Ama-sputtering target asetshenziswa kuma-semiconductor integrated circuits

Ama-targets akhipha amanziZisetshenziswa kakhulu embonini ye-elekthronikhi kanye nolwazi, njengezifunda ezihlanganisiwe, isitoreji solwazi, izibonisi zekristalu eliwuketshezi, izinkumbulo ze-laser, amadivayisi okulawula kagesi, njll. Zingasetshenziswa futhi emkhakheni wokumboza ingilazi, kanye nasezintweni ezingagugi, ukumelana nokugqwala okushisa okuphezulu, imikhiqizo yokuhlobisa ephezulu kanye neminye imboni.

I-Target Yokuhlanzeka Okuphezulu engu-99.995% ye-Titanium SputteringI-Ferrum Sputtering TargetIthagethi Yokupompa I-Carbon C, Ithagethi Ye-Graphite

Ukutshiza kungenye yezindlela eziyinhloko zokulungiselela izinto ezincane zefilimu.Isebenzisa ama-ion akhiqizwa yimithombo yama-ion ukusheshisa nokuhlangana endaweni evalekile ukuze yakhe imisebe yama-ion yamandla asheshayo, ihlasele ubuso obuqinile, futhi ishintshe amandla e-kinetic phakathi kwama-ion nama-athomu angaphezulu aqinile. Ama-athomu aphezu kobuso obuqinile ayashiya okuqinile bese ebekwa ebusweni be-substrate. I-bombarded solid iyizinto zokusetshenziswa zokufaka amafilimu amancane ngokufaka ama-sputtering, okubizwa ngokuthi i-sputtering target. Izinhlobo ezahlukene zezinto zefilimu encane efakwe ama-sputtered ziye zasetshenziswa kabanzi kumasekethe ahlanganisiwe e-semiconductor, imidiya yokuqopha, izibonisi zephaneli ezisicaba kanye nezingubo zokugqoka zobuso be-workpiece.

Phakathi kwazo zonke izimboni zokufaka isicelo, imboni ye-semiconductor inezidingo zekhwalithi eziqinile kakhulu zamafilimu okubhoboza okuqondiwe. Ama-targets okubhoboza okunensimbi ahlanzekile kakhulu asetshenziswa kakhulu ekukhiqizeni i-wafer kanye nezinqubo zokupakisha ezithuthukisiwe. Uma sibheka ukukhiqizwa kwe-chip njengesibonelo, singabona ukuthi kusukela ku-wafer ye-silicon kuya ku-chip, idinga ukudlula ezinqubweni zokukhiqiza ezi-7 ezinkulu, okungukuthi ukusabalala (Inqubo Yokushisa), i-Photo-lithography (I-Photo-lithography), i-Etch (Etch), i-Ion Implantation (IonImplant), i-Thin Film Growth (Dielectric Deposition), i-Chemical Mechanical Polishing (CMP), i-Metalization (Metalization). Izinqubo zihambisana ngayinye ngayinye. I-target yokubhoboza isetshenziswa enqubweni "yokwenza insimbi". I-target ihlaselwa ngezinhlayiya zamandla aphezulu ngemishini yokubeka ifilimu encane bese kwakheka ungqimba lwensimbi olunemisebenzi ethile ku-wafer ye-silicon, njengengqimba yokuhambisa, ungqimba lwesithiyo. Linda. Njengoba izinqubo ze-semiconductors zonke ziyahlukahluka, kudingeka izimo ezithile ngezikhathi ezithile ukuqinisekisa ukuthi uhlelo lukhona kahle ngakho-ke sidinga izinhlobo ezithile zezinto zobuqili ezigabeni ezithile zokukhiqiza ukuqinisekisa imiphumela.


Isikhathi sokuthunyelwe: Jan-17-2022
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