iSilicon Carbideyi-compound eqinileyo equlethe i-silicon kunye ne-carbon, kwaye ifumaneka kwindalo njenge-moissanite yeminerali enqabileyo kakhulu. Amasuntswana e-silicon carbide anokudityaniswa ngokusila ukuze enze ii-ceramics eziqinileyo kakhulu, ezisetyenziswa kakhulu kwizicelo ezifuna ukuqina okuphezulu, ingakumbi kwi-semiconductor processing.
Ulwakhiwo lweSiC
Yintoni iSiC Coating?
I-SiC coating yi-silicon carbide coating exineneyo, engagugiyo enokumelana nokugqwala okuphezulu kunye nobushushu kunye nokuqhuba kakuhle kobushushu. Le SiC coating ecocekileyo kakhulu isetyenziswa kakhulu kumashishini e-semiconductor kunye ne-elektroniki ukukhusela abathwali be-wafer, iziseko kunye nezinto zokufudumeza kwiindawo ezirhabaxa nezisabelayo. I-SiC coating ikwafanelekile kwii-vacuum flanks kunye nokufudumeza isampuli kwiindawo ezirhabaxa eziphezulu, ezisabelayo kunye ne-oxygen.
Ubunyulu obuphezulu bomphezulu we-SiC
Iyintoni inkqubo yokugquma iSiC?
Umaleko omncinci we-silicon carbide ubekwa phezu komphezulu we-substrate usebenzisaI-CVD (Ukususwa koMphunga weKhemikhali)Ukufakwa kwe-substrate kudla ngokwenziwa kumaqondo obushushu angama-1200-1300°C kwaye indlela yokwandisa ubushushu bezinto ezisetyenziswa kwi-substrate kufuneka ihambelane ne-SiC coating ukunciphisa uxinzelelo lobushushu.

Ulwakhiwo lweCrystal yeFilimu yokuGcoba iCVD SIC
Iimpawu ezibonakalayo ze-SiC coating zibonakala kakhulu kukumelana kwayo nobushushu obuphezulu, ubulukhuni, ukumelana nokugqwala kunye nokuqhuba kobushushu.
Iiparameters eziqhelekileyo zomzimba zihlala zilandelayo:
Ukuqina: I-SiC coating idla ngokuba ne-Vickers Hardness ephakathi kwe-2000-2500 HV, nto leyo ebanika ukuguguleka okuphezulu kakhulu kunye nokumelana nempembelelo kwizicelo zoshishino.
Uxinano: Iingubo zeSiC zihlala zinobunzima obuyi-3.1-3.2 g/cm³. Ubunzima obuphezulu bunegalelo kumandla oomatshini kunye nokuqina kwengubo.
Ukuqhuba kobushushu: Iingubo zeSiC zinomoya ophezulu wokuqhuba ubushushu, ngesiqhelo ziphakathi kwe-120-200 W/mK (kwi-20°C). Oku kuyinika umoya omhle wokuqhuba ubushushu kwiindawo ezinobushushu obuphezulu kwaye kuyenza ifaneleke ngakumbi kwizixhobo zonyango lobushushu kwishishini le-semiconductor.
Indawo yokunyibilika: i-silicon carbide inendawo yokunyibilika emalunga nama-2730°C kwaye izinzile kakhulu kubushushu obuphezulu.
Ukwanda kwe-Thermal Coefficient: Iingubo zeSiC zine-coefficient ephantsi yokwandisa ubushushu (CTE), ngokuqhelekileyo zikwi-4.0-4.5 µm/mK (kwi-25-1000℃). Oku kuthetha ukuba uzinzo lwayo lobukhulu lubalasele kakhulu kubushushu obukhulu.
Ukumelana nokugqwala: Iingubo zeSiC ziyamelana kakhulu nokugqwala kwiindawo ezine-asidi enamandla, i-alkali kunye ne-oxidizing, ingakumbi xa kusetyenziswa ii-asidi ezinamandla (ezifana ne-HF okanye i-HCl), ukuxhathisa kwazo ukugqwala kudlula kakhulu oko kwezixhobo zesinyithi eziqhelekileyo.
