Silicon carbide ceramics: zvinhu zvakanyatsonaka zvinodiwa pakuita semiconductor processes

Tekinoroji yePhotolithography inonyanya kutarisa pakushandisa masisitimu ekuona kuti zvinhu zvionekwe sei pama "circuit pa "silicon wafers". Kurongeka kwemaitiro aya kunokanganisa zvakananga mashandiro uye kugona kwe "integrated circuit". Seimwe yemichina yepamusoro yekugadzira ma "chip", muchina we "lithography" une zvikamu zvinosvika mazana ezviuru. Zvese zvikamu zve "optical" uye zvikamu zviri mukati me "lithography system" zvinoda kunyatsojeka kuti zvive nechokwadi chekuti circuit inoshanda uye yakarurama.Zviumbwa zveSiCzvakashandiswa muzvimedu zvewaferuye magirazi eceramic sikweya.

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Wafer chuckChivharo chewafer chiri mumuchina we lithography chinofambisa wafer panguva yekuiswa kwayo. Kurongeka kwakanyatsojeka pakati pewafer nechivharo kwakakosha kuti patani yacho inyatsofanana neyawafer iri pamusoro pewafer.SiC waferMachuck anozivikanwa nekureruka kwawo, kugadzikana kwepamusoro-soro uye kusimba kwekuwedzera kwekupisa kwakaderera, izvo zvinogona kuderedza mutoro we inertial uye kuvandudza kushanda zvakanaka kwekufamba, kunyatsorongeka kwenzvimbo uye kugadzikana.

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Girazi reCeramic square. Mumuchina we lithography, kuenderana kwemafambiro pakati pe wafer chuck nechikamu che mask kwakakosha, izvo zvinokanganisa zvakananga kurongeka kwe lithography uye goho. Square reflector chikamu chakakosha che wafer chuck scanning positioning feedback measurement system, uye zvinodiwa zvayo zvakareruka uye zvakasimba. Kunyangwe silicon carbide ceramics iine hunhu hwakanaka hwakareruka, kugadzira zvikamu zvakadaro kwakaoma. Parizvino, vagadziri vemidziyo yepasi rose yakabatanidzwa vanoshandisa zvakanyanya zvinhu zvakaita se fused silica ne cordierite. Zvisinei, nekufambira mberi kwetekinoroji, nyanzvi dzekuChina dzakabudirira kugadzira magirazi makuru, akaumbwa zvakaoma, akareruka kwazvo, akavharwa zvizere e silicon carbide ceramic square uye zvimwe zvikamu zvinoshanda zve optical zvemichina ye photolithography. Iyo photomask, inozivikanwawo se aperture, inotumira chiedza kuburikidza ne mask kuti igadzire pateni pazvinhu zvinonzwa photosensitive. Zvisinei, kana chiedza cheEUV chichivhenekera mask, inoburitsa kupisa, ichikwidza tembiricha kusvika 600 kusvika 1000 degrees Celsius, izvo zvinogona kukonzera kukuvara kwekupisa. Saka, layer yeSiC film inowanzoiswa pa photomask. Makambani mazhinji ekune dzimwe nyika, akadai seASML, ikozvino anopa mafirimu ane transmittance inopfuura 90% kuderedza kuchenesa nekutarisa panguva yekushandiswa kwe photomask uye kuvandudza kushanda zvakanaka uye goho rezvigadzirwa zvemichina yeEUV photolithography.

