Vim li cas cov phab ntsa sab nraud thiaj khoov thaum lub sijhawm etching qhuav?

Kev tsis sib xws ntawm ion bombardment

Qhuavkev txiavfeem ntau yog ib qho txheej txheem uas sib xyaw ua ke cov teebmeem ntawm lub cev thiab tshuaj, uas qhov kev foob pob ion yog ib txoj kev tseem ceeb ntawm lub cev etching. Thaum lub sijhawmcov txheej txheem etching, lub kaum sab xis thiab lub zog faib ntawm cov ions yuav tsis sib npaug.

Yog tias lub kaum sab xis ntawm cov ion sib txawv ntawm ntau qhov chaw ntawm phab ntsa sab nraud, qhov cuam tshuam ntawm cov ions ntawm phab ntsa sab nraud kuj yuav txawv. Hauv cov cheeb tsam uas muaj cov kaum sab xis loj dua ntawm cov ion, qhov cuam tshuam ntawm cov ions ntawm phab ntsa sab nraud muaj zog dua, uas yuav ua rau phab ntsa sab nraud hauv thaj chaw no raug etched ntau dua, ua rau phab ntsa sab nraud khoov. Tsis tas li ntawd, qhov kev faib tawm tsis sib xws ntawm lub zog ion kuj tseem yuav tsim cov teebmeem zoo sib xws. Cov ions uas muaj zog dua tuaj yeem tshem tawm cov ntaub ntawv zoo dua, ua rau tsis sib xwskev txiavcov degrees ntawm phab ntsa ntawm ntau qhov chaw sib txawv, uas ua rau phab ntsa nkhaus.

Kev cuam tshuam ntawm photoresist

Photoresist ua lub luag haujlwm ntawm lub ntsej muag hauv kev etching qhuav, tiv thaiv cov cheeb tsam uas tsis tas yuav etched. Txawm li cas los xij, tus photoresist kuj raug cuam tshuam los ntawm plasma bombardment thiab cov tshuaj lom neeg thaum lub sijhawm etching, thiab nws cov kev ua tau zoo yuav hloov pauv.

Yog tias qhov tuab ntawm cov photoresist tsis sib xws, qhov kev siv thaum lub sijhawm etching tsis sib xws, lossis qhov sib txuas ntawm cov photoresist thiab cov substrate sib txawv ntawm ntau qhov chaw sib txawv, nws yuav ua rau muaj kev tiv thaiv tsis sib xws ntawm cov phab ntsa sab thaum lub sijhawm etching. Piv txwv li, thaj chaw uas muaj cov photoresist nyias dua lossis qhov sib txuas tsis muaj zog yuav ua rau cov khoom hauv qab yooj yim dua etched, ua rau cov phab ntsa sab khoov ntawm cov chaw no.

Qhov sib txawv ntawm cov khoom siv substrate

Cov khoom siv etched substrate nws tus kheej yuav muaj cov khoom sib txawv, xws li cov kev taw qhia siv lead ua sib txawv thiab cov doping concentration hauv thaj chaw sib txawv. Cov kev sib txawv no yuav cuam tshuam rau qhov nrawm etching thiab etching selectivity.
Piv txwv li, hauv crystalline silicon, qhov kev npaj ntawm silicon atoms nyob rau hauv ntau qhov kev taw qhia siv lead ua yog txawv, thiab lawv cov reactivity thiab etching tus nqi nrog cov roj etching kuj yuav txawv. Thaum lub sijhawm etching, qhov sib txawv etching tus nqi los ntawm qhov sib txawv ntawm cov khoom siv yuav ua rau qhov tob etching ntawm cov phab ntsa ntawm qhov chaw sib txawv tsis sib xws, thaum kawg ua rau sidewall khoov.

Cov yam ntxwv ntsig txog cov khoom siv

Qhov kev ua tau zoo thiab qhov xwm txheej ntawm cov khoom siv etching kuj muaj qhov cuam tshuam tseem ceeb rau cov txiaj ntsig etching. Piv txwv li, cov teeb meem xws li kev faib tawm plasma tsis sib xws hauv chav tshuaj tiv thaiv thiab kev hnav electrode tsis sib xws yuav ua rau muaj kev faib tawm tsis sib xws ntawm cov yam ntxwv xws li ion ceev thiab lub zog ntawm qhov chaw wafer thaum lub sijhawm etching.

Tsis tas li ntawd xwb, kev tswj qhov kub tsis sib xws ntawm cov khoom siv thiab kev hloov pauv me ntsis ntawm cov roj ntws kuj tseem yuav cuam tshuam rau qhov sib xws ntawm etching, ua rau sidewall bending.