cov khoom tsis xav tau kom txog thaum cov qauv hluav taws xob xav tau nyob ntawmncuav mog qab zibnto. Qhov sib txawv, cov zaj duab xis nyias nyias zoo ib yam li sab nraud ntawm etching, siv txoj kev tso cov khoom siv rwb thaiv tsev ntawm cov txheej hlau los tsim cov zaj duab xis nyias. Txij li thaum ob qho txheej txheem siv cov thev naus laus zis plasma, lawv yooj yim rau cov teebmeem corrosive rau cov chav thiab cov khoom. Yog li ntawd, cov khoom hauv cov khoom siv yuav tsum muaj kev tiv thaiv plasma zoo, tsis tshua muaj kev cuam tshuam rau cov pa roj fluorine etching, thiab kev coj ua qis. Cov khoom siv etching thiab deposition ib txwm muaj, xws li cov nplhaib tsom, feem ntau yog ua los ntawm cov ntaub ntawv xws li silicon lossis quartz. Txawm li cas los xij, nrog rau kev nce qib ntawm kev sib xyaw ua ke ntawm lub voj voog me me, qhov kev thov thiab qhov tseem ceeb ntawm cov txheej txheem etching hauv kev tsim khoom siv sib xyaw ua ke tau nce ntxiv. Ntawm qib microscopic, kev ua kom meej silicon wafer etching xav tau cov plasma muaj zog siab kom ua tiav cov kab dav me dua thiab cov qauv khoom siv nyuaj dua. Yog li ntawd, cov tshuaj lom neeg vapor deposition (CVD) silicon carbide (SiC) tau maj mam dhau los ua cov khoom siv txheej txheem nyiam rau etching thiab deposition khoom siv nrog nws cov khoom siv lub cev thiab tshuaj zoo heev, kev ntshiab siab thiab kev sib xws. Tam sim no, CVD silicon carbide Cheebtsam hauv cov khoom siv etching suav nrog cov nplhaib tsom, cov taub hau da dej roj, cov tais thiab cov nplhaib ntug. Hauv cov khoom siv tso dej, muaj cov npog chamber, cov ntaub thaiv chamber thiabCov khoom siv graphite uas muaj SIC txheej.
Vim nws tsis tshua muaj reactivity thiab conductivity rau chlorine thiab fluorine etching gases,CVD silicon carbidetau dhau los ua cov khoom siv zoo tagnrho rau cov khoom xws li cov nplhaib tsom xam hauv cov khoom siv plasma etching.CVD silicon carbideCov khoom siv hauv cov khoom siv etching suav nrog cov nplhaib tsom, lub taub hau da dej roj, cov tais, cov nplhaib ntug, thiab lwm yam. Piv txwv li, lawv yog cov khoom tseem ceeb uas muab tso rau sab nraum lub wafer thiab sib cuag ncaj qha nrog lub wafer. Los ntawm kev siv hluav taws xob rau lub nplhaib, cov plasma raug tsom los ntawm lub nplhaib mus rau ntawm lub wafer, txhim kho qhov sib xws ntawm cov txheej txheem. Ib txwm muaj, cov nplhaib tsom yog ua los ntawm silicon lossis quartz. Txawm li cas los xij, thaum kev sib xyaw ua ke ntawm lub voj voog me me, qhov kev thov thiab qhov tseem ceeb ntawm cov txheej txheem etching hauv kev tsim khoom sib xyaw ua ke txuas ntxiv mus ntxiv. Lub zog thiab lub zog ntawm Plasma etching txuas ntxiv mus nce, tshwj xeeb tshaj yog hauv cov khoom siv capacitively coupled plasma (CCP) etching, uas xav tau lub zog plasma siab dua. Yog li ntawd, kev siv cov nplhaib tsom ua los ntawm cov ntaub ntawv silicon carbide nce ntxiv.
Lub sijhawm tshaj tawm: Lub Kaum Hli-29-2024