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Kucheka kwePlasmauye Deposition Photomasks, inozivikanwawo secrosshairs, ine basa guru rekutumira chiedza kuburikidza nemasiki uye kugadzira patani pazvinhu zvinonzwa chiedza. Zvisinei, kana chiedza cheEUV (extreme ultraviolet) chikavhenekera photomask, chinoburitsa kupisa, zvichikwidza tembiricha kusvika pakati pe600 ne1000 degrees Celsius, izvo zvinogona kukonzera kukuvara kwekupisa. Nokudaro, jira resilicon carbide (SiC) film rinowanzoiswa paphotomask kuderedza dambudziko iri. Parizvino, makambani mazhinji ekunze, akadai seASML, atanga kupa mafirimu kujeka kweanopfuura 90% kuderedza kudiwa kwekuchenesa nekuongorora panguva yekushandiswa kwephotomask, nokudaro zvichivandudza kushanda zvakanaka uye goho rezvigadzirwa zveEUV lithography machines. Plasma Etching uyeMhete Yekutarisa Yekuisa Nzvimbouye zvimwe Mukugadzira semiconductor, maitiro ekucheka anoshandisa zvinhu zvinonyungudutsa mvura kana gasi (senge magasi ane fluorine) zvakaiswa muplasma kuti zviputire wafer uye kubvisa zvinhu zvisingadiwe kusvika patani yedunhu yaunoda yasara pairi.chifukidziropamusoro. Kusiyana neizvi, kuiswa kwefirimu rakatetepa kwakafanana nekumashure kwekuchekwa, uchishandisa nzira yekuchekwa kuisa zvinhu zvinodzivirira pakati pezvikamu zvesimbi kuti zvigadzire firimu rakatetepa. Sezvo maitiro ese ari maviri achishandisa tekinoroji yeplasma, anowanzo kuve nemigumisiro yekuora pamakamuri nezvikamu. Nokudaro, zvikamu zviri mukati memidziyo zvinodiwa kuti zvive nekudzivirira kwakanaka kweplasma, kuita zvishoma kune magasi ekuchera fluorine, uye kufambisa kwakaderera. Zvikamu zvemidziyo yekucheka nekuisa, senge masimbi ekuisa, zvinowanzogadzirwa nezvinhu zvakaita sesilicon kana quartz. Zvisinei, nekufambira mberi kwekugadzirwa kweminiaturization yedunhu rakabatanidzwa, kudiwa uye kukosha kwemaitiro ekucheka mukugadzirwa kwedunhu rakabatanidzwa kuri kuwedzera. Padanho re microscopic, etching chaiyo yesilicon wafer inoda plasma ine simba rakawanda kuti iwane upamhi hudiki hwemitsara uye maumbirwo akaomarara emidziyo. Naizvozvo, chemical vapor deposition (CVD) silicon carbide (SiC) zvishoma nezvishoma yave chinhu chinodiwa chekuputira michina yekucheka nekuisa ine hunhu hwayo hwakanaka hwepanyama nemakemikari, kuchena kwakanyanya uye kufanana. Parizvino, zvikamu zveCVD silicon carbide mumidziyo yekucheka zvinosanganisira masimbi ekuisa, misoro yeshawa yegesi, matireyi nemhete dzemucheto. Mumidziyo yekuisa zvinhu, mune zvivharo zvemakamuri, machira emakamuri uyeZvigadziko zvegrafiti zvakaputirwa neSIC.

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Nekuda kwekusaita kwayo zvakanaka uye kufambisa simba kwayo ku chlorine ne fluorine etching gases,CVD silicon kabhidhirave chinhu chakanakira zvinhu zvakaita sema "focus rings" mumidziyo ye "plasma etching".CVD silicon kabhidhiZvikamu zviri mumidziyo yekunamira zvinosanganisira ma "focus rings", ma "gas shower heads", ma "tray", ma "edge rings", nezvimwewo. Semuenzaniso, ma "focus rings" ndiwo ma "numbers" akakosha akaiswa kunze kwe "wafer" uye akabatana zvakananga ne "wafer". Nekushandisa voltage ku "ring", plasma inonangidzirwa kuburikidza ne "ring" kuenda ku "wafer", zvichivandudza kufanana kwemaitiro acho. Netsika, ma "focus rings" anogadzirwa ne "silicon" kana "quartz". Zvisinei, sezvo "integrated circuit miniaturization" ichifambira mberi, kudiwa uye kukosha kwe "etching process" mukugadzirwa kwe "integrated circuit" kuri kuramba kuchiwedzera. Simba re "etching" ne "energy" zvinoramba zvichikwira, kunyanya mu "capacitively coupled plasma (CCP) etching equipment", iyo inoda simba re "plasma energy" rakawanda. Nekuda kweizvozvo, kushandiswa kwe "focus rings" dzakagadzirwa nezvinhu zve "silicon carbide" kuri kuwedzera.


Nguva yekutumira: Gumiguru-29-2024
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