Ebumnuche na-agbasana-tumadi eji na ngwá electronic na ozi ụlọ ọrụ, dị ka integrated sekit, ozi nchekwa, mmiri mmiri crystal ngosi, Laser na-echeta, electronic akara ngwaọrụ, wdg Ha nwekwara ike-eji na ubi nke iko mkpuchi, nakwa dị ka na-eyi na-eguzogide ihe, elu-okpomọkụ corrosion iguzogide , elu-ọgwụgwụ ịchọ mma ngwaahịa na ndị ọzọ na ụlọ ọrụ.
Ịchụpụ ihe bụ otu n'ime usoro eji akwadebe ihe nkiri dị mkpa.Ọ na-eji ion emepụtara site na isi iyi ion iji mee ngwa ngwa ma gbakọta n'ime oghere iji mepụta ion ion ume dị elu, na-atụba elu elu siri ike, na mgbanwe ike kinetic n'etiti ion na atom elu siri ike. Atọm ndị dị n'elu ala siri ike na-ahapụ ihe siri ike ma debe ya n'elu nke mkpụrụ. Ihe siri ike na-atụ bọmbụ bụ ihe eji etinye ihe nkiri ndị dị mkpa site na sputtering, nke a na-akpọ sputtering target. Dị iche iche nke sputtered mkpa film ihe e ọtụtụ-eji na semiconductor Integrated sekit, ndekọ media, flat-panel ngosi na workpiece elu coatings.
N'ime ụlọ ọrụ ngwa niile, ụlọ ọrụ semiconductor nwere ihe kachasị mma chọrọ maka fim ndị na-agbapụta ihe nkiri.A na-eji ebumnuche ndị na-agbapụta ihe dị elu dị ọcha na nrụpụta wafer na usoro nkwakọ ngwaahịa dị elu. Na-ewere mgbawa n'ichepụta dị ka ihe atụ, anyị nwere ike ịhụ na site a silicon wafer na mgbawa, ọ kwesịrị ịga site 7 isi mmepụta usoro, ya bụ mgbasa (Thermal Process), Photo-lithography (Photo-lithography), Etch (Etch), Ion Implantation (IonImplant), Thin Film Growth (Dielectric Deposition), Chemical Mechanical Mechantal Process one (CMP). A na-eji ihe mgbaru ọsọ na-agbapụ na-eme ihe na usoro nke "metallization". A na-etinye ihe a na-achọsi ike site na ngwa ntinye ihe nkiri dị mkpa wee kpụrụ oyi akwa nke nwere ọrụ ụfọdụ na silicon wafer, dị ka oyi akwa conductive, mgbochi mgbochi. Wait.Since usoro nke dum semiconductor dị iche iche mgbe ụfọdụ mgbe ụfọdụ ọnọdụ dị mkpa maka verifying usoro dị n'ụzọ ziri ezi otú anyị na-achọ ụfọdụ ụdị dummy ihe na ụfọdụ nkebi nke mmepụta iji gosi mmetụta.
Oge nzipu: Jan-17-2022