Indandatho yokugxila yengubo yeCVD

Isangqa sokugxila kwi-CVD coating Umfanekiso obonisiweyo

Inkcazo emfutshane:

I-CVD Coating Focus Ring ye-Plasma Etching yenzelwe ukuphucula ukusasazwa kwe-plasma kunye nokuphucula ukufana kwe-etching kwiinkqubo ze-etch eziphambili. Ine-substrate eqinileyo ye-Si okanye i-SiC edityaniswe ne-high-purity CVD SiC coating, inika ukumelana okuphezulu kwe-plasma, ukuveliswa kwamasuntswana aphantsi kakhulu, kunye nobomi benkonzo ende. Isetyenziswa kakhulu kwiinkqubo ze-ICP kunye ne-CCP plasma etching, le ring yokugxila inciphisa ngokufanelekileyo imiphumo yomphetho, izinzisa ukuziphatha kwe-ion, kwaye ikhusela izinto zegumbi ekukhukulisekeni nasekungcoleni. Yinto ebalulekileyo esetyenziswayo ukuze kufezekiswe isivuno esiphezulu kunye nokuhambelana kwenkqubo kwimveliso ye-semiconductor ephucukileyo.

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Iinkcukacha zeMveliso

Iithegi zeMveliso

I-CVD Coating Focus Ring yePlasma Etching yinxalenye ebalulekileyo esetyenziswa kwiinkqubo zokugrumba ze-semiconductor eziphambili. Yenziwe ngesakhiwo esidibeneyo se-substrate + CVD coating, le mveliso yenzelwe ukuphucula ukusasazwa kwe-plasma, ukuphucula ukufana kwe-etching, kunye nokwandisa ubomi be-chamber component.

KwaVet Energy, sisebenzisa ubuchule obunzulu kwitekhnoloji ye-chemical vapor deposition (CVD) kunye nezixhobo ze-ceramic eziphambili ukuze sinikezele ngeeringi zokugxila ezihlangabezana neemfuno ezingqongqo zee-semiconductor nodes zanamhlanje, kuquka iinkqubo ze-FinFET kunye ne-3D NAND.

Indima yeRingi yoGxilo kwiPlasma Etching

Kwiinkqubo zokugrumba ngeplasma (ezifana nee-reactors ze-ICP kunye ne-CCP), iringi yokugxila ibekwe ecaleni komphetho we-wafer kwaye idlala indima ebalulekileyo ekuzinzeni kwenkqubo kunye nokusebenza kwemveliso.

1. Ulawulo lokufana kwePlasma

Indandatho yokugxila isebenza njengomda wombane kunye nowenyama onceda ukulawula ukusasazwa koxinano lweplasma kumphezulu we-wafer.

Iingenelo eziphambili:

● Ukuphuculwa kokufana kwesantya se-etch
● Ukwahluka okuncitshisiweyo phakathi ukuya kumda
● Ukuphindaphinda kwenkqubo okuphuculweyo

2. Imbuyekezo yeMpembelelo yoMda

Ngaphandle kweringi yokugxila, ukuphazamiseka kwe-plasma sheath kumphetho we-wafer kunokukhokelela ekugrumbeni okungafaniyo.

Indandatho yokugxila isebenza ngokufanelekileyo njenge "extension ye-wafer ebonakalayo", inciphisa ukungalingani okunxulumene nomphetho okufana noku:

● Ukugrumba kakhulu kwimiphetho yewafer
● Ukuphambuka komlinganiselo obalulekileyo (CD)
● Ukuguqulwa kweprofayili

3. I-Ion Trajectory kunye noLawulo lwaMandla

Ngokuchaphazela intsimi yombane yendawo, iringi yokugxila inceda ukuzinzisa ii-engile zesiganeko se-ion kunye nokusasazwa kwamandla, nto leyo ibalulekileyo kwezi zinto zilandelayo:

● Ukukrola okuphakamileyo komlinganiselo wobuso (HAR)
● Ulawulo lweprofayili ye-Anisotropic
● Umonakalo osecaleni onciphileyo