ʻO ka Vacuum Chuck Ceramic Porous Kiʻekiʻe
ʻO ka Porous Ceramic Vacuum ChuckHe kahua halihali ukana ia e hoʻohana ana i ke kumumanaʻo o ka adsorption vacuum e hoʻopaʻa i nā ʻāpana hana. ʻO ka ʻāpana o ka chuck vacuum e hoʻouna ana i ka vacuum he papa keramika porous. Hoʻākoakoa ʻia ka papa keramika porous i loko o ka lua piholo o ke kumu, a ua hoʻopaʻa ʻia kona periphery a hoʻopaʻa ʻia me ke kumu. Hana ʻia ke kumu me nā mea keramika a metala pololei. Ma ka hoʻohui ʻana i kahi kumu metala a keramika paha me kahi keramika porous kūikawā, ʻo ka hoʻolālā ʻana o ke ala ea pololei kūloko e ʻae ai i ka hoʻopili maʻalahi a paʻa o ka workpiece i ke kīʻaha omo vacuum ke kau ʻia i ke kaomi maikaʻi ʻole.
Ma muli o nā pores lahilahi loa o nā keramika porous, hiki ke hoʻopili ʻia ka ʻili o ka mea hana i ke kīʻaha omo vacuum me ka ʻole o nā mea maikaʻi ʻole e like me nā ʻōpala a i ʻole nā decks i hoʻokumu ʻia e ke kaomi maikaʻi ʻole.
Nā ʻano o ka Porous Ceramic Vacuum Chuck:
① ʻAno paʻa a like: Kūʻē i ka pauka silicon/wili ʻōpala adsorption, maʻalahi e hoʻomaʻemaʻe.
② Ikaika kiʻekiʻe a me ke kūpaʻa ʻana i ka ʻaʻahu: ʻAʻohe deformation i ka wā e wili ai, hoʻēmi i ka chipping/fragmentation lihi.
③ Ola lōʻihi: Paʻa maikaʻi loa i ke ʻano o ka ʻili, lōʻihi ke kaʻina hana me ka liʻiliʻi o ka wehe ʻana.
④ Palekana kiʻekiʻe: Hoʻopau i ka uila static.
⑤ Hiki ke hoʻohana hou ʻia a maʻalahi hoʻi e hoʻoponopono: ʻAʻohe māwae/ʻoki i ka wā e hana hou ai, hiki ke hoʻohana hou ʻia i nā manawa he nui.
⑥ ʻAʻole lepo a paʻa: Sintered piha, ʻaʻohe hoʻokuʻu ʻāpana.
⑦ Māmā: Hoʻemi nui ka ʻōnaehana porous i ke kaumaha.
⑧ Ke kū'ē kemika: Hiki ke hoʻopilikino ʻia no nā wahi ʻino ma o ka kaohi ʻana i nā mea/kaʻina hana.
ʻO ka Vacuum Chuck Ceramic VS ke kīʻaha omo metala kuʻuna:
ʻO ka ʻūpā vacuum seramika ma ke kahua semiconductor
Hana nā chucks vacuum seramika ma ke ʻano he mau mea hana hoʻopaʻa a lawe i ka hana wafer semiconductor. Loaʻa iā lākou ka pālahalaha kiʻekiʻe a me ka parallelism, kahi ʻano paʻa a like, ikaika kiʻekiʻe, permeability maikaʻi, ikaika adsorption like, a me ka maʻalahi o ke kāhiko ʻana. ʻO kēia mau ʻano e kūpono ai lākou no nā kaʻina hana i ka hana wafer semiconductor e like me ka lahilahi, ʻokiʻoki, wili, hoʻomaʻemaʻe, a me ka lawelawe ʻana. Hoʻoponopono pono lākou i nā pilikia e like me ka paʻi wafer, ka haki electrostatic o nā ʻāpana, a me ka haumia o nā ʻāpana, e hoʻokō ana i ke ʻano hana kiʻekiʻe loa no nā wafers semiconductor i nā noi hana.
Pepa ʻIkepili o nā Mea Seramika
| Mea | 95% Alumina | 99% Alumina | Zirconia | Karbida silika | SilikaNʻitride | AluminiNʻitride |
| Waihoʻoluʻu | keʻokeʻo | Melemele māmā | keʻokeʻo | ʻeleʻele | ʻeleʻele | hinahina |
| Ka nui (g/cm3) | 3.7g/cm3 | 3.9g/cm3 | 6.02g/cm3 | 3.2g/cm3 | 3.25g/cm3 | 3.2g/cm3 |
| Ka omo ʻana o ka wai | 0% | 0% | 0% | 0% | 0% | 0% |
| Paʻakikī (HV) | 23.7 | 23.7 | 16.5 | 33 | 20 | - |
| Ikaika Flexural (MPa) | 300MPa | 400MPa | 1100MPa | 450MPa | 800MPa | 310MPa |
| Ikaika Hoʻopaʻa (MPa) | 2500MPa | 2800MPa | 3600MPa | 2000MPa | 2600MPa | - |
| Modulus o ka Elasticity o Young | 300GPa | 300GPa | 320GPa | 450GPa | 290GPa | 310~350GPa |
| Ka lakio o Poisson | 0.23 | 0.23 | 0.25 | 0.14 | 0.24 | 0.24 |
| Ka Hoʻokele Wela | 20W/m°C | 32W/m°C | 3W/m°C | 50W/m°C | 25W/m°C | 150W/m°C |
| Ikaika Dielectric | 14KV/mm | 14KV/mm | 14KV/mm | 14KV/mm | 14KV/mm | 14KV/mm |
| Ke kū'ē ʻana o ka leo (25 ℃) | >1014Ω·cm | >1014Ω·cm | >1014Ω·cm | >105Ω·cm | >1014Ω·cm | >1014Ω·cm |
He mea hana ʻoihana ʻo VET Energy e kālele ana i ka R&D a me ka hana ʻana o nā mea holomua kiʻekiʻe e like me ka graphite, silicon carbide, quartz, a me ka mālama ʻana i nā mea e like me ka SiC coating, TaC coating, glassy carbon coating, pyrolytic carbon coating, etc. Hoʻohana nui ʻia nā huahana i ka photovoltaic, semiconductor, new energy, metallurgy, etc.
Loaʻa kā mākou hui loea mai nā ʻoihana noiʻi kūloko kiʻekiʻe, hiki ke hāʻawi i nā hoʻonā mea ʻoihana hou aku nāu.
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