Isiseko sesicelo sokugquma seSiC
I-SiC coating idla ngokusetyenziswa ukuphucula ukumelana nokugqwala, ukumelana nobushushu obuphezulu, kunye nokumelana nokukhukuliseka kwe-plasma ye-substrate. Ii-substrate ezisetyenziswa rhoqo ziquka oku kulandelayo:
| Uhlobo lwe-substrate | Isizathu sesicelo | Ukusetyenziswa okuqhelekileyo |
| Igrafayithi | - Ulwakhiwo olukhanyayo, ukuqhuba kakuhle kobushushu - Kodwa idlakazwa lula yiplasma, ifuna ukhuseleko lokugquma kweSiC | Iindawo zegumbi lokucoca umoya, iinqanawa zegrafiti, iitreyi zokugrumba ngeplasma, njl. |
| I-Quartz (iQuartz/iSiO₂) | - Ubumsulwa obuphezulu kodwa budla ngokugqwala - Ukwaleka kwandisa ukumelana nokukhukuliseka kwe-plasma | Iindawo zegumbi le-CVD/PECVD |
| Iiseramikhi (ezifana ne-alumina Al₂O₃) | - Amandla aphezulu kunye nesakhiwo esizinzileyo - Ukwaleka kuphucula ukumelana nokugqwala komphezulu | Iingubo zegumbi, izinto ezifakelweyo, njl. |
| Iimetali (ezifana ne-molybdenum, i-titanium, njl.njl.) | - Ukuqhuba kakuhle kobushushu kodwa ukumelana nokugqwala okubi - Ukwaleka kuphucula uzinzo lomphezulu | Izixhobo ezikhethekileyo zokuphendula ngenkqubo |
| Umzimba we-silicon carbide osikiweyo (ubuninzi be-SiC) | - Kwiindawo ezineemfuno eziphezulu zeemeko zokusebenza ezinzima - Ukwaleka kuphucula ngakumbi ubumsulwa kunye nokumelana nokugqwala | Izixhobo zegumbi le-CVD/ALD ezikumgangatho ophezulu |
Iimveliso ezigqunywe yiSiC zihlala zisetyenziswa kwezi ndawo zilandelayo ze-semiconductor
Iimveliso zokugquma zeSiC zisetyenziswa kakhulu ekucutshungulweni kwee-semiconductor, ikakhulu kubushushu obuphezulu, ukugqwala okuphezulu kunye neendawo ezinamandla zeplasma. Ezi zilandelayo ziinkqubo ezininzi eziphambili zokusetyenziswa okanye amasimi kunye neenkcazo ezimfutshane:
| Inkqubo/intsimi yesicelo | Inkcazo emfutshane | Umsebenzi weSilicon Carbide Coating |
| Ukugrumba ngeplasma (Ukugrumba) | Sebenzisa iigesi ezisekelwe kwi-fluorine okanye kwi-chlorine ukuze udlulisele iipateni | Melana nokukhukuliseka kweplasma kwaye uthintele ungcoliseko lwamasuntswana kunye nesinyithi |
| Ukufakwa komphunga weekhemikhali (i-CVD/PECVD) | Ukufakwa kwe-oxide, i-nitride kunye nezinye iifilimu ezincinci | Melana neegesi ezibangela ukonakaliswa kwaye wongeze ubomi bezinto ezisetyenziswayo |
| Igumbi lokufumba umphunga ngokwasemzimbeni (iPVD) | Ukuqhushumba kwamasuntswana anamandla aphezulu ngexesha lenkqubo yokugquma | Ukuphucula ukumelana nokukhukuliseka kunye nokumelana nobushushu kwegumbi lokusabela |
| Inkqubo ye-MOCVD (efana nokukhula kwe-SiC epitaxial) | Ukusabela kwexesha elide phantsi kobushushu obuphezulu kunye nomoya ophezulu we-hydrogen corrosive | Gcina uzinzo lwezixhobo kwaye uthintele ungcoliseko lweekristale ezikhulayo |
| Inkqubo yokunyanga ubushushu (i-LPCVD, ukusasazwa, ukufakelwa, njl.njl.) | Ihlala yenziwa kubushushu obuphezulu kunye ne-vacuum/atmosphere | Khusela iinqanawa zegrafiti kunye neetreyi kwi-oxidation okanye ukubola |
| Umthwali wewafer/ichuck (Ukuphathwa kwewafer) | Isiseko segrafiti sokudlulisa okanye ukuxhasa i-wafer | Nciphisa ukuchitheka kwamasuntswana kwaye uphephe ungcoliseko lokudibana |
| Izixhobo zegumbi le-ALD | Ukulawula ngokuphindaphindiweyo nangokuchanekileyo ukufakwa kwe-atomic layer | Ingubo igcina igumbi licocekile kwaye inokumelana nokugqwala okuphezulu kwizinto ezingaphambili |
Kutheni ukhetha i-VET Energy?
I-VET Energy ngumvelisi ophambili, umvelisi kunye nenkokeli yeemveliso zokugquma zeSiC eTshayina, iimveliso eziphambili zokugquma zeSiC ziqukaisithwali se-wafer esine-SiC coating, I-SiC egqunywe nge-camerai-epitaxial susceptor, Indandatho yegrafayithi egqunywe yiSiC, Iindawo zesiqingatha senyanga ezine-SiC coating, I-SiC egqunywe yi-carbon-carbon composite, Isikhephe se-wafer esigqunywe yi-SiC, Isifudumezi esine-SiC esigqunywe yi-SiC, njl. I-VET Energy izibophelele ekuboneleleni imboni ye-semiconductor ngezisombululo zobuchwepheshe kunye nemveliso ezigqwesileyo, kwaye ixhasa iinkonzo zokwenza ngokwezifiso. Silangazelela ukuba liqabane lakho lexesha elide eTshayina.
Ukuba unemibuzo okanye ufuna iinkcukacha ezongezelelweyo, nceda ungathandabuzi ukunxibelelana nathi.
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Email: steven@china-vet.com
Ixesha leposi: Oktobha-18-2